PHOTOMASK LAYOUTS AND METHODS OF FORMING PATTERNS USING THE SAME
A photomask layout includes: a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region and including at least one notch portion at an area overlapping the lower stepped region. A method of forming a pattern is also provided.
1 . A photomask layout comprising:
a substrate region;
a lower stepped region at a region of the substrate region; and
a pattern region at least partially crossing the lower stepped region, the pattern region including at least one notch portion at an area overlapping the lower stepped region.
2 . The photomask layout of claim 1 , wherein the at least one notch portion is positioned at a boundary area in which the pattern region overlaps the lower stepped region.
3 . The photomask layout of claim 1 , wherein the at least one notch portion is positioned at an intersection region of the lower stepped region and the pattern region.
4 . The photomask layout of claim 3 , wherein the at least one notch portion is positioned at at least one vertex of the intersection region.
5 . The photomask layout of claim 4 , wherein the pattern region completely crosses the lower stepped region, and the at least one notch portion includes four notch portions positioned at the intersection region.
6 . The photomask layout of claim 4 , wherein the pattern region partially crosses the lower stepped region, and the at least one notch portion includes two notch portions positioned at the intersection region.
7 . The photomask layout of claim 3 , wherein the pattern region crosses a plurality of the lower stepped region, and the at least one notch portion includes a number of notch portions that is a multiple of four.
8 . The photomask layout of claim 1 , wherein the lower stepped region corresponds to an active pattern or a lower wiring on a display substrate, and the pattern region corresponds to an upper wiring on the active pattern or the lower wiring.