IP Library › Granted Patent US 10,529,806
Granted Patent B2
US 10,529,806 · App. 15/715,059 · Granted Jan 7, 2020

Array substrate for thin-film transistor and display device of the same

Inventors: Changeun Kim (Gunpo-si, KR); Jeongeun Baek (Seoul, KR); Yonggyoon Jang (Paju-si, KR); Sungjin Kim (Seoul, KR)
Assignee: LG Display Co., Ltd.
H01L29/105H01L29/1054H01L29/227H01L29/24H01L29/7869H01L29/78669H01L29/78681H01L29/78684H01L29/78696G02F1/1368H01L27/1225H01L27/283H01L27/3274H01L51/0562
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Quick Facts
Patent No.
US 10,529,806
App. No.
15/715,059
Granted
Jan 7, 2020
Kind
B2
Abstract

A carbon allotrope and a display device including the same are disclosed. The thin-film transistor array substrate, comprising a substrate, a gate electrode on the substrate, an active layer comprising a first active layer, which opposes the gate electrode and is adjacent to the gate electrode thereby comprising a semiconductor material and a plurality of carbon allotropes, and a second active layer, which is in contact with the first active layer and comprises a semiconductor material, a gate insulating film between the gate electrode and the active layer, and a source electrode and a drain electrode respectively in contact with the active layer.

Claims (42)

1. A thin-film transistor array substrate, comprising:

a substrate;

a gate electrode on the substrate;

an active layer comprising a first active layer, which opposes the gate electrode and is adjacent to the gate electrode thereby comprising a semiconductor material and a plurality of carbon allotropes, and a second active layer, which is in contact with the first active layer and comprises a semiconductor material, the second active layer positioned farther from the gate electrode than the first active layer;

a gate insulating film between the gate electrode and the active layer; and

a source electrode and a drain electrode respectively in contact with the active layer,

wherein the second active layer further comprises a plurality of carbon allotropes, and a content ratio being accounted by the carbon allotropes in the first active layer is higher than a content ratio being accounted by the carbon allotropes in the second active layer.

2. The thin-film transistor array substrate of claim 1 , wherein the carbon allotropes are dispersed within the semiconductor material.

3. The thin-film transistor array substrate of claim 1 , wherein the content ratio of the carbon allotropes in the first active layer decreases as the carbon allotropes go farther from the gate electrode.

4. The thin-film transistor array substrate of claim 1 , wherein the content ratio of the carbon allotropes in the second active layer decreases as the carbon allotropes go farther from the gate electrode.

5. The thin-film transistor array substrate of claim 1 , wherein the carbon allotropes have a one-dimensional structure or two-dimensional structure.

6. The thin-film transistor array substrate of claim 1 , wherein the carbon allotrope is one selected from a group consisting of reduced graphene oxide (rGO), non-oxidized graphene, graphene nanoribbon, carbon nanotube (CNT), or a mixture thereof.

7. The thin-film transistor array substrate of claim 1 , wherein the semiconductor material is one selected from a group consisting of a ceramic semiconductor, an organic semiconductor, a transition metal chalcogenide, and an oxide semiconductor, or a mixture thereof.

8. The thin-film transistor array substrate of claim 1 , wherein a content of the carbon allotropes in the first active layer is 0.05 wt % to 1 wt % based on 100 wt % of a content of the semiconductor material.

9. The thin-film transistor array substrate of claim 1 , wherein a content of the carbon allotropes in the second active layer is 0.001 wt % to 0.01 wt % based on 100 wt % of a content of the semiconductor material.

10. The thin-film transistor array substrate of claim 1 , wherein a thickness of the first active layer and the second active layer is in a range of 1 nm to 10 nm, respectively.

11. The thin-film transistor array substrate of claim 1 , wherein the plurality of carbon allotropes in the first layer is dispersed throughout the first layer in its entirety, and wherein the plurality of carbon allotropes in the second layer is dispersed throughout the second layer in its entirety.

12. A display device, comprising:

a substrate;

a gate electrode on the substrate;

an active layer comprising a first active layer, which opposes the gate electrode and is adjacent to the gate electrode thereby comprising a semiconductor material and a plurality of carbon allotropes, and a second active layer, which is in contact with the first active layer and comprises a semiconductor material, wherein the second active layer is positioned farther from the gate electrode than the first active layer;

a gate insulating film between the gate electrode and the active layer;

a source electrode and a drain electrode respectively in contact with the active layer;

an organic insulating film on the source electrode and the drain electrode; and

a pixel electrode on the organic insulating film,

wherein the second active layer further comprises a plurality of carbon allotropes, and a content ratio being accounted by the carbon allotropes in the first active layer is higher than a content ratio being accounted by the carbon allotropes in the second active layer.

13. The display device of claim 12 , wherein the carbon allotropes are dispersed within the semiconductor material.

14. The display device of claim 12 , wherein the content ratio of the carbon allotropes in the first active layer decreases as the carbon allotropes go farther from the gate electrode.

15. The display device of claim 12 , wherein the content ratio of the carbon allotropes in the second active layer decreases as the carbon allotropes go farther from the gate electrode.

16. The display device of claim 12 , wherein the carbon allotropes have a one-dimensional structure or two-dimensional structure.

17. The display device of claim 12 , wherein the carbon allotrope is one selected from a group consisting of reduced graphene oxide (rGO), non-oxidized graphene, graphene nanoribbon, carbon nanotube (CNT), or a mixture thereof.

18. The display device of claim 12 , wherein the semiconductor material is one selected from a group consisting of a ceramic semiconductor, an organic semiconductor, a transition metal chalcogenide, and an oxide semiconductor, or a mixture thereof.

19. The display device of claim 12 , wherein a content of the carbon allotropes in the first active layer is 0.05 wt % to 1 wt % based on 100 wt % of a content of the semiconductor material.

20. The display device of claim 12 , wherein a content of the carbon allotropes in the second active layer is 0.001 wt % to 0.01 wt % based on 100 wt % of a content of the semiconductor material.

21. The display device of claim 12 , wherein a thickness of the first active layer and the second active layer is in a range of 1 nm to 10 nm, respectively.

22. The display device of claim 12 , further comprising:

an organic light emitting diode electrically connected to the pixel electrode;

an encapsulation layer on the organic light emitting diode; and

a cover window on the encapsulation layer.

23. The display device of claim 12 , further comprising:

a common electrode, which is disposed to be spaced apart from the pixel electrode on the same plane or a lower part thereof; and

a liquid crystal layer disposed on the common electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 25, 2017
From: KIM, CHANGEUN; BAEK, JEONGEUN; JANG, YONGGYOON; KIM, SUNGJIN
To: LG DISPLAY CO., LTD.
Reel/Frame 043686/0624 →
Priority Claims (1)
KR 10-2016-0127114 · Sep 30, 2016 · national
Continuity (1)
Related Publication 20180097062A1 · Apr 5, 2018
Cited By (1)
US 12,369,357