Process for making an integrated circuit that includes NCEM-enabled, interlayer overlap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates
A process for making an integrated circuit, either in the form of a wafer, die, or chip, includes instantiating multiple standard cell-compatible fill cells, configured to enable non-contact electrical measurements. Such instantiated fill cells include mesh pads that contain at least three conductive stripes disposed between adjacent gate stripes. Such instantiated fill cells further include geometry to enable non-contact evaluation of interlayer overlap shorts and/or leakages.
1. A process for making an integrated circuit (IC) that includes a multiplicity of standard cell library compatible, non-contact electrical measurement (NCEM)-enabled fill cells, such process including instantiating each of said NCEM-enabled fills cells by:
patterning at least first and second power rails, each in a conductive layer, with each power rail extending longitudinally in a first direction and configured for abutted instantiation with logic cells in the standard cell library;
patterning a plurality of gate (GATE) stripes, with each extending longitudinally, in a second direction perpendicular to the first direction, from at least the first power rail to at least the second power rail, each of the GATE stripes having a uniform transverse thickness and a uniform center-to-center spacing (CPP) between adjacent GATE stripes;
instantiating an NCEM pad, by:
patterning at least three first-direction stripes, each in a conductive layer, each extending longitudinally in the first direction, and each positioned in a transverse direction between the first and second power rails;
patterning at least three second-direction stripes, each in a conductive layer, each extending longitudinally in the second direction, each positioned longitudinally between the first and second power rails, and each positioned transversely between adjacent GATE stripes, such that the center-to-center spacing between adjacent second-direction stripes is CPP;
connecting each of the first-direction stripes to each of the second-direction stripes;
instantiating at least one interlayer overlap test area, by patterning a first feature and a second feature, not electrically connected to, the first feature, the first and second features partially overlapping to define a rectangular test area characterized by a major dimension and a minor dimension; and,
patterning pad/ground wiring to (i) connect one of the first or second features to the NCEM pad and (ii) connect the other of the first or second features to at least one of the power rail.
2. A process, as defined in claim 1 , wherein the process produces NCEM-enabled fill cells that are configured as interlayer-overlap-short-configured fill cells.
3. A process, as defined in claim 1 , wherein the process produces NCEM-enabled fill cells that are configured as interlayer-overlap-leakage-configured fill cells.
4. A process, as defined in claim 1 , wherein instantiating the NCEM pads includes patterning four first-direction stripes, each in a conductive layer, each extending longitudinally in the first direction, and each positioned in the transverse direction between the first and second power rails.
5. A process, as defined in claim 1 , that includes single patterning the first-direction stripes.
6. A process, as defined in claim 1 , that includes double patterning the first-direction stripes.
7. A process, as defined in claim 1 , that includes triple patterning the first-direction stripes.
8. A process, as defined in claim 1 , that includes single patterning the second-direction stripes.
9. A process, as defined in claim 1 , that includes double patterning the second-direction stripes.
10. A process, as defined in claim 1 , that includes triple patterning the second-direction stripes.
11. A process, as defined in claim 1 , wherein instantiating the NCEM-enabled fill cells includes instantiating at least two interlayer overlap test areas, wired in parallel.
12. A process, as defined in claim 11 , wherein each of the parallel-wired interlayer overlap test areas is identically configured.
13. A process, as defined in claim 1 , wherein the process produces an IC in the form of a semiconductor wafer.
14. A process, as defined in claim 1 , wherein the process produces an IC in the form of a semiconductor die.
15. A process, as defined in claim 1 , wherein the process produces an IC in the form of a packaged semiconductor chip.
16. A process, as defined in claim 1 , wherein the NCEM-enabled fill cells form a design of experiments (DOE) in which some of the NCEM-enabled fill cells differ in terms of the major dimension of their respective interlayer overlap test area(s).
17. A process, as defined in claim 1 , wherein the NCEM-enabled fill cells form a design of experiments (DOE) in which some of the NCEM-enabled fill cells differ in terms of the minor dimension of their respective interlayer overlap test area(s).
18. A process, as defined in claim 1 , wherein the NCEM-enabled fill cells form a design of experiments (DOE) in which some of the NCEM-enabled fill cells differ in terms of other patterning within expanded test area(s) that surround the interlayer overlap test area(s).
19. A process, as defined in claim 1 , that further comprises instantiating additional, differently configured, NCEM-enabled fill cells, said differently configured fill cells selected from a list that consists of:
tip-to-tip-short-configured, NCEM-enabled fill cells;
tip-to-tip-leakage-configured, NCEM-enabled fill cells;
tip-to-side-short-configured, NCEM-enabled fill cells;
tip-to-side-leakage-configured, NCEM-enabled fill cells;
side-to-side-short-configured, NCEM-enabled fill cells;
side-to-side-leakage-configured, NCEM-enabled fill cells;
L-shape-interlayer-short-configured, NCEM-enabled fill cells;
L-shape-interlayer-leakage-configured, NCEM-enabled fill cells;
diagonal-short-configured, NCEM-enabled fill cells;
diagonal-leakage-configured, NCEM-enabled fill cells;
corner-short-configured, NCEM-enabled fill cells;
corner-leakage-configured, NCEM-enabled fill cells;
interlayer-overlap-short-configured, NCEM-enabled fill cells;
interlayer-overlap-leakage-configured, NCEM-enabled fill cells;
via-chamfer-short-configured, NCEM-enabled fill cells;
via-chamfer-leakage-configured, NCEM-enabled fill cells;
merged-via-short-configured, NCEM-enabled fill cells;
merged-via-leakage-configured, NCEM-enabled fill cells;
snake-open-configured, NCEM-enabled fill cells;
snake-resistance-configured, NCEM-enabled fill cells;
stitch-open-configured, NCEM-enabled fill cells;
stitch-resistance-configured, NCEM-enabled fill cells;
via-open-configured, NCEM-enabled fill cells;
via-resistance-configured, NCEM-enabled fill cells;
metal-island-open-configured, NCEM-enabled fill cells;
metal-island-resistance-configured, NCEM-enabled fill cells;
merged-via-open-configured, NCEM-enabled fill cells; and,
merged-via-resistance-configured, NCEM-enabled fill cells.