Structure and method to suppress work function effect by patterning boundary proximity in replacement metal gate
A semiconductor device includes a first transistor formed on a substrate, the first transistor including a channel region positioned on the substrate; a second transistor formed on the substrate, the second transistor including a channel region positioned on the substrate; a high-k dielectric layer disposed on the channel region of the first transistor and the channel region of the second transistor; a first transistor metal gate positioned in contact with the high-k dielectric on the first transistor; a second transistor metal gate positioned in contact with the high-k dielectric on the second transistor; an oxygen absorbing barrier disposed in contact with the high-k dielectric between the first transistor and the second transistor; and a conductive electrode material disposed on the first transistor, the second transistor, and the oxygen absorbing barrier.
1. A semiconductor device, comprising:
a first transistor formed on a substrate, the first transistor comprising a channel region positioned on the substrate;
a second transistor formed on the substrate, the second transistor comprising a channel region positioned on the substrate;
a high-k dielectric layer disposed on the channel region of the first transistor and the channel region of the second transistor, the high-k dielectric layer extending continuously over the channel region of the first transistor and the channel region of the second transistor;
a first transistor metal gate stack positioned in contact with the high-k dielectric layer on the first transistor;
a second transistor metal gate stack positioned in contact with the high-k dielectric layer on the second transistor, with a portion of the second transistor metal gate stack arranged directly on the first transistor metal gate stack;
an oxygen absorbing barrier layer directly on the high-k dielectric layer extending continuously between the first transistor metal gate stack and the second transistor metal gate stack, the oxygen absorbing barrier layer positioned in direct contact with the high-k dielectric layer between the first transistor metal gate stack and the second transistor metal gate stack, the oxygen absorbing barrier layer extending continuously from the high-k dielectric layer to a top surface of the portion of the second transistor metal gate stack arranged directly on the first transistor metal gate stack; and
a conductive electrode material disposed on the first transistor, the second transistor, and the oxygen absorbing barrier layer such that the conductive electrode material covers the first transistor metal gate stack and the second transistor metal gate stack.
2. The semiconductor device of claim 1 , wherein the first transistor is an nFET.
3. The semiconductor device of claim 2 , wherein the second transistor is a pFET.
4. The semiconductor device of claim 1 , wherein the first transistor metal gate stack is TiN, TiC, TiAl, Al, Ti, or a combination thereof.
5. The semiconductor device of claim 1 , wherein the first transistor metal gate stack is a high oxygen absorbing metal.
6. The semiconductor of claim 1 , wherein the first transistor metal gate stack comprises an oxygen absorbing material.
7. The semiconductor device of claim 1 , wherein the second transistor metal gate stack comprises an oxygen providing material.
8. The semiconductor device of claim 1 , wherein the oxygen absorbing barrier layer is positioned between the second transistor metal gate stack and the conductive electrode material on the second transistor.
9. The semiconductor device of claim 1 , wherein the second transistor metal gate stack is disposed on the first transistor metal gate stack on the first transistor.
10. The semiconductor device of claim 9 , wherein the oxygen absorbing barrier layer is positioned between the second transistor metal gate stack and the conductive electrode material.