Fin selector with gated RRAM
View Patent ↗A method of fabricating a fin selector with a gated RRAM and the resulting device are disclosed. Embodiments include forming a bottom electrode layer and a hardmask on a semiconductor substrate; etching the hardmask, bottom electrode layer, and semiconductor substrate to form a fin-like structure; forming first and second dummy gate stacks on first and second side surfaces of the fin-like structure, respectively; forming spacers on vertical surfaces of the first and second dummy gate stacks; forming an ILD surrounding the spacers; removing the first and second dummy gate stacks, forming first and second cavities on first and second sides of the fin-like structure; forming an RRAM layer on the first and second side surfaces of the fin-like structure in the first and second cavities, respectively; and filling each of the first and second cavities with a top electrode.
1. A phase-change random access memory (PCRAM) comprising:
a semiconductor substrate;
a heater layer formed on the semiconductor substrate, the heater layer and the semiconductor substrate forming a fin-like structure;
an interlayer dielectric (ILD) formed on side surfaces of the fin-like structure;
a Ge2Sb2Te5 (GST) material formed in contact with the heater layer;
a top electrode formed on the GST layer, to form the PCRAM; and
a hardmask on the heater layer, the GST layer on a top surface of the ILD on each side of the fin-like structure and on each side surface of the heater layer and the hardmask, and the top electrode on each side of the fin-like structure.
2. The PCRAM according to claim 1 , wherein the heater layer comprises: TaN, TiN, titanium tungsten (TiW), titanium silicon nitride (TiSiN), or tantalum silicon nitride (TaSiN), and formed to a thickness of 3 to 20 nm.
3. The PCRAM according to claim 1 , wherein the GST layer is formed to a thickness of 2 to 50 nm.
4. The PCRAM according to claim 3 , wherein the top electrode is formed to a thickness of 10 to 100 nm.
5. A phase-change random access memory (PCRAM) comprising:
a substrate;
a heater layer formed on the substrate, the heater layer and the substrate forming fin structure;
a dielectric layer formed on side surfaces of the fin structure;
a phase-change material layer formed in contact with the heater layer;
a top electrode formed on the phase-change material layer; and
a hardmask on the heater layer, the phase-change material layer on a top surface of the dielectric layer on each side of the fin structure and on each side surface of the heater layer and the hardmask, and the top electrode on each side of the fin structure.
6. The PCRAM according to claim 5 , wherein the phase-change material layer comprises a Ge 2 Sb 2 Te 5 (GST) material.
7. The PCRAM according to claim 5 , further comprising:
the phase-change material layer on the heater layer, and the top electrode over the phase-change material layer and the dielectric on each side of the fin structure.
8. The PCRAM according to claim 5 , wherein the heater layer comprises: TaN, TiN, titanium tungsten (TiW), titanium silicon nitride (TiSiN), or tantalum silicon nitride (TaSiN).
9. The PCRAM according to claim 8 , wherein the heater layer is formed to a thickness of 3 to 20 nm.
10. The PCRAM according to claim 5 , wherein the GST layer is formed to a thickness of 2 to 50 nm.
11. The PCRAM according to claim 10 , wherein the top electrode is formed to a thickness of 10 to 100 nm.