Anti-reflective surface structures
Anti-reflective article includes a layer defining an anti-reflective surface. The anti-reflective surface includes a series of alternating micro-peaks and micro-spaces extending along an axis. The surface also includes a series of nano-peaks extending along an axis. The nano-peaks are disposed at least on the micro-spaces and, optionally, the micro-peaks. The article may be disposed on a photovoltaic module or skylight to reduce reflections and resist the collection of dust and dirt.
1. An article comprising a layer defining an anti-reflective surface extending along an axis, wherein a plane containing the axis defines a cross section of the layer and intersects the surface to define a line describing the surface in two dimensions, the layer comprising:
a series of micro-structures at least partially defined by the line, the line defining a series of alternating micro-peaks and micro-spaces along the axis, wherein each micro-space comprises a maximum absolute slope defining an angle from the axis of at most 30 degrees, wherein each micro-peak comprises a first micro-segment defining a first average slope and a second micro-segment defining a second average slope, and wherein an angle formed between the first and second average slopes is at most 120 degrees; and
a plurality of nano-structures at least partially defined by the line, the line defining at least one series of nano-peaks disposed on at least the micro-spaces along the axis,
wherein each nano-peak has a height and each corresponding micro-peak has a height of at least 10 times the height of the nano-peak, and
wherein the micro-spaces have a width of at least 50 micrometers.
2. An article comprising a layer defining an anti-reflective surface extending along an axis, wherein a plane containing the axis defines a cross section of the layer and intersects the surface to define a line describing the surface in two dimensions, the layer comprising:
a series of micro-structures at least partially defined by the line, the line defining a series of alternating micro-peaks and micro-spaces along the axis, wherein a boundary between each adjacent micro-peak and micro-space includes at least one of a bend or an inflection point of the line; and
a plurality of nano-structures at least partially defined by the line, the line defining at least one series of nano-peaks disposed on at least the micro-spaces along the axis,
wherein each nano-peak has a height and each corresponding micro-peak has a height at least 10 times the height of the nano-peak, and
wherein the micro-spaces have a width of at least 50 micrometers.
3. The article of claim 1 , wherein the micro-peak first average slope is positive, and the micro-peak second average slope is negative.
4. The article of claim 1 , wherein an absolute value of the micro-peak first average slope is equal to an absolute value of the micro-peak second average slope.
5. The article of claim 1 , wherein a width of each micro-space is at least one of: at least 10% of a corresponding micro-peak distance.
6. The article of claim 1 , wherein a micro-peak distance between micro-peaks is at least 100 micrometers.
7. The article of claim 1 , wherein the micro-peaks have a height of at least 10 micrometers.
8. The article of claim 1 , wherein each nano-peak comprises a first nano-segment defining a first average slope and a second nano-segment defining a second average slope, wherein an angle formed between the nano-peak first average slope and the nano-peak second average slope is at most 120 degrees.
9. The article of claim 8 , wherein an absolute value of the nano-peak first average slope is different than an absolute value of the nano-peak second average slope.
10. The article of claim 1 , wherein the plurality of nano-structures is further disposed on the micro-peaks.
11. The article of claim 1 , wherein each nano-peak defines a nano-peak distance and the corresponding micro-peaks define a micro-peak distance of at least 10 times the nano-peak distance.
12. The article of claim 1 , wherein a maximum nano-peak distance between nano-peaks is in a range from 1 nanometer to 1 micrometer.
13. The article of claim 1 , wherein the layer defining the anti-reflective surface comprises at least one of a fluoropolymer, a polyolefin polymer, or an ultraviolet stable material.
14. The article of claim 1 , wherein the nano-peaks comprise at least one masking element.
15. The article of claim 14 , wherein the masking element has a diameter of at most 1 micrometer.
16. The article of claim 1 , wherein the micro-peaks are non-uniform in at least one of height or shape.
17. The article of claim 1 , further comprising an ultraviolet stable adhesive coupled to a side of the layer opposite to the anti-reflective surface, wherein the adhesive is at least one of self-wetting to glass or an air bleed adhesive.
18. A method of forming an article comprising a layer defining an anti-reflective surface, the method comprising:
forming a series of micro-structures on a surface of a layer, the series of micro-structures comprising a series of alternating micro-peaks and micro-spaces along an axis;
disposing a series of nano-sized masking elements on at least the micro-spaces along the axis, wherein the masking elements define a maximum diameter and the corresponding micro-peaks have a height of at least 10 times the maximum diameter of the masking elements; and
exposing the surface of the layer to reactive ion etching to form a plurality of nano-structures on the surface of the layer including a series of nano-peaks along the axis, each nano-peak comprising the masking element and a column between the masking element and the layer,
wherein the micro-spaces have a width of at least 50 micrometers.
19. A method of forming an article comprising a layer defining an anti-reflective surface, the method comprising:
extruding a hot melt material comprising an ultraviolet-stable material;
shaping the extruded material with a micro-replication tool comprising a mirror image of a series of micro-structures to form the series of micro-structures on the surface of the layer, the series of micro-structures comprising a series of alternating micro-peaks and micro-spaces along an axis; and
forming a plurality of nano-structures on the surface of the layer on at least the micro-spaces, the plurality of nano-peaks comprising at least one series of nano-peaks along the axis,
wherein the micro-spaces have a width of at least 50 micrometers.
20. The method of claim 19 , wherein the plurality of nano-peaks comprises at least one series of nano-peaks along the axis.