IP Library Granted Patent US 10,808,282
Granted Patent B2
US 10,808,282 · App. 15/739,688 · Granted Oct 20, 2020

Selective surface patterning via nanoimprinting

Inventors: Andrew A. Brown (Cambridge, GB); Wayne N. George (Ilford, GB); Alexandre Richez (Cambridge, GB); M. Shane Bowen (Encinitas, CA)
Assignee: ILLUMINA, INC.
C12Q1/6874G03F7/0002G03F7/161G01N21/645
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,808,282
App. No.
15/739,688
Granted
Oct 20, 2020
Kind
B2
Abstract

Substrates comprising dual functional polymer layered surfaces and the preparation thereof by using UV nano-imprinting processes are disclosed. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.

Claims (16)

1. A method of preparing a substrate, comprising:

providing a substrate comprising a first patterned polymer layer on a surface of the substrate;

depositing a first photonic crystal material on top of and in direct contact with the entire first patterned polymer layer such that the first photonic crystal material adopts the patterns in the first patterned polymer layer; and

forming a second patterned polymer layer on top of and in direct contact with the entire first photonic crystal material, wherein forming the second patterned polymer layer involves:

depositing a photocurable polymer composition on the first photonic crystal material;

imprinting a stamp on the photocurable polymer composition;

subjecting the photocurable polymer composition to ultraviolet curing; and

grafting primers to the second patterned polymer layer;

wherein the first patterned polymer layer and the second patterned polymer layer include poly(N-(5-azidoacetamidylpentyl)acrylamide-coacrylamide).

2. The method of claim 1 , wherein the providing comprises preparing the first patterned polymer layer by mechanical embossing, nanoimprint lithography, or resist-free nanoimprint lithography.

3. The method of claim 2 , wherein the first patterned polymer layer is prepared by resist-free nanoimprint lithography.

4. The method of claim 1 , wherein the patterns in the first patterned polymer layer are substantially the same as the patterns in the second patterned polymer layer.

5. The method of claim 1 , wherein the patterns in the first patterned polymer layer are complementary to the patterns in the second patterned polymer layer.

6. The method of claim 1 , wherein the first photonic crystal material has high refractive index and low adsorption.

7. The method of claim 6 , wherein the first photonic crystal material comprise Ta 2 O 5 .

8. The method of claim 1 , wherein the patterns in the first patterned polymer layer and the second patterned polymer layers comprise micro-scale or nano-scale channels, micro-scale or nano-scale trenches, micro-scale or nano-scale posts, micro-scale or nano-scale wells, or combinations thereof.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 3, 2020
From: BROWN, ANDREW A.; GEORGE, WAYNE N.; RICHEZ, ALEXANDRE
To: ILLUMINA CAMBRIDGE LIMITED
Reel/Frame 052310/0329 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2018
From: BOWEN, M. SHANE
To: ILLUMINA, INC.
Reel/Frame 045438/0952 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2018
From: ILLUMINA CAMBRIDGE LIMITED
To: ILLUMINA, INC.
Reel/Frame 045439/0014 →
Continuity (2)
Provisional Application 62189662 · Jul 7, 2015
Related Publication 20180274026A1 · Sep 27, 2018