IP Library › Granted Patent US 10,381,275
Granted Patent B2
US 10,381,275 · App. 15/749,444 · Granted Aug 13, 2019

Array substrate and repairing method thereof

Inventors: Guanghui Hong (Hubei, CN); Qiang Gong (Hubei, CN)
Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
H01L22/22H01L21/76868H01L21/76894H01L22/14H01L27/124G02F1/1309H01L21/485
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Quick Facts
Patent No.
US 10,381,275
App. No.
15/749,444
Granted
Aug 13, 2019
Kind
B2
Abstract

The present invention provides an array substrate and an repairing method thereof, wherein the array substrate includes adjacent two level GOA unit circuits, wherein an output terminal of a Nth level GOA unit circuit is connected to a Nth level gate line, an output terminal of a N+1th level GOA unit circuit is connected to a N+1th level gate line; and a repairing structure disposed between the Nth level gate line and the N+1th level gate line, the repairing structure configured to turn on the Nth level gate line and the N+1th level gate line by melting when the Nth level GOA unit circuit or the N+1th level GOA unit circuit damaged. A repairing structure is added between two adjacent gate lines, when a certain GOA unit circuit is damaged, the repairing structure is melted by a laser to make the adjacent two gate lines communicate with each other.

Claims (23)

1. An array substrate, comprising:

adjacent two level gate driver on array unit circuits, wherein an output terminal of a Nth level gate driver on array unit circuit is connected to a Nth level gate line, an output terminal of a N+1th level gate driver on array unit circuit is connected to a N+1th level gate line; and

a repairing structure disposed between the Nth level gate line and the N+1th level gate line, the repairing structure configured to turn on the Nth level gate line and the N+1th level gate line by melting when the Nth level gate driver on array unit circuit or the N+1th level gate driver on array unit circuit is damaged;

wherein the repairing structure comprises:

a first metal block and a second metal block separated from each other;

a third metal block; and

an interlayer medium disposed between the first metal block, the second metal block and the third metal block;

wherein the first metal block is connected to the Nth level gate line, the second metal block is connected to the N+1th level gate line, the third metal block is connected to the first metal block via a connecting hole formed in the interlayer medium, and forms an overlapping structure with the second metal block, the overlapping structure is configured to be melted when the Nth level gate driver on array unit circuit or the N+1th level gate driver on array unit circuit is damaged and to turn on the Nth level gate line and the N+1th level gate line.

2. The array substrate according to claim 1 , wherein melting portions are provided at connection portions of the output terminal of the Nth level gate driver on array unit circuit and the N+1th level gate driver on array unit circuit and a current level gate line, and are configured to be melted when the Nth level gate driver on array unit circuit or the N+1th level gate driver on array unit circuit is damaged, and to cut off the connection between the output terminal of the damaged gate driver on array unit circuit and the current level gate line.

3. The array substrate according to claim 1 , wherein the repairing structure between the Nth level gate line and the N+1th level gate line is disposed close to the N+1th level gate driver on array unit circuit.

4. The array substrate according to claim 1 , further comprising:

a N−1th level gate driver on array unit circuit, and an output terminal of the N−1th level gate driver on array unit circuit connected to a N−1th level gate line; and

a repairing structure disposed between the Nth level gate line and the N−1th level gate line and close to the Nth level gate driver on array unit circuit.

5. The array substrate according to claim 4 , wherein a melting portion is provided at a connection portion of the N−1th level gate driver on array unit circuit and the current level gate line, and is configured to be melted when the N−1th level gate driver on array unit circuit is damaged, and to cut off the connection between the output terminal of the damaged gate driver on array unit circuit and the current level gate line.

6. The array substrate according to claim 1 , wherein the first metal block, the second metal block and gates connected to the Nth level gate line and the N+1th level gate line are located in the same layer, and the third metal block is located in the same layer with a data line, a source and a drain.

7. The array substrate according to claim 1 , wherein the first metal block and the second metal block have the same shape, and have the same height on the array substrate, the third metal block comprises a first connecting portion connected to the first metal block via the connecting hole, and a second connecting portion forming the overlapping structure with the second metal block, and a third connecting portion connecting the first connecting portion and the second connecting portion.

8. A repairing method for an array substrate, wherein the array substrate comprises adjacent two level gate driver on array unit circuits, an output terminal of the Nth level gate driver on array unit circuit is connected to a Nth level gate line, an output terminal of the N+1th level gate driver on array unit circuit is connected to a N+1th level gate line, wherein the repairing method comprises:

disposing a repairing structure between the Nth level gate line and the N+1th level gate line; and

turning on the Nth level gate line and the N+1th level gate line by melting the repairing structure, and cutting off a connection of an output terminal of a damaged gate driver on array unit circuit and a current level gate line simultaneously, when the Nth level gate driver on array unit circuit or the N+1th level gate driver on array unit circuit is damaged;

wherein the disposing of the repairing structure specifically comprises:

forming a first metal block and a second metal block separated from each other, and connecting the first metal block with the Nth level gate line, and connecting the second metal block with the N+1th level gate line;

forming an interlayer medium on the first metal block and the second metal block, and forming a connection hole in the interlayer dielectric; and

forming a third metal block on the interlayer medium, and connecting the third metal block to the first metal block by forming a connection hole, to form an overlapping structure with the second metal block, the overlapping structure is configured to be melted when the Nth level gate driver on array unit circuit or the N+1th level gate driver on array unit circuit is damaged and to turn on the Nth level gate line and the N+1th level gate line.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2018
From: HONG, GUANGHUI; GONG, QIANG
To: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 044792/0426 →
Priority Claims (1)
CN 2017 1 1226285 · Nov 29, 2017 · national
Continuity (1)
Related Publication 20190164855A1 · May 30, 2019
Cited By (1)
US 12,628,643