IP Library Granted Patent US 10,954,340
Granted Patent B2
US 10,954,340 · App. 15/749,921 · Granted Mar 23, 2021

Polyimide precursor composition

Inventors: Kunihiro Noda (Kawasaki, JP); Hiroki Chisaka (Kawasaki, JP); Dai Shiota (Kawasaki, JP); Shinichi Komatsu (Yokohama, JP)
Assignees: Tokyo Ohka Kogyo Co., Ltd.; ENEOS Corporation
C08G73/126C08G73/10C08G73/1078C08G73/1085C08K5/3445C08L79/08C08L2203/16
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Quick Facts
Patent No.
US 10,954,340
App. No.
15/749,921
Granted
Mar 23, 2021
Kind
B2
Abstract

A polyimide precursor composition that exhibits excellent tensile strength and breaking elongation, and that provides a film containing an alicyclic polyimide resin; a method for producing a polyimide film using the polyimide precursor composition; and a permanent film that contains an alicyclic polyimide resin and that exhibits excellent tensile strength and breaking elongation. The polyimide precursor composition is a mixture of a resin precursor component which is a polyamic acid including an alicyclic backbone having a predetermined structure, a monomer component that includes an aromatic diamine compound having a predetermined structure or an alicyclic tetracarboxylic acid di-anhydride having a predetermined structure; an imidazole compound having a predetermined structure; and a solvent.

Claims (21)

1. A polyimide precursor composition comprising an imidazole compound (A), a resin precursor component (B), and a solvent (S), wherein

the imidazole compound (A) is a compound represented by the following formula (1):

wherein, in the formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an optionally substituted aromatic group, R 3 is an optionally substituted alkylene group, R 4 each independently represent a halogen atom, a hydroxy group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphonato group, or an organic group, n is an integer of 0 to 3; and

the resin precursor component (B) is at least one selected from the group consisting of (a) and (b):

wherein (a) is a monomer component containing a diamine compound represented by the following formula (2):

H 2 N—R b10 —NH 2   (2)

wherein, in the formula (2), R b10 is an aryl group having 6 to 40 carbon atoms, and

norbornane-2-spiro-α-cycloalkanone-α′-spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydrides represented by the following formula (b1):

wherein, in the formula (b1), R b1 , R b2 , and R b3 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom, and m represents an integer of 0 to 12, and

wherein (b) is a polyamic acid including a repeating unit represented by the following formula (b2):

wherein, in the formula (b2), R b1 , R b2 , and R b3 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom, R b10 represents an aryl group having 6 to 40 carbon atoms, and m represents an integer of 0 to 12.

2. The polyimide precursor composition according to claim 1 , further comprising one or more silicon-containing compounds selected from the group consisting of a silicon-containing resin, a silicon-containing resin precursor, and a silane coupling agent.

3. A method for producing a polyimide film, comprising:

forming a coating film of the polyimide precursor composition according to claim 1 ; and

heating the coating film to ring-close a polyamic acid derived from a resin precursor component (B) in the coating film.

4. A polyimide film comprising an imidazole compound (A) and a polyimide resin, wherein

the imidazole compound (A) is a compound represented by the following formula (1):

wherein, in the formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an optionally substituted aromatic group, R 3 is an optionally substituted alkylene group, R 4 each independently represent a halogen atom, a hydroxy group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphonato group, or an organic group, and n is an integer of 0 to 3; and

the polyimide resin is a resin in which polyamic acid composed of a repeating unit represented by the following formula (b2):

wherein, in the formula (b2), R b1 , R b2 , and R b3 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and a fluorine atom, R b10 represents an aryl group having 6 to 40 carbon atoms, and m represents an integer of 0 to 12

is ring-closed.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 14, 2024
From: ENEOS CORPORATION
To: TOKYO OHKA KOGYO CO., LTD.
Reel/Frame 067403/0572 →
CHANGE OF NAME Recorded Dec 4, 2020
From: JXTG NIPPON OIL & ENERGY CORPORATION
To: ENEOS CORPORATION
Reel/Frame 054592/0825 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2018
From: NODA, KUNIHIRO; CHISAKA, HIROKI; SHIOTA, DAI; KOMATSU, SHINICHI
To: TOKYO OHKA KOGYO CO, LTD.; JXTG NIPPON OIL & ENERGY CORPORATION
Reel/Frame 045698/0016 →
Priority Claims (2)
JP JP2015-157775 · Aug 7, 2015 · national
JP JP2015-202377 · Oct 13, 2015 · national
Continuity (1)
Related Publication 20180223045A1 · Aug 9, 2018