IP Library › Granted Patent US 10,758,968
Granted Patent B2
US 10,758,968 · App. 15/750,661 · Granted Sep 1, 2020

Mold surface treatment method and mold treated with said method

Inventors: Keiji Mase (Tokyo, JP); Shozo Ishibashi (Tokyo, JP); Yusuke Kondo (Tokyo, JP)
Assignee: FUJI MANUFACTURING CO., LTD.
B22C9/061B22C9/06B22C9/18B22D17/22B22D17/2209B22D17/2236B24C1/006B29C33/38B29C33/3842
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Quick Facts
Patent No.
US 10,758,968
App. No.
15/750,661
Granted
Sep 1, 2020
Kind
B2
Abstract

A method of treating a surface of a mold. The method includes forming dimples on a surface of a mold by ejecting substantially spherical ejection-particles so as to bombard the surface of the mold. The dimples are formed so as to satisfy a condition defined by the following formula: 1+3.3 e −H/230 ≤W ≤3+13.4 e −H/1060 wherein W is an equivalent diameter (μm) of the dimples and H is a base metal hardness (Hv) of the mold.

Claims (9)

1. A method of treating a surface of a mold comprising:

forming dimples on a surface of a mold by ejecting substantially spherical ejection- particles so as to bombard the surface of the mold,

the dimples being formed so as to satisfy a condition defined by the following formula:

1+3.3 e −H/230 ≤W≤ 3+13.4 e −H/1060   Formula (1)

0.01+0.2 e −H/230 ≤D≤ 0.01+1.1 e −H/500   Formula (2)

wherein W is an equivalent diameter (μm) of the dimples, D is a depth (μm) of the dimples and H is a base metal hardness (Hv) of the mold.

2. The method of treating the surface of the mold according to claim 1 , wherein the dimples are formed by employing ejection particles having a median diameter of from 1 μm to 20 μm as the substantially spherical ejection particles and the ejection particles are ejected at an ejection pressure of from 0.01 MPa to 0.7 MPa such that a dimple-formed surface area is 50% or more of a surface area of the mold surface.

3. The surface treatment method according to claim 2 , wherein the ejection particles are ejected against a surface of a mold having a surface roughness adjusted to an Ra of 0.3 μm or less.

4. The surface treatment method according to claim 1 , wherein the ejection particles are ejected against a surface of a mold having a surface roughness adjusted to an Ra of 0.3 μm or less.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 6, 2018
From: MASE, KEIJI; ISHIBASHI, SHOZO; KONDO, YUSUKE
To: FUJI MANUFACTURING CO., LTD.
Reel/Frame 044843/0413 →
Continuity (1)
Related Publication 20180229293A1 · Aug 16, 2018
Cited By (2)
US 12,251,791 US 12,477,941