I-line negative type photoresist composition having excellent etching resistance

1. An I-line negative photoresist composition, comprising, based on a total weight of the composition:

5 to 50 wt % of a polymer resin;

0.1 to 10 wt % of at least one selected from the group consisting of compounds represented by Chemical Formulas 1 to 5 below:

in Chemical Formulas 1 to 5, Rs are identical to or different from each other, and are independently any one selected from the group consisting of acryloyl, allyl, 3-ethoxyacryloyl, methylacryl, trans-3-(benzoyl)acryl, and 3-(2-furyl)acryl;

1 to 10 wt % of a crosslinking agent;

0.1 to 10 wt % of a photoacid generator;

0.01 to 5 wt % of an acid diffusion inhibitor; and

a remainder of a solvent.

2. The Mine negative photoresist composition of claim 1 , wherein the compounds represented by Chemical Formulas 1 to 5 are respectively obtained by subjecting 1,4-hydroquinone, naphthalene-1,5-diol, bisphenol A, anthracene-9,10-diol and 1,1,1-tris(4-hydroxyphenyl)ethane to a substitution reaction with acryloyl chloride.

3. The Mine negative photoresist composition of claim 1 , wherein the compounds represented by Chemical Formulas 1 to 5 independently have a weight average molecular weight ranging from 163 to 500.

4. The Mine negative photoresist composition of claim 1 , wherein the polymer resin includes at least one selected from the group consisting of a phenol polymer resin and a cresol polymer resin, each of which contains a hydroxyl group.

5. The Mine negative photoresist composition of claim 4 , wherein the phenol polymer resin is obtained from at least one monomer selected from the group consisting of 4-hydroxy-3-methyl benzoic acid, 4-hydroxy-2-methyl benzoic acid, 5-hydroxy-2-methyl benzoic acid, 3,5-di-tert-butyl-4-hydroxy benzoic acid, 4-hydroxy-3,5-dimethyl benzoic acid, 4-hydroxy isophthalic acid, 2,4,6-hydroxy toluene, 2,4,6-trihydroxy benzoic acid monohydrate, and 2,4,6-trihydroxy benzaldehyde, and the cresol polymer resin is obtained from at least one monomer selected from the group consisting of o-cresol, p-cresol, m-cresol, epoxy o-cresol, epoxy p-cresol, and epoxy m-cresol.

6. The Mine negative photoresist composition of claim 1 , wherein the crosslinking agent includes at least one selected from the group consisting of tris(2,3-epoxypropyl)isocyanurate, trimethylolmethane triglycidyl ether, trimethylolpropane triglycidyl ether, hexamethylol melamine, trimethylolethane triglycidyl ether, hexamethoxymethyl melamine, hexamethoxyethyl melamine, tetramethylol 2,4-diamino-1,3,5-triazine, tetramethoxymethyl-2,4-diamino-1,3,5-triazine, tetramethylol glycoluril, tetramethoxymethyl glycoluril, tetramethoxyethyl glycoluril, tetramethylol urea, tetramethoxymethyl urea, tetramethoxyethyl urea, and tetramethoxyethyl-2,4-diamino-1,3,5-triazine.

7. The Mine negative photoresist composition of claim 1 , wherein the photoacid generator includes at least one selected from the group consisting of tris(trichloromethyl)triazine, 1,1-bis(p-chlorophenyl)-2,2,2-trichloroethane, tris(methanesulfonyl)benzene, 1,1-bis(chlorophenyl)-2,2,2-trichloroethanol, 2,4,6-tris(tribromomethyl)-s-triazine, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2-phenyl-4,6-bis(tribromomethyl)-s-triazine, 2-(4-methoxy-phenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2,4,6-tris(chloromethyl)-1,3,5-triazine, triphenylsulfonium triflate, and tribromophenyl sulfone.

8. The Mine negative photoresist composition of claim 1 , wherein the acid diffusion inhibitor includes at least one selected from the group consisting of methyltriamine, ethyltriamine, dimethylamine, diethylamine, trimethylamine, triethylamine, tributylamine, methanol triamine, ethanol triamine, dimethanolamine, diethanolamine, trimethanolamine, triethanolamine, and tributanolamine.