Semiconductor device and method for manufacturing same
To provide a manufacturing method capable of manufacturing a high density semiconductor device excellent in transmission between chips at a favorable yield and at low cost. A method for manufacturing a semiconductor device includes an insulating layer forming step of forming an insulating layer 3 having a trench 4 above a substrate 1 , a copper layer forming step of forming a copper layer 5 a on the insulating layer 3 so as to fill the trench 4 , and a removing step of removing the copper layer 5 a on the insulating layer 3 by a fly cutting method so as to retain a copper layer part in the trench 4.
1. A method for manufacturing a semiconductor device, comprising:
forming an insulating layer having a trench above a substrate;
forming a copper layer on the insulating layer so as to fill the trench with a copper layer part; and
removing the copper layer on the insulating layer by a fly cutting method so as to retain an exposed copper layer part in the trench and an exposed portion of the insulating layer;
wherein, after removing the copper layer on the insulating layer, a surface roughness of each of the exposed portion of the insulating layer and the exposed copper layer part is 0.03 μm or more and 0.1 μm or less.
2. The method for manufacturing the semiconductor device according to claim 1 ,
wherein in the removing the copper layer, removing a part of the insulating layer by the fly cutting method.
3. The method for manufacturing the semiconductor device according to claim 2 ,
wherein the part of the insulating layer is set within 10% of a thickness of the insulating layer.
4. The method for manufacturing the semiconductor device according to claim 3 ,
wherein the part of the insulating layer is in a vicinity of an upper surface of the insulating layer and is set within 10% of a thickness of the insulating layer.
5. The method for manufacturing the semiconductor device according to claim 1 ,
wherein the insulating layer is formed using a photosensitive resin material, and
wherein the method further comprises forming the trench on the insulating layer by exposing and developing the insulating layer before the forming the copper layer.
6. The method for manufacturing the semiconductor device according to claim 1 ,
wherein the trench has a line width of 0.5 to 5 μm.
7. The method for manufacturing the semiconductor device according to claim 1 ,
wherein forming the copper layer includes: applying a copper paste to at least the trench on the insulating layer: and sintering the copper paste to form the copper layer.
8. The method for manufacturing the semiconductor device according to claim 7 ,
wherein a volume resistivity of the copper layer after the sintering is 3 to 40 μΩ·cm.
9. The method for manufacturing the semiconductor device according to claim 7 ,
wherein in the sintering, the copper paste is heated at 80 to 200° C. in a presence of acid.
10. The method for manufacturing the semiconductor device according to claim 1 , further comprising forming a temporary fixing layer on the substrate,
wherein in forming the insulating layer, the insulating layer is formed on the temporary fixing layer.
11. The method for manufacturing the semiconductor device according to claim 10 ,
wherein the temporary fixing layer contains particles being capable of expanding in volume at 200° C. or more.
12. A semiconductor device comprising:
a substrate;
a wiring body on the substrate, the wiring body including a plurality of wiring layers stacked on each other; and
a semiconductor element on the wiring body
wherein each of the plurality of wiring layers includes an insulating layer having a trench on its first surface side, and a copper wiring filled in the trench, and
wherein a surface roughness of each of the insulating layers on its first surface side and the copper wiring on its first surface side is 0.03 μm or more and 0.1 μm or less.
13. The semiconductor device according to claim 12 ,
wherein a volume resistivity of the copper wiring is 3 to 40 μΩ·cm.
14. The semiconductor device according to claim 12 , further comprising:
an electrode between the wiring body and the semiconductor element, the electrode being electrically connected to the copper wiring and the semiconductor element; and
an underfill material between the wiring body and the semiconductor element,
wherein the wiring body and the semiconductor element are fixed by the underfill material.
15. The semiconductor device according to claim 12 ,
wherein the substrate includes a main body having an opening and a conductive material filled in the opening, and
wherein the copper wiring is electrically connected to the conductive material.
16. A semiconductor device comprising:
a substrate;
a wiring layer above the substrate; and
a semiconductor element above the wiring layer,
wherein the wiring layer includes:
an insulating layer having a trench located in the insulating layer; and
a copper wiring filled in the trench, and
wherein a surface roughness of each of the insulating layer and the copper wiring is 0.03 μm or more and 0.1 μm or less.
17. The semiconductor device according to claim 16 ,
wherein a volume resistivity of the copper wiring is 3 to 40 μΩ·cm.
18. The semiconductor device according to claim 16 , further comprising:
an electrode between the wiring layer and the semiconductor element, the electrode being electrically connected to the copper wiring and the semiconductor element; and
an underfill material between the wiring layer and the semiconductor element,
wherein the wiring layer and the semiconductor element are fixed by the underfill material.
19. The semiconductor device according to claim 16 ,
wherein the substrate includes a main body having an opening and a conductive material filled in the opening, and
wherein the copper wiring is electrically connected to the conductive material.