Thermal chemical vapor deposition coating

1. A thermal chemical vapor deposition coated article, comprising:

a substrate; and

a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques;

wherein the coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers;

wherein the coating includes amorphous silicon at least partially formed from silane.

2. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating has a concentration of the particulate from the gas phase nucleation, per 100 square micrometers, of between 2 and 4 of the particles having a dimension of greater than 2 micrometers.

3. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating has a concentration of the particulate from the gas phase nucleation, per 100 square micrometers, of fewer than 3 of the particles having a dimension of greater than 2 micrometers.

4. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating has a concentration of the particulate from the gas phase nucleation, per 100 square micrometers, of fewer than 3 of the particles having a dimension of greater than 2 micrometers and fewer than 4 of the particles having a dimension of greater than 1.5 micrometers.

5. The thermal chemical vapor deposition coated article of claim 1 , wherein the regions of the thermal chemical vapor deposition coated article are unable to be coated, whether concurrently or sequentially, through line-of-sight techniques.

6. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating is at least partially formed from silane and ethylene.

7. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating is at least partially formed from silane and an oxidizer.

8. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating is at least partially formed from dimethylsilane.

9. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating is functionalization by trimethylsilane.

10. The thermal chemical vapor deposition coated article of claim 1 , wherein the thermal chemical vapor deposition coated article is tubing.

11. The thermal chemical vapor deposition coated article of claim 1 , wherein the thermal chemical vapor deposition coated article is a component having channels, curves, threading, vanes, protrusions, cavities, junctions, mating interfaces, or a combination thereof.

12. The thermal chemical vapor deposition coated article of claim 1 , wherein the substrate is metal or metallic.

13. The thermal chemical vapor deposition coated article of claim 1 , wherein the substrate is stainless steel, aluminum, or an aluminum alloy.

14. The thermal chemical vapor deposition coated article of claim 1 , wherein the substrate is titanium or a titanium alloy.

15. The thermal chemical vapor deposition coated article of claim 1 , wherein the substrate is a non-metal.

16. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating has a thickness of greater than 100 nanometers.

17. The thermal chemical vapor deposition coated article of claim 1 , wherein the coating has a thickness of greater than 500 nanometers.

18. A thermal chemical vapor deposition coated article, comprising:

a substrate; and

a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques;

wherein the coating has a concentration of particulate from gas phase nucleation that is, per 100 square micrometers, fewer than 6 particles having a dimension of greater than 0.5 micrometers;

wherein the regions of the thermal chemical vapor deposition coated article are unable to be coated, whether concurrently or sequentially, through line-of-sight techniques;

wherein the coating is an amorphous silicon coating at least partially formed from silane;

wherein the substrate is metal or metallic;

wherein the coating has a thickness of greater than 100 nanometers.

19. A thermal chemical vapor deposition process, comprising:

positioning an article within an enclosed vessel within an enclosed chamber; then

introducing a first aliquot of a silicon-containing precursor to the enclosed vessel; then

gaseously soaking the article with the first aliquot of the silicon-containing precursor at a temperature above the thermal decomposition temperature of the silicon-containing precursor; then

introducing a second aliquot of the silicon-containing precursor to the enclosed vessel or introducing a different silicon-containing precursor to the enclosed vessel; and then

gaseously soaking the article with the second aliquot of the silicon-containing precursor or the different silicon-containing precursors;

wherein the thermal chemical vapor deposition process produces a coating on the article, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques;

wherein the coating has a concentration of particulate from gas phase nucleation that is, per 100 square micrometers, fewer than 6 particles having a dimension of greater than 0.5 micrometers;

wherein the coating includes amorphous silicon at least partially formed from silane.