Slurry composition for CMP and polishing method using same
Provided are a slurry composition for CMP and a polishing method using the same, in which polishing can be performed by freely adjusting the selectivity ratio of a silicon oxide film, a silicon nitride and a polysilicon film through control of the amounts of additive and solvent, and thus the slurry composition can be efficiently applied to the process of manufacturing a semiconductor, requiring selective removal of a silicon nitride film and a polysilicon film relative to a silicon oxide film.
1. A slurry composition for chemical-mechanical polishing (CMP), suitable for polishing by adjusting a selectivity ratio of a silicon oxide film, a silicon nitride film and a polysilicon film, comprising:
0.2 to 10 wt % of an abrasive comprising colloidal silica;
0.001 to 7 wt % of an additive including A) glutaric acid and 5-methyl benzotriazole and including B) polyethylene glycol; and
a remainder of a solvent,
wherein the additive comprises the polyethylene glycol, the 5-methyl benzotriazole and the glutaric acid at a ratio of 0˜5.0:0˜5.0:0˜5.0, the polyethylene glycol, the glutaric acid, and the 5-methyl benzotriazole being added in ratios exceeding 0, and
a polishing selectivity ratio of the silicon oxide film, the silicon nitride film, and the polysilicon film upon the polishing is 1:10˜20:1˜22.2.
2. The slurry composition for CMP of claim 1 , wherein the colloidal silica has a particle size of 10 to 120 nm.
3. The slurry composition for CMP of claim 1 , wherein the polyethylene glycol is configured to adjust a selectivity ratio of the polysilicon film, and the 5-methyl benzotriazole and the glutaric acid are configured to adjust a selectivity ratio of the silicon nitride film.
4. The slurry composition for CMP of claim 1 , wherein the slurry composition for CMP has a pH of 3 to 5.
5. The slurry composition for CMP of claim 1 , wherein the slurry composition for CMP simultaneously polishes films to be polished, including at least two selected from among the silicon oxide film, the silicon nitride film and the polysilicon film.
6. The slurry composition for CMP of claim 1 , wherein the slurry composition for CMP is used in a form of a single slurry by incorporating the additive in the abrasive.
7. The slurry composition for CMP of claim 1 , further comprising a water-soluble polymer.
8. The slurry composition for CMP of claim 7 , wherein the water-soluble polymer includes at least one selected from the group consisting of polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acid and hydroxyethyl cellulose, and is used in an amount of 0.001 to 5 wt % based on a total weight of the composition.
9. A polishing method using a slurry composition for CMP, comprising polishing a semiconductor wafer using the slurry composition for CMP of claim 1 .
10. The polishing method of claim 9 , wherein the abrasive and additive are individually injected, whereby the polishing is performed by adjusting a selectivity ratio of the silicon oxide film, the silicon nitride film, and the polysilicon film through control of an amount of the additive.
11. The polishing method of claim 9 , wherein the polishing is performed by adjusting a selectivity ratio of the polysilicon film through control of an amount of the polyethylene glycol as the additive, and the polishing is performed by adjusting a selectivity ratio of the silicon nitride film through control of amounts of the 5-methyl benzotriazole and glutaric acid.