IP Library Granted Patent US 10,541,134
Granted Patent B2
US 10,541,134 · App. 15/772,258 · Granted Jan 21, 2020

Halometallate ligand-capped semiconductor nanocrystals

Inventors: James Kurley (Chicago, IL); Hao Zhang (Urbana, IL); Dmitri V. Talapin (Riverside, IL); Jake Russell (Arlington, TN); Margaret Hervey Hudson (Chicago, IL)
Assignee: The University of Chicago
H01L21/02628G01T1/2023H01L21/0256H01L21/02554H01L21/02562H01L21/02601
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Quick Facts
Patent No.
US 10,541,134
App. No.
15/772,258
Granted
Jan 21, 2020
Kind
B2
Abstract

Halometallate-capped semiconductor nanocrystals and methods for making the halometallate-capped semiconductor nanocrystals are provided. Also provided are methods of using solutions of the halometallate-capped semiconductor nanocrystals as precursors for semiconductor film formation. When solutions of the halometallate ligand-capped semiconductor nanocrystals are annealed, the halometallate ligands can act as grain growth promoters during the sintering of the semiconductor nanocrystals.

Claims (50)

1. A method of forming a semiconductor film, the method comprising:

forming a solution of halometallate-capped semiconductor nanocrystals, the halometallate-capped semiconductor nanocrystals comprising:

semiconductor nanocrystals, each semiconducting nanocrystal having a surface; and

halometallate ligands bound to the surfaces of the semiconductor nanocrystals;

forming a coating of the solution comprising the halometallate-capped semiconductor nanocrystals on a substrate surface; and

annealing the coating, wherein the nanocrystals are sintered to form the semiconductor film.

2. The method of claim 1 , wherein the halometallate ligands act as grain growth promoters for the semiconductor nanocrystals during the annealing of the coating.

3. The method of claim 1 , wherein the semiconductor nanocrystals are Group II-VI nanocrystals.

4. The method of claim 3 , wherein the Group II-VI nanocrystals comprise a metastable phase of the Group II-VI semiconductor.

5. The method of claim 3 , wherein the Group II-VI nanocrystals comprise CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Cd x Zn 1-x Se nanocrystals, Cd x Zn 1-x S nanocrystals, CdSe nanocrystals, CdS nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1.

6. The method of claim 3 , wherein the Group II-VI nanocrystals are CdTe nanocrystals.

7. The method of claim 1 , wherein the halometallate ligands comprise halometallates of metals selected from group 12 or group 13 of the periodic table of the elements.

8. The method of claim 1 , wherein the halometallate ligands are selected from CdCl 3 − anions, CdCl 4 2− anions, CdI 3 − anions, CdBr 3 − anions, CdBr 4 2− anions, InCl 4 − anions, HgCl 3 − anions, ZnCl 3 − anions, ZnCl 4 2− anions, and ZnBr 4 2− anions, and mixtures of two or more thereof.

9. The method of claim 6 , wherein the halometallate ligands comprise CdCl 3 − anions.

10. The method of claim 1 , wherein the semiconductor nanocrystals comprise core-shell nanocrystals; the shells of the core-shell nanocrystals comprise a Group II-VI semiconductor; and the semiconductor film comprises the cores of the nanocrystals dispersed in a matrix comprising the sintered shells of the nanocrystals.

11. The method of claim 10 , wherein the cores of the core-shell nanocrystals comprise a Group III-V semiconductor.

12. The method of claim 10 , wherein the Group II-VI semiconductor is CdTe, HgSe, HgTe, HgS, Hg x Cd 1-x Te, Hg x Cd 1-x S, Hg x Cd 1-x Se, Cd x Zn 1-x Te, Cd x Zn 1-x Se, Cd x Zn 1-x S nanocrystals, CdSe, CdS, ZnS, ZnSe, ZnTe, or mixtures of two or more thereof, where 0<x<1.

13. The method of claim 1 , wherein coating a solution comprising the halometallate-capped semiconductor nanocrystals on a substrate surface comprises doctor blading or spray-coating the solution comprising the halometallate-capped semiconductor nanocrystals onto the substrate surface.

14. The method of claim 5 , wherein the Group II-VI nanocrystals comprise CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Cd x Zn 1-x Se nanocrystals, Cd x Zn 1-x S nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1.

15. The method of claim 8 , wherein the halometallate ligands are selected from CdCl 4 2− anions, CdI 3 − anions, CdBr 4 2− anions, ZnCl 3 − anions, and ZnBr 4 2− anions, and mixtures of two or more thereof.

16. The method of claim 8 , wherein the halometallate ligands are HgCl 3 − anions.

17. A method of forming an optoelectronic device, the method comprising:

forming a solution of halometallate-capped semiconductor nanocrystals, the halometallate-capped semiconductor nanocrystals comprising:

semiconductor nanocrystals, each semiconducting nanocrystal having a surface; and

halometallate ligands bound to the surfaces of the semiconductor nanocrystals;

forming a coating of the solution comprising the halometallate-capped semiconductor nanocrystals on a surface of a first electrode;

annealing the coating, wherein the semiconductor nanocrystals are sintered to form a photoactive, light-absorbing semiconductor film;

forming a layer of charge transporting material over the photoactive, light-absorbing semiconductor film; and

forming a second electrode on the layer of charge transporting material.

18. The method of claim 17 , wherein the semiconductor nanocrystals comprise CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Hg x Cd 1-x Se nanocrystals, Hg x Cd 1-x S nanocrystals, CdSe nanocrystals, CdS nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1.

19. The method of claim 17 , wherein the semiconductor nanocrystals are CdTe nanocrystals.

20. The method of claim 17 , wherein the halometallate ligands are selected from CdCl 4 2− anions, CdI 3 − anions, CdBr 4 2− anions, ZnCl 3 − anions, and ZnBr 4 2− anions, and mixtures of two or more thereof.

21. The method of claim 17 , wherein the halometallate ligands are HgCl 3 − anions.

22. The method of claim 18 , wherein the Group II-VI nanocrystals comprise CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Cd x Zn 1-x Se nanocrystals, Cd x Zn 1-x S nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1.

23. The method of claim 19 , wherein the halometallate ligands comprise CdCl 3 − anions.

24. A method of forming a field effect transistor, the method comprising:

forming a solution of halometallate-capped semiconductor nanocrystals, the halometallate-capped semiconductor nanocrystals comprising:

semiconductor nanocrystals, each semiconducting nanocrystal having a surface; and

halometallate ligands bound to the surfaces of the semiconductor nanocrystals;

forming a coating of the solution comprising the halometallate-capped semiconductor nanocrystals on a surface of a gate dielectric layer;

annealing the coating, wherein the semiconductor nanocrystals are sintered to form a semiconductor film that provides a conducting channel layer for the field effect transistor;

forming a source electrode on the semiconductor film;

forming a drain electrode on the semiconductor film; and

forming a gate electrode on the gate dielectric layer.

25. The method of claim 24 , wherein the semiconductor nanocrystals comprise CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Cd x Zn 1-x Se nanocrystals, Cd x Zn 1-x S nanocrystals, CdSe nanocrystals, CdS nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1.

26. Halometallate-capped Group II-VI nanocrystals comprising:

Group II-VI nanocrystals selected from the group consisting of CdTe nanocrystals, HgSe nanocrystals, HgTe nanocrystals, HgS nanocrystals, Hg x Cd 1-x Te nanocrystals, Hg x Cd 1-x S nanocrystals, Hg x Cd 1-x Se nanocrystals, Cd x Zn 1-x Te nanocrystals, Cd x Zn 1-x Se nanocrystals, Cd x Zn 1-x S nanocrystals, ZnS nanocrystals, ZnSe nanocrystals, ZnTe nanocrystals, or mixtures of two or more thereof, where 0<x<1, each nanocrystals having a surface; and

halometallate ligands bound to the surfaces of the Group II-VI nanocrystals, wherein the halometallate ligands are anions having one of the formulas MX 3 − , MX 4 − , and MX 4 2 − , where M is an element selected from group 12 of the periodic table and X is a halide atom.

27. The nanocrystals of claim 26 , wherein the Group II-VI nanocrystals are CdTe nanocrystals.

28. A method of making the halometallate-capped Group II-VI nanocrystals of claim 26 , the method comprising forming a solution comprising organic ligand-capped Group II-VI nanocrystals and the anions under conditions that facilitate the exchange of the anions with the organic ligands capping the Group II-VI nanocrystals, whereby the halometallate-capped Group II-VI nanocrystals of claim 19 are formed.

Assignments (2)
CONFIRMATORY LICENSE Recorded Nov 17, 2020
From: UNIVERSITY OF CHICAGO
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 054451/0516 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2018
From: TALAPIN, DMITRI V.; KURLEY, JAMES; RUSSELL, JAKE; ZHANG, HAO; HUDSON, MARGARET HERVEY
To: THE UNIVERSITY OF CHICAGO
Reel/Frame 045670/0468 →
Continuity (2)
Provisional Application 62249540 · Nov 2, 2015
Related Publication 20180315600A1 · Nov 1, 2018