Manufacturing method of semiconductor device
The disclosure includes: a first lifting step for bonding a wire at a first position ( 13 ) with a capillary and for lifting the capillary up to a first height H 1 while feeding the wire; a circular arc lifting step for carrying out a circular arc motion for moving the capillary in a circular arc toward a second position ( 14 ) by a first distance (L 5 ), and then carrying out a lifting motion for lifting the capillary while feeding the wire; a circular arc motion step for moving the capillary in a circular arc toward the first position ( 13 ) by a second distance (L 3 +L 4 ); a second lifting step for lifting the capillary up to a second height H 4 ; and a looping step for looping the capillary to the second position ( 14 ), thereby forming a wire loop having a predetermined height on a substrate by bonding the wire at the second position ( 14 ).
1. A manufacturing method of a semiconductor device, comprising:
a first lifting step for bonding a wire at a first position on a substrate by a capillary and for lifting the capillary to a first height while feeding the wire from the capillary;
a circular arc lifting step for carrying out a circular arc motion for moving the capillary in a circular arc in a direction toward a second position on the substrate that is spaced apart from the first position by a first distance, and then carrying out a lifting motion for lifting the capillary while feeding the wire from the capillary to apply a bending habit to the wire;
a circular arc motion step for moving the capillary in a circular arc in a direction toward the first position by a second distance longer than the first distance;
a second lifting step for lifting the capillary up to a second height higher than the first height while feeding the wire from the capillary; and
a looping step for looping the capillary to the second position; wherein
by bonding the wire at the second position, a wire loop having a predetermined height is formed on the substrate.
2. The manufacturing method of a semiconductor device according to claim 1 , wherein
the circular arc lifting step is carried out for several times.
3. The manufacturing method of a semiconductor device according to claim 1 , wherein
the capillary is a stepped cone shape having a tapered elementary part and a front part thinner than the elementary part;
the wire loop is a mountain shape whose height from the substrate is higher than a length of the front part of the capillary, and an angle of a sloping part on the second position side of the wire loop with respect to an imaginary perpendicular line of the substrate is larger than a spread angle of an external surface of the elementary part with respect to a central axis of the capillary;
the first height is 60-90% of the height of the wire loop;
the first distance is 50-80% of the height of the wire loop;
the second distance is 110-130% of the height of the wire loop; and
the second height is 160-210% of the height of the wire loop.