Laminated film
The aim of the present invention lies in inexpensively providing a thin-film laminated film having excellent barrier properties. A further aim of the present invention lies in providing a method for producing a thin-film laminated film in which a plurality of thin films are coated on a plastic film by means of atmospheric-pressure plasma CVD which has low equipment costs and running costs, and also in providing a thin-film laminated film production apparatus which is able to operate continuously for a long period of time and can produce high-speed coating. A thin film according to the present invention includes a plastic film, a first silicon oxide-based thin film containing silicon oxide as the main component, and a first amorphous carbon-based thin film. The first amorphous carbon-based thin film is formed on the first silicon oxide-based thin film. The first silicon oxide-based thin film has pinholes with a diameter in the range of 10-200 nm.
1. A thin-film laminated film comprising:
a plastic film;
a first amorphous carbon-based thin film formed on one surface of the plastic film;
a first silicon oxide-based thin film formed on one surface of the first amorphous carbon-based thin film; and
a second amorphous carbon-based thin film formed on one surface of the first silicon oxide-based thin film,
wherein the first silicon oxide-based thin film has pinholes formed by atmospheric-pressure plasma CVD such that the pinholes have diameters of between 10 nm and 200 nm.
2. The thin-film laminated film according to claim 1 , wherein a part of the second amorphous carbon-based thin film fits into the pinholes.
3. The thin-film laminated film according to claim 1 , wherein
a thickness of the first amorphous carbon-based thin film is between 10 nm and 150 nm at a location having no pinholes, and
a thickness of the first silicon oxide-based thin film is between 5 nm and 100 nm at a location having no pinholes.
4. The thin-film laminated film according to claim 1 , wherein the plastic film is at least one of a polyester-based film or a nylon film.
5. The thin-film laminated film according to claim 1 , wherein
the first amorphous carbon-based thin film and the second amorphous carbon-based thin film are formed by atmospheric-pressure plasma CVD, and
a part of the second amorphous carbon-based thin film that is formed by atmospheric-pressure plasma CVD fits into the pinholes of the first silicon oxide-based thin film that are formed by atmospheric-pressure plasma CVD.