High refractive index waveguides and method of fabrication
Optical component and methods for forming optical components are described. The optical component includes a substrate having a base and a fin extending from the base, a buffer layer formed on the substrate leaving a portion of the fin exposed, and a confinement layer deposited over the buffer layer and the fin. The refractive index of the substrate is greater than the refractive index of the confinement layer, and the refractive index of the confinement layer is greater than the refractive index of the buffer layer.
1. A method for fabricating an optical component, comprising:
forming, on a substrate having a base and a fin extending from the base, a buffer layer leaving a portion of the fin exposed and having sides and a top, each of which extends above the buffer layer, the substrate having a first refractive index and the buffer material having a second refractive index; and
depositing a confinement layer over the buffer layer and directly on the sides and the top of the portion of the fin that extends above the buffer layer to form an optical waveguide, the confinement layer having a third refractive index;
wherein the first refractive index is greater than the third refractive index, and the third refractive index is greater than the second refractive index.
2. The method of claim 1 , wherein;
the substrate is diamond, silicon or silicon carbide, the buffer layer is silicon dioxide, and the confinement layer is silicon nitride.
3. The method of claim 1 , further comprising:
fabricating electronic circuitry and photonic integrated circuit devices on the substrate and connecting the electronic circuitry via the optical waveguide.
4. An optical component, comprising:
a substrate having a base and a fin extending from the base, the substrate having a first refractive index;
a buffer layer formed on the substrate leaving a portion of the fin exposed and having sides and a top, each of which extends above the buffer layer, the buffer layer having a second refractive index; and
a confinement layer deposited over the buffer layer and directly on the sides and the top of the portion of the fin that extends above the buffer layer, the confinement layer having a third refractive index;
wherein the first refractive index is greater than the third refractive index, and the third refractive index is greater than the second refractive index.
5. The optical component of claim 4 , wherein;
the substrate is diamond, silicon or silicon carbide, the buffer layer is silicon dioxide, and the confinement layer is silicon nitride.
6. The optical component of claim 4 , further comprising:
electronic circuitry and photonic integrated circuit devices fabricated on the substrate and connected via the optical waveguide.