IP Library › Granted Patent US 11,119,536
Granted Patent B2
US 11,119,536 · App. 15/778,481 · Granted Sep 14, 2021

Flexible electronic device and manufacturing method therefor

Inventors: Qi Shan (KunShan, CN); Kun Hu (KunShan, CN); Li Lin (KunShan, CN); Shixing Cai (KunShan, CN); Shengfang Liu (KunShan, CN)
Assignees: KUNSHAN NEW FLAT PANEL DISPLAY TECHNOLOGY CENTER CO., LTD.; KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
G06F1/1652G02F1/133305G09F9/30G09F9/301H01L27/12H01L51/0097
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Quick Facts
Patent No.
US 11,119,536
App. No.
15/778,481
Granted
Sep 14, 2021
Kind
B2
Abstract

Provided are a flexible electronic device and a manufacturing method thereof. The flexible electronic device ( 200 ) comprises a flexible substrate ( 210 ) and a device layer formed on the flexible substrate ( 210 ). The device layer comprises a semiconductor structure ( 220 ) and a wire structure ( 230 ) connected to the semiconductor structure, the wire structure ( 230 ) having an extension direction same to a channel direction of the semiconductor structure ( 220 ). The extension direction of the first wire structure ( 230 ) forms an included angle smaller than 90° with respect to a stretching direction of the flexible substrate ( 210 ). In the flexible electronic device ( 200 ) and manufacturing method thereof of the present invention, the channel direction of the semiconductor structure ( 220 ) and the extension direction of the first wire structure ( 230 ) are adjusted, such that the semiconductor structure ( 220 ) and the first wire structure ( 230 ) are least affected by a stress, thus ensuring electrical property and flexibility of the flexible electronic device ( 200 ).

Claims (21)

1. A flexible electronic device, comprising: a flexible substrate and a device layer formed on the flexible substrate, wherein:

the device layer comprises a semiconductor structure and a first wire structure connected to the semiconductor structure, the first wire structure extending along an extending direction same to a channel direction of the semiconductor structure;

the extending direction of the first wire structure forms an included angle smaller than 90° with respect to a stretching direction of the flexible substrate;

the semiconductor structure is a thin film transistor including a gate, a drain, and a channel, and the first wire structure matches up with the semiconductor structure to form an electrical connection to a device; and

a second wire structure provided on an edge of the flexible substrate, the second wire structure extending along an extending direction parallel to an edge line of the flexible substrate, a plurality of through holes having borders respectively spaced and being formed in the second wire structure, each of the through holes having a parallelogram shape with a diagonal line of the parallelogram extending along a direction same to the stretching direction of the flexible substrate.

2. The flexible electronic device of claim 1 , wherein the included angle ranges from 40° to 70°.

3. The flexible electronic device of claim 1 , wherein the flexible electronic device is a flexible flat panel display device, the device layer having a plurality of pixel units, a boundary of the pixel unit being formed in a parallelogram shape with a diagonal line thereof extending along a direction same to the stretching direction of the flexible substrate.

4. The flexible electronic device of claim 3 , wherein an included angle formed between a side edge of the parallelogram shape and the corresponding diagonal line of the parallelogram shape ranges from 40° to 70°.

5. The flexible electronic device of claim 3 , wherein the flexible electronic device is a flexible liquid crystal display.

6. The flexible electronic device of claim 3 , wherein the flexible electronic device is a flexible organic light-emitting display.

7. A method for manufacturing a flexible electronic device, comprising:

providing a flexible substrate; and

respectively forming a semiconductor structure and a first wire structure on the flexible substrate, wherein the semiconductor structure has a channel direction same to an extending direction of the first wire structure, the channel direction of the semiconductor structure forms an included angle smaller than 90° with respect to a stretching direction of the flexible substrate, wherein the semiconductor structure is a thin film transistor including a gate, a drain, and a channel, and the first wire structure matches up with the semiconductor structure to form an electrical connection to a device and wherein the device layer further comprises a second wire structure provided on an edge of the flexible substrate, the second wire structure extending along an extending direction parallel to an edge line of the flexible substrate; and a plurality of through holes having borders respectively spaced and being formed in the second wire structure, each of the through holes having a parallelogram shape with a diagonal line of the parallelogram extending along a direction same to the stretching direction of the flexible substrate.

8. A method for manufacturing a flexible electronic device, comprising:

providing a flexible substrate;

respectively forming a plurality of pixel units, a first wire structure and a second wire structure on the flexible substrate, the pixel unit having a semiconductor structure, the semiconductor structure having a channel direction same to an extending direction of the first wire structures, the channel direction of the semiconductor structure forming an included angle smaller than 90° with respect to a stretching direction of the flexible substrate;

providing the second wire structure on an edge of the flexible substrate, the second wire structure extending along an extending direction parallel to an edge line of the flexible substrate; and

forming a plurality of through holes in the second wire structure, the through holes each having a parallelogram shape with a diagonal line of the parallelogram extending along a direction same to the stretching direction of the flexible substrate, wherein the plurality of holes having borders respectively spaced,

the semiconductor structure is a thin film transistor including a gate, a drain, and a channel, and the first wire structure matches up with the semiconductor structure to form an electrical connection to a device.

9. The flexible electronic device of claim 4 , wherein the included angle formed between a side edge of the parallelogram shape and the corresponding diagonal line of the parallelogram shape is substantially 60°.

10. The method of claim 7 , wherein the forming of a semiconductor structure and a first wire structure on the flexible substrate comprises forming a semiconductor structure and a first wire structure on the flexible substrate by graphic process.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 24, 2018
From: SHAN, QI; HU, KUN; LIN, LI; CAI, SHIXING; LIU, SHENGFANG
To: KUNSHAN NEW FLAT PANEL DISPLAY TECHNOLOGY CENTER CO., LTD.; KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
Reel/Frame 045894/0562 →
Priority Claims (1)
CN 201610150011.7 · Mar 16, 2016 · national
Continuity (1)
Related Publication 20180341291A1 · Nov 29, 2018