IP Library Granted Patent US 10,573,489
Granted Patent B2
US 10,573,489 · App. 15/780,678 · Granted Feb 25, 2020

Charged particle beam device and optical-axis adjusting method thereof

Inventor: Shuhei Yabu (Tokyo, JP)
Assignee: Hitachi High-Technologies Corporation
H01J37/263H01J37/12H01J37/141H01J37/1471H01J37/1475H01J37/1477H01J37/21H01J37/28H01J2237/1501
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Quick Facts
Patent No.
US 10,573,489
App. No.
15/780,678
Granted
Feb 25, 2020
Kind
B2
Abstract

A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam in the downstream of the condenser lens system.

Claims (61)

1. A charged particle beam device comprising:

a charged particle source which emits a charged particle beam to be radiated on a sample;

a condenser lens system which has at least one condenser lens configured to focus the charged particle beam at a predetermined first demagnification and a predetermined second demagnification lower than the first magnification;

a deflector which is positioned between a condenser lens of a most downstream side in the condenser lens system and the charged particle source, and configured to move a virtual position of the charged particle source;

an objective aperture; and

a control unit configured to control the deflector and the condenser lens system,

wherein the control unit is configured to:

control the condenser lens system to change the focusing of the charged particle beam from the first demagnification to the second demagnification, and

control the deflector to move, when the condenser lens system changes to the second demagnification, the virtual position of the charged particle source to a position where a center trajectory of the charged particle beam between the condenser lens system and the objective aperture in a case where the condenser lens system has the second demagnification matches a center trajectory of the charged particle beam between the condenser lens system and the objective aperture in a case where the condenser lens system has the first demagnification.

2. The charged particle beam device according to claim 1 , wherein:

the condenser lens system has two or more condenser lenses,

the condenser lens system is further configured to focus the charged particle beam at a predetermined third demagnification, and

the control unit is configured to:

move a focusing point of the charged particle beam between the condenser lens system and the objective aperture such that the center trajectory of the charged particle beam between the condenser lens system and the objective aperture in a case where the condenser lens system has the third demagnification substantially matches the center trajectory in a case where the condenser lens system has the first demagnification or the second demagnification.

3. The charged particle beam device according to claim 1 , further comprising:

an objective lens which focuses the charged particle beam to the sample,

an optical system which is connected to the control unit and configured to adjust a condition of a radiation of the charged particle beam to the sample,

wherein the control unit is configured to control the optical system such that the center trajectory of the charged particle beam passes through a central axis in a main surface of the objective lens in the cases where the condenser lens system has the first demagnification and the second demagnification.

4. The charged particle beam device according to claim 3 , further comprising:

a detector which detects a signal obtained by scanning the charged particle beam on the aperture, and

the control unit is configured to:

form an image, which indicates a positional relation between a central axis of the objective lens and the center trajectory of the charged particle beam on the basis of the signal of the detector,

display the image formed by the signal processing unit.

5. The charged particle beam device according to claim 4 , wherein

the objective aperture is a fixed type.

6. The charged particle beam device according to claim 4 ,

wherein the condition of the optical system is operatable independently in a case where the condenser lens system has the first demagnification and in a case where the condenser lens system has the second demagnification.

7. A charged particle beam device comprising:

a charged particle source which emits a charged particle beam radiated on the sample;

an optical system configured to adjust a condition of radiation of the charged particle beam on the sample and which includes:

a condenser lens system which has at least one condenser lens configured to focus the charged particle beam at a predetermined first demagnification and a predetermined second demagnification lower than the first magnification;

a deflector which is positioned between a condenser lens of a most downstream side in the condenser lens system and the charged particle source, and configured to move a virtual position of the charged particle source,

an objective aperture, and

an objective lens configured to focus the charged particle beam to the sample;

a detector which detects a signal obtained by colliding the charged particle beam with the sample;

a control unit configured to collect information of a positional relation between a central axis of the objective lens and a center trajectory of the charged particle beam between the condenser lens system and the objective aperture from the signal of the detector, and to control operating conditions of the optical system; and

a display device; and

wherein the control unit is configured to:

display information of the positional relation between the central axis of the objective lens and the center trajectory of the charged particle beam on the display device,

display a user interface on the display device and to receive operator input via the user interface, and

control the deflector to move the virtual position of the charged particle source to a position where a center trajectory of the charged particle beam between the condenser lens system and the objective aperture in a case where the condenser lens system has the second demagnification matches a center trajectory of the charged particle beam between the condenser lens system and the objective aperture in a case where the condenser lens system has the first demagnification.

8. The charged particle beam device according to claim 7 , wherein

the control unit is configured to control the operating conditions of the optical system such that the center trajectory passes through a central axis in a main surface of the objective lens in a case where the condenser lens system has the first demagnification.

9. The charged particle beam device according to claim 7 , wherein:

the detector detects the signal by scanning the charged particle beam on the objective aperture,

the control unit is configured to display an image, which indicates the positional relation between the central axis of the objective lens and the center trajectory of the charged particle beam based on the signal of the detector, on the display device.

10. An adjusting method of a charged particle beam device which reduces a charged particle beam emitted from a charged particle source by an optical system at a predetermined first demagnification and a predetermined second magnification lower than the first demagnification, and focuses the charged particle beam to a sample by an electrostatic or electromagnetic lens effect, the method comprising:

setting a center trajectory of the charged particle beam before and after the lens effect by adjusting a deflection angle of the charged particle beam by the optical system in a case where the charged particle beam is demagnified at the first demagnification; and

adjusting a virtual position of the charged particle source by the electron optical system to match the center trajectory of the charged particle beam before and after the lens effect in a case where the charged particle beam is demagnified at the second demagnification with a center trajectory of the charged particle beam in the case where the charged particle beam is demagnified at the first demagnification.

11. The adjusting method of the charged particle beam device according to claim 10 , wherein

the deflection angle of the charged particle beam is adjusted to set the center trajectory to pass through a center of an electromagnetic field making the lens effect.

12. The adjusting method of the charged particle beam device according to claim 11 , further comprising:

collecting information of a positional relation between the center of the electromagnetic field making the lens effect and the center trajectory of the charged particle beam after the lens effect from a signal obtained by colliding the charged particle beam with the sample; and

calculating an adjusting amount of the deflection angle of the charged particle source from the information of the positional relation to set the center trajectory to pass through the center of the electromagnetic field making the lens effect.

13. The adjusting method of the charged particle beam device according to claim 10 , further comprising:

collecting information of a positional relation between the center of an electromagnetic field making the lens effect and the center trajectory of the charged particle beam after the lens effect from a signal obtained by colliding the charged particle beam with the sample; and

calculating an adjusting amount of the virtual position of the charged particle source from the information of the positional relation to match the center trajectory of the charged particle beam at the second demagnification with the center trajectory of the charged particle beam at the first demagnification.

14. The adjusting method of the charged particle beam device according to claim 10 , further comprising:

collecting the information of a positional relation between a center of an electromagnetic field making the lens effect and the center trajectory of the charged particle beam after the lens effect from a signal obtained by colliding the charged particle beam with the sample;

in a process of setting the center trajectory of the charged particle beam, displaying a user interface on a screen which includes the positional relation between the center of the electromagnetic field and the center trajectory of the charged particle beam at the first demagnification; and

in a process matching the center trajectory at the second demagnification with the center trajectory at the first demagnification, displaying a user interface on the screen which includes the positional relation between the center of the electromagnetic field and the center trajectory of the charged particle beam at the second demagnification.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 1, 2018
From: YABU, SHUHEI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 045959/0161 →