IP Library Granted Patent US 10,688,485
Granted Patent B2
US 10,688,485 · App. 15/780,925 · Granted Jun 23, 2020

Substrate analysis nozzle and method for analyzing substrate

Inventors: Katsuhiko Kawabata (Tokyo, JP); Sungjae Lee (Tokyo, JP)
Assignee: IAS, INC
B01L3/02G01N1/02G01N1/28G01N33/00B01L2200/0615B01L2200/0684B01L2300/0832G01N2001/028G01N2033/0095
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,688,485
App. No.
15/780,925
Granted
Jun 23, 2020
Kind
B2
Abstract

The present invention provides a substrate analysis nozzle that reliably prevents a leakage (release) of analysis solution from the nozzle even in the case of a highly hydrophilic substrate and that collects the analysis solution with a high collection ratio after scanning. The present invention is directed to a substrate analysis nozzle configured to discharge an analysis solution from a tip of the substrate analysis nozzle onto a substrate, configured to scan a surface of the substrate using the discharged analysis solution, and configured to suck the analysis solution. The substrate analysis nozzle has a triple-tube structure made up of: a pipe through which the analysis solution is discharged and sucked; a first outer tube surrounding the pipe and surrounding the analysis solution used for scanning; and a second outer tube surrounding the first outer tube. The substrate analysis nozzle includes: first exhausting means including an exhaust path defined between the pipe and the first outer tube; and second exhausting means including an exhaust path defined between the first outer tube and the second outer tube.

Claims (2)

1. A substrate analysis nozzle configured to discharge an analysis solution from a tip of the substrate analysis nozzle onto a substrate, configured to scan a surface of the substrate using the discharged analysis solution, and configured to suck the analysis solution, wherein the substrate analysis nozzle comprises a triple-tube structure comprising a pipe through which the analysis solution is discharged and sucked; a first outer tube surrounding the pipe and surrounding the analysis solution used for scanning; and a second outer tube surrounding the first outer tube, and wherein the substrate analysis nozzle comprises: first exhausting means comprising an exhaust path defined between the pipe and the first outer tube; and second exhausting means comprising an exhaust path defined between the first outer tube and the second outer tube.

2. A method for analyzing a substrate with a substrate analysis nozzle the method comprising providing a substrate analysis nozzle according to claim 1 and discharging an analysis solution through a pipe onto a substrate; scanning a surface of the substrate using the discharged analysis solution while exhausting gas using the second exhausting means; and stopping the second exhausting means and sucking an analysis solution containing an analysis subject through the pipe while exhausting gas using the first exhausting means.

Assignments (3)
CHANGE OF NAME Recorded Feb 15, 2026
From: IAS INC.
To: RORZE IAS INC.
Reel/Frame 074867/0402 →
CHANGE OF NAME Recorded Oct 24, 2025
From: IAS INC.
To: RORZE IAS INC.
Reel/Frame 073257/0472 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 1, 2018
From: KAWABATA, KATSUHIKO; LEE, SUNGJAE
To: IAS INC.
Reel/Frame 045963/0717 →
Continuity (1)
Related Publication 20190358622A1 · Nov 28, 2019