Radiation based patterning methods
Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
1. A method for forming a patterned structure comprising a substrate and a patterned coating material on a surface of the substrate, the method comprising:
irradiating along a selected pattern, a layer of coating material on the surface of the substrate having an average thickness from 5 nm to 30 nm with EUV radiation at a dose of no more than about 100 mJ/cm 2 ; and
contacting the irradiated layer with a developing composition to dissolve un-irradiated material to form a patterned coating material according to the selected pattern.
2. The method of claim 1 wherein the irradiation is performed with EUV at a dose of no more than about 90 mJ/cm 2 .
3. The method of claim 1 wherein the selected pattern has a pitch of no more than about 60 nm.
4. The method of claim 1 wherein the developing composition comprises tetramethyl ammonium hydroxide.
5. The method of claim 1 wherein following exposure an exposed coating region is insoluble in an aqueous base.
6. The method of claim 1 wherein following exposure an exposed coating region is soluble in an organic solvent.
7. The method of claim 1 further comprising heating the coated substrate after irradiation to a temperature of at least about 45° C. prior to contacting the irradiated layer with the developing composition.
8. The method of claim 1 further comprising heating the substrate with the patterned coating material to a temperature from about 150° C. to about 600° C. for from one minute to 25 minutes to form a post-patterning condensed structure.
9. The method of claim 8 further comprising performing a second patterning using the post-patterning condensed structure to form a double patterned structure.
10. The method of claim 1 wherein the coating material prior to irradiation comprises metal ions with radiation sensitive ligands and wherein interaction of the coating material with EUV alters the chemical properties of the coating material creating a structure with differential dissolution rates.
11. The method of claim 10 wherein the metal of the metal ions comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nb, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.
12. The method of claim 10 wherein the radiation sensitive ligands comprise peroxide ligands, and wherein the coating material further comprises metal suboxide cations.
13. The method of claim 12 wherein the coating material further comprises inorganic polyatomic anions and wherein the peroxide ligand to metal ion ratio is at least about 2.
14. A method for forming a patterned inorganic material on a substrate, the method comprising:
irradiating a coated substrate with a pattern of radiation wherein the coated substrate comprises a coating with a radiation patternable coating material comprising metal suboxide cations, ligands comprising a peroxide group and inorganic polyatomic anions and wherein irradiation creates a differential dissolution rate between irradiated and un-irradiated locations, wherein the coating material is formed by removing solvent from a deposited precursor solution wherein the peroxide ligand to metal suboxide cation ratio is at least about 2; and
heating the coated substrate after irradiation to a temperature of at least about 45° C. prior to contacting the coating with a developing composition.
15. The method of claim 14 further comprising contacting the coated substrate after heating with a developing composition to remove un-irradiated coating material to form the patterned inorganic material.
16. The method of claim 15 wherein the patterned inorganic material has edges with an average line-width roughness no more than about 2.25 nm at a pitch of no more than about 60 nm or for individual features having an average width of no more than about 30 nm.
17. The method of claim 14 wherein the metal suboxide cations comprise Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nb, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.
18. The method of claim 14 wherein the irradiating step comprises irradiation with extreme ultraviolet light at a dose of no more than about 100 mJ/cm 2 or with an electron beam at a dose equivalent to no more than about 300 μC/cm 2 at 30 kV.
19. The method of claim 14 wherein the coating has an average thickness of about 5 nm to about 30 nm.