Processing apparatus and cover member
There is provided a processing apparatus including a stage disposed inside a chamber, and a cover member provided in an outer edge portion of the stage and configured to partition an interior of the chamber into a processing space above the stage and a bottom space below the stage. The cover member includes a first protrusion portion configured to make surface-to-surface contact with a surface of the stage, a second protrusion portion spaced apart from the first protrusion portion and configured to make surface-to-surface contact with the surface of the stage, and an exhaust path provided between the first protrusion portion and the second protrusion portion and configured to exhaust a gas from a buffer space formed by the cover member and the stage.
1. A processing apparatus, comprising:
a stage disposed inside a chamber and including a mounting region configured to mount a substrate thereon and an outer edge portion disposed outside the mounting region and having a flat surface; and
a cover member provided in the outer edge portion of the stage to be spaced apart outwardly from the mounting region of the stage, and configured to partition an interior of the chamber into a processing space above the stage and a bottom space below the stage,
wherein the cover member includes:
a first protrusion portion configured to make surface-to-surface contact with the flat surface of the outer edge portion along a horizontal direction of the flat surface;
a second protrusion portion spaced apart from the first protrusion portion, and configured to make surface-to-surface contact with the flat surface of the outer edge portion;
a convex portion disposed between the first protrusion portion and the second protrusion portion, the convex portion protruding toward the flat surface of the outer edge portion and spaced apart from the flat surface of the outer edge portion; and
an exhaust path provided between the first protrusion portion and the second protrusion portion, and configured to exhaust a gas from a buffer space formed by the cover member and the stage,
wherein the exhaust path is opened and inclined toward an exhaust space for exhausting the interior of the chamber,
wherein the cover member is a ring shaped member, and
wherein the first protrusion portion protrudes toward the stage and is disposed on an inner front end of the ring shaped member.
2. The apparatus of claim 1 , wherein the cover member includes:
a first member having the first protrusion portion, and formed so as to cover a surface of the outer edge portion of the stage; and
a second member having the second protrusion portion, and formed so as to cover the surface of the outer edge portion of the stage on the outside of the first member.
3. The apparatus of claim 2 , wherein the exhaust path is a space between the first member and the second member.
4. The apparatus of claim 1 , wherein the first protrusion portion is configured to block a gas flowing from the processing space, the second protrusion portion is configured to block a gas flowing from the bottom space, and the exhaust path is configured to exhaust a gas leaking from the side of the first protrusion portion or the side of the second protrusion portion into the buffer space.
5. A cover member provided in a stage, which is disposed inside a chamber and includes a mounting region configured to mount a substrate thereon and an outer edge portion disposed outside the mounting region and having a flat surface, and configured to partition an interior of the chamber into a processing space above the stage and a bottom space below the stage, wherein the cover member is provided in the outer edge portion of the stage to be spaced apart outwardly from the mounting region of the stage, the cover member comprising:
a first protrusion portion configured to make surface-to-surface contact with the flat surface of the outer edge portion along a horizontal direction of the flat surface;
a second protrusion portion spaced apart from the first protrusion portion and configured to make surface-to-surface contact with the flat surface of the outer edge portion;
a convex portion disposed between the first protrusion portion and the second protrusion portion, the convex portion protruding toward the flat surface of the outer edge portion and spaced apart from the flat surface of the outer edge portion; and
an exhaust path provided between the first protrusion portion and the second protrusion portion and configured to exhaust a gas from a buffer space formed by the cover member and the stage,
wherein the exhaust path is opened and inclined toward an exhaust space for exhausting the interior of the chamber,
wherein the cover member is a ring shaped member, and
wherein the first protrusion portion protrudes toward the stage and is disposed on an inner front end of the ring shaped member.