IP Library Granted Patent US 10,510,787
Granted Patent B2
US 10,510,787 · App. 15/787,959 · Granted Dec 17, 2019

Structures and methods of creating clear pixels

Inventors: Swarnal Borthakur (Boise, ID); Nathan Wayne Chapman (Meridian, ID); Brian Anthony Vaartstra (Nampa, ID)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L27/14621H01L27/1462H01L27/14627H01L27/14645H01L27/14685
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Quick Facts
Patent No.
US 10,510,787
App. No.
15/787,959
Granted
Dec 17, 2019
Kind
B2
Abstract

An image sensor may include an array of pixels having a color filter layer. The color filter layer may include colored elements and clear elements. The clear elements may be formed from transparent dielectric material. The color filter layer may include a grid of light-blocking material that forms color filter container structures having an array of openings in which the colored elements and the clear elements are formed. The color filter container structures may be formed from the same transparent dielectric material that forms the clear elements. The color filter container structures may be formed from opaque materials or transparent materials that form structures such as planarization layers, microlenses, or antireflection coatings for the array of pixels. The material used to form the color filter container structures may have a refractive index that is sufficiently high to prevent light from passing between adjacent elements in the color filter layer.

Claims (37)

1. A pixel array comprising:

an array of photodiodes;

a first dielectric layer;

a second dielectric layer; and

a color filter layer that overlaps the array of photodiodes, the color filter layer comprising:

a grid of color filter container material that forms an array of openings over the photodiodes in the array of photodiodes, wherein the grid of color filter container material has a refractive index, wherein the grid of color filter container material extends from the first dielectric layer to the second dielectric layer, and wherein the first dielectric layer is formed from the color filter container material;

organic color filter material in a first set of the openings, wherein the organic color filter layer extends from the first dielectric layer to the second dielectric layer; and

transparent dielectric material in a second set of the openings, the transparent dielectric material forming clear color filter elements, wherein the clear color filter elements extend from the first dielectric layer to the second dielectric layer and wherein the transparent dielectric material has a refractive index that is greater than the refractive index of the color filter container material.

2. The pixel array defined in claim 1 , wherein the transparent dielectric material comprises silicon nitride.

3. The pixel array defined in claim 1 , wherein the organic color filter material has a refractive index that is less than the refractive index of the transparent dielectric material.

4. A pixel array comprising:

an array of photodiodes;

a first dielectric layer;

a second dielectric layer; and

a color filter layer comprising:

first color filter elements having a first refractive index formed over a first group of photodiodes in the array;

second color filter elements having a second-refractive index formed over a second group of photodiodes in the array, wherein the first color filter elements and the second color filter elements extend from the first dielectric layer to the second dielectric layer;

clear dielectric material having a third refractive index that forms clear color filter elements formed over a third group of photodiodes in the array, wherein the third refractive index is greater than the first refractive index and the second refractive index and wherein the clear color filter elements extend from the first dielectric layer to the second dielectric layer; and

transparent color filter container material that forms a grid of openings in which the first color filter elements, second color filter elements, and clear color filter elements are formed, wherein the transparent color filter container material has a fourth refractive index that is less than the third refractive index.

5. The pixel array defined in claim 4 , further comprising:

an array of microlenses formed from transparent organic material that overlaps the color filter layer; and

an antireflective coating formed on the array of microlenses.

6. The pixel array defined in claim 4 , wherein the first dielectric layer comprises a planarization layer interposed between the color filter layer and the array of microlenses, wherein the planarization layer is formed from the transparent color filter container material.

7. The pixel array defined in claim 6 , wherein the planarization layer and the transparent color filter container material are formed from indium tin oxide.

8. The pixel array defined in claim 1 , further comprising an array of microlenses that overlaps the first dielectric layer.

9. The pixel array defined in claim 4 , wherein the second dielectric layer is formed from the clear dielectric material.

10. The pixel array defined in claim 4 , wherein the transparent color filter container material is formed entirely from a material that forms the first dielectric layer.

11. A pixel array comprising:

an array of photodiodes;

a first dielectric layer;

a second dielectric layer; and

a color filter layer comprising:

color filter elements having a first refractive index formed over a first group of photodiodes in the array wherein the color filter elements are in contact with the first dielectric layer and the second dielectric layer;

clear dielectric material having a second refractive index that forms clear color filter elements formed over a second group of photodiodes in the array, wherein the second refractive index is greater than the first refractive index and wherein the clear color filter elements are in contact with the first dielectric layer and the second dielectric layer; and

transparent color filter container material that forms a grid of openings in which the first color filter elements and clear color filter elements are formed, wherein the transparent color filter container material has a third refractive index that is less than the second refractive index.

12. The pixel array defined in claim 11 , wherein the transparent color filter container material is formed from the same material as the second dielectric layer.

13. The pixel array defined in claim 1 , wherein the clear color filter elements are in contact with the first dielectric layer and the second dielectric layer.

Assignments (3)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 046530, FRAME 0494 Recorded Jun 23, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064159/0524 →
PATENT SECURITY AGREEMENT Recorded Jul 11, 2018
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 046530/0494 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 19, 2017
From: BORTHAKUR, SWARNAL; CHAPMAN, NATHAN WAYNE; VAARTSTRA, BRIAN ANTHONY
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 043902/0368 →
Continuity (1)
Related Publication 20190123083A1 · Apr 25, 2019
Cited By (1)
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