Wafer scale testing and initialization of small die chips
A chip intermediate body includes a semiconductor region including plural chip areas. The chip areas respectively are cut out as semiconductor chips. A cut region is provided along edges of the chip areas, the cut region being cut to cut out the semiconductor chips. A contact region is provided opposite to the chip areas across the cut region, the contact region being configured to be contacted by a probe of a test unit to test the chip areas, and electric wiring is provided continuously with the cut region to connect the chip areas and the contact region.
1. A method for testing a chip area comprising:
fabricating a chip intermediate body including a semiconductor region, a cut region, a contact region, a test area, and electric wiring, the semiconductor region including a plurality of chip areas arranged as an array and respectively cut out as semiconductor chips, the cut region being provided along edges of the chip areas, the cut region being cut to cut out the semiconductor chips, the contact region being provided opposite to the chip areas across the cut region with a contact pad corresponding to each row of chip areas in the array, the test area including a test circuit corresponding to each column of chip areas in the array, the electric wiring being provided continuously with the cut region to connect the chip areas and the contact region; and
testing the chip areas in parallel with a probe of a test unit contacting the contact region.
2. A method for fabricating a semiconductor chip comprising:
testing a semiconductor region provided on a chip intermediate body with a probe of a test unit, the chip intermediate body including the semiconductor region, a cut region, a contact region, a test area, and electric wiring, the semiconductor region including a plurality of chip areas arranged as an array and respectively cut out as semiconductor chips, the cut region being provided along edges of the chip areas, the cut region being cut to cut out the semiconductor chips, the contact region being provided opposite to the chip areas across the cut region with a contact pad corresponding to each row of chip areas in the array, the test area including a test circuit corresponding to each column of chip areas in the array, the electric wiring being provided continuously with the cut region to connect the chip areas and the contact region; and
cutting the cut region to cut out the semiconductor chips.
3. The method as recited in claim 1 , wherein testing the chip areas in parallel includes writing initial data to the chip areas using test circuits provided opposite to the chip areas across the cut region to detect logic functionality.
4. The method as recited in claim 1 , further including initializing each of the chip areas in a wafer-level initialization for chip areas that pass the testing.
5. The method as recited in claim 4 , wherein the initialization includes loading each chip area with a key and initial-bootloader code.
6. The method as recited in claim 4 , wherein the wafer-level initialization initializes every chip area in parallel.
7. The method as recited in claim 2 , wherein testing the chip areas in parallel includes writing initial data to the chip areas using test circuits provided opposite to the chip areas across the cut region to detect logic functionality.
8. The method as recited in claim 2 , further including initializing each of the chip areas in a wafer-level initialization for chip areas that pass the testing.
9. The method as recited in claim 8 , wherein the initialization includes loading each chip area with a key and initial-bootloader code.
10. The method as recited in claim 8 , wherein the wafer-level initialization initializes every chip area in parallel.