Method and device for spreading high heat fluxes in thermal ground planes
A thermal ground plane with hybrid structures that include nanowires is disclosed. The thermal ground plane includes a first casing having an exterior surface and an interior surface, the interior surface includes plurality of microstructures with a plurality of nanowires; a second casing, wherein the first casing and the second casing are sealed to an interior space that includes a working fluid; and a wicking layer disposed within the interior space.
1. A thermal ground plane comprising:
a first casing having an exterior surface and an interior surface, the interior surface having an evaporator region and a non-evaporator region;
a plurality of microstructures having a three dimensional shape that includes a trapezoidal cross-section, the plurality of microstructures extending from the evaporator region of the interior surface of the first casing, the plurality of microstructures having an extended surface;
a first plurality of nanowires disposed on each of the plurality of microstructures, the first plurality of nanowires extending from the extended surface of the microstructures, the first plurality of nanowires comprising copper, and the first plurality of nanowires being formed via electroplating;
a second plurality of nanowires extending from portions of the non-evaporator region of the interior surface of the first casing, the second plurality of nanowires comprising copper, and the second plurality of nanowires being formed via electroplating;
a second casing, wherein the first casing and the second casing are sealed together to form an interior space that includes a working fluid; and
a wicking structure disposed within the interior space.
2. The thermal ground plane according to claim 1 , wherein each of the plurality of nanowires are fabricated by depositing an aluminum layer on a copper microstructure to form a porous anodic alumina template followed by electroplating.
3. The thermal ground plane according to claim 1 , wherein the plurality of microstructures comprises a trapezoidal or pyramidal shape.
4. The thermal ground plane according to claim 1 , wherein each of the plurality of microstructures are fabricated by a technique selected from the list consisting of micro-stamping, partially metal cutting, reactive ion etching (ME), and electroplating.
5. The thermal ground plane according to claim 1 , wherein the plurality of microstructures comprises a forest of micro-posts with caps.
6. The thermal ground plane according to claim 1 , further comprising a laminate layer with different materials disposed on the plurality of nanowires.
7. The thermal ground plane according to claim 1 , further comprising a plurality of nanowires disposed on a planar portion of the interior surface of the first casing.
8. The thermal ground plane according to claim 1 , further comprises an integral part of a package for a device to be cooled.
9. A thermal ground plane comprising:
a first casing having an exterior surface and an interior surface, the interior surface having an evaporator region and a non-evaporator region;
a plurality of microstructures having a three dimensional shape that includes a trapezoidal cross-section, the plurality of microstructures extending from the evaporator region of the interior surface of the first casing, the plurality of microstructures having an extended surface;
a second casing, wherein the first casing and the second casing are sealed to form an interior space that includes a working fluid;
a plurality of grooves and a plurality of ridges disposed on the second casing;
a wicking structure disposed within the interior space with at least a portion of the wicking structure in contact with some of the plurality of ridges in the second casing; and
a heat spreader disposed on the exterior surface of the first casing opposite the evaporator region, the heater spreader reducing the heat flux of the thermal ground plane at least 50 W/cm 2 .
10. The thermal ground plane according to claim 9 , further comprising:
a first plurality of nanowires disposed on each of the plurality of microstructures, the first plurality of nanowires extending from the extended surface of the microstructures.
11. A thermal ground plane comprising:
a first casing having an exterior surface and an interior surface having an evaporator region and a non-evaporator region;
a plurality of microstructures having a three dimensional shape that includes a trapezoidal cross-section, the plurality of microstructures extending from the evaporator region of the interior surface of the first casing, the plurality of microstructures having an extended surface;
a second casing, wherein the first casing and the second casing are sealed together to form an interior space that includes a working fluid; and
a plurality of grooves and a plurality of ridges disposed on the second casing;
a wicking structure disposed within the interior space with at least a portion of the wicking structure in contact with some of the plurality of ridges in the second casing, the wicking structure comprising a nanostructure including a weave of material with a diameter having a dimension less than 500 nm.
12. The thermal ground plane system according to claim 11 , wherein the heat flux comprises a heat flux of 1,000 W/cm2.
13. The thermal ground plane system according to claim 11 , further comprising a heat spreader disposed on the exterior surface of the first casing.
14. The thermal ground plane system according to claim 11 , wherein the wicking structure comprises a woven copper mesh.
15. The thermal ground plane system according to claim 11 , wherein the interior surface of the first casing includes a plurality of nanostructures.
16. The thermal ground plane system according to claim 9 , wherein the heat spreader couples with a GaN device.
17. The thermal ground plane system according to claim 9 , wherein the wicking structure comprises a woven copper mesh.
18. The thermal ground plane system according to claim 9 , wherein the interior surface of the first casing includes a plurality of nanostructures.