Sacrificial cap for forming semiconductor contact
A method for forming a semiconductor device includes forming a fins on a substrate, forming a sacrificial gate stack over a channel region of the fins, a source/drain region with a first material on the fins, a first cap layer with a second material over the source/drain region, and a second cap layer with a third material on the first cap layer. A dielectric layer is deposited over the second cap layer. The sacrificial gate stack is removed to expose a channel region of the fins. A gate stack is formed over the channel region of the fins. A portion of the dielectric layer is removed to expose the second cap layer. The second cap layer and the first cap layer are removed to expose the source/drain region. A conductive material is deposited on the source/drain region.
1. A semiconductor device comprising:
a first semiconductor fin and a second semiconductor fin;
a gate stack arranged over a channel region of the first semiconductor fin and the second semiconductor fin;
a source/drain region comprising a crystalline material having top faceted surfaces and bottom faceted surfaces, the bottom faceted surfaces contacting the first semiconductor fin and the second semiconductor fin, wherein the source/drain region comprises an undulating or non-planar surface;
an air gap formed conformally and in direct contact with the top faceted surfaces and the bottom faceted surfaces of the source/drain region; and
a conductive contact material in contact with the top faceted surfaces of the crystalline material.
2. The device of claim 1 , wherein the top faceted surfaces of the crystalline material are not in direct contact with the first semiconductor fin or the second semiconductor fin.
3. A semiconductor device comprising:
semiconductor fins;
source/drain regions comprising a crystalline material having top faceted surfaces and bottom faceted surfaces, one of the source/drain regions contacting each of the semiconductor fins, wherein the source/drain region comprises an undulating or non-planar surface;
a dielectric material contacting adjacent semiconductor fins;
a silicide material on each of the source/drain regions, the silicide material comprising a first portion in direct contact with the top faceted surfaces and a second portion in direct contact with the bottom faceted surfaces of the source/drain regions, the silicide material formed in a conformal air gap in direct contact with the top faceted surfaces and the bottom faceted surfaces of the source/drain regions; and
a conductive contact material contacting the first portion and the second portion of the silicide material.
4. The device of claim 3 , wherein the dielectric material contacts the silicide material on adjacent source/drain regions.
5. The device of claim 4 , wherein the faceted surfaces of the crystalline material include faceted surfaces contacting each of the semiconductor fins.
6. The device of claim 5 , wherein the silicide material is on the faceted surfaces contacting each of the semiconductor fins.
7. The device of claim 6 , wherein the conductive contact material is on the faceted surfaces contacting each of the semiconductor fins.
8. The device of claim 5 , wherein the faceted surfaces of the crystalline material include faceted surfaces not contacting the semiconductor fins.
9. The device of claim 8 , wherein the conductive contact material is on the faceted surfaces not contacting the semiconductor fins.
10. The device of claim 3 , wherein the faceted surfaces of the crystalline material include faceted surfaces contacting each of the semiconductor fins.
11. The device of claim 10 , wherein the conductive contact material is on the faceted surfaces contacting each of the semiconductor fins.
12. The device of claim 10 , wherein the faceted surfaces of the crystalline material include faceted surfaces not contacting the semiconductor fins.
13. The device of claim 12 , wherein the conductive contact material is on the faceted surfaces not contacting the semiconductor fins.
14. The device of claim 12 , wherein the silicide material is only on the faceted surfaces not contacting the semiconductor fins.
15. A semiconductor device comprising:
semiconductor fins;
source/drain regions comprising a crystalline material having top faceted surfaces and bottom faceted surfaces, one of the source/drain regions contacting each of the semiconductor fins; and
an air gap formed conformally and in direct contact with the top faceted surfaces and the bottom faceted surfaces of the source/drain regions;
wherein the source/drain regions comprise an undulating or non-planar surface; and
wherein adjacent source/drain regions contact each other.
16. The device of claim 15 further comprising insulating material between adjacent semiconductor fins.
17. The device of claim 16 , wherein the adjacent semiconductor fins, the source/drain regions contacting the adjacent semiconductor fins, and the insulating material between the adjacent semiconductor fins define a cavity between the adjacent semiconductor fins.
18. The device of claim 17 , wherein the crystalline material is formed by an epitaxial growth process.