Dual-spectrum photocathode for image intensification

1. A dual-spectrum image intensifier comprising:

a photocathode that includes:

a first photodetector array that includes a plurality of first photodetector array elements, each of the plurality of first photodetector array elements including a first optoelectronic material having a first thickness, the first optoelectronic material to generate photo-electrons in response to incident photons in a first spectral band, the first photodetector array disposed proximate a first portion of a first surface of a substrate; and

a second photodetector array that includes a plurality of second photodetector array elements, each of the plurality of second photodetector array elements including a second optoelectronic material having a second thickness that is different from the first thickness and including at least one of: a silver oxide metal film, a gold oxide metal film, a platinum oxide metal film, a cobalt oxide metal film, or a cuprous oxide metal film, the second photodetector array to generate photo-electrons in response to incident photons in a second spectral band, the second spectral band including a portion of the electromagnetic spectrum different, at least in part, from the first spectral band, the second photodetector array disposed proximate a second portion of the first surface of the substrate;

wherein the photo-electrons generated by both the first photodetector array and the second photodetector array are emitted into a first vacuum space adjacent to at least a portion of at least the second photodetector array; and

an electron multiplier separated from the photocathode by the first vacuum space.

2. The dual-spectrum image intensifier of claim 1 wherein the substrate comprises an entrance window to the dual-spectrum image intensifier.

3. The dual-spectrum image intensifier of claim 2 wherein the image intensifier entrance window includes at least one of: sapphire glass (Al 2 O 3 ), quartz (SiO 2 ), magnesium fluoride (MgF 2 ), or calcium fluoride (CaF 2 ).

4. The dual-spectrum image intensifier of claim 1 :

wherein the first spectral band comprises includes at least a portion of the visible electromagnetic spectrum that includes wavelengths from 390 nanometers (nm) to 700 nm; and

wherein the second spectral band comprises at least a portion of the short-wave infrared (SWIR) electromagnetic spectrum that includes wavelengths above 900 nanometers (nm).

5. The dual-spectrum image intensifier of claim 1 wherein the first optoelectronic material comprises a material having a first thickness of greater than 10 nanometers (nm).

6. The dual-spectrum image intensifier of claim 5 wherein the second optoelectronic material comprises a material having a thickness of less than 10 nanometers (nm).

7. The dual-spectrum image intensifier of claim 1 :

wherein each of at least a portion of the plurality of first photodetector array elements at least partially surrounds each of at least a portion of the plurality of second photodetector array elements.

8. The dual-spectrum image intensifier of claim 7 :

wherein the plurality of second photodetector array elements comprise a plurality of second photodetector array elements disposed proximate at least a portion of the first surface of the substrate in at least one of: a patterned distribution; a random distribution; or a biased distribution.

9. The dual-spectrum image intensifier of claim 1 :

wherein a gap separates each of the plurality of first photodetector array elements from the plurality of second photodetector array elements.

10. The dual-spectrum image intensifier of claim 9 , further comprising an interposer layer at least partially filling the gap separating each of the plurality of first photodetector array elements from the plurality of second photodetector array elements.

11. The dual-spectrum image intensifier of claim 10 : wherein the interposer layer comprises one of: a dielectric interposer layer.

12. The dual-spectrum image intensifier of claim 10 :

wherein the interposer layer comprises an electrically conductive interposer layer.

13. A dual-spectrum image intensifier fabrication method comprising:

depositing a first photodetector array that includes a plurality of first photodetector array elements formed using a first optoelectronic material having a first thickness on a first portion of a first surface of a photocathode substrate disposed transverse to an optical axis of the dual-spectrum image intensifier such that at least a portion of incident photons pass through the photocathode substrate and impinge upon the first photodetector array, the first optoelectronic material to generate photo-electrons responsive to incident photons in a first spectral band;

depositing a second photodetector array that includes a plurality of second photodetector array elements formed using a second optoelectronic material having a second thickness that differs from the first thickness on a second portion of the first surface of the photocathode substrate, each of the plurality of second photodetector array elements including an oxidized metal film that includes at least one of: a silver oxide metal film, a gold oxide metal film, a platinum oxide metal film, a cobalt oxide metal film, or a cuprous oxide metal film, the second optoelectronic material to generate photo-electrons responsive to incident photons in a second spectral band including a portion of the electromagnetic spectrum, the second spectral band different, at least in part, from the first spectral band;

depositing an electron multiplier along the optical axis of the dual-spectrum image intensifier the electron multiplier spaced apart from the photocathode substrate; and

reducing absolute pressure in the space between the dual-spectrum image intensifier the electron multiplier to less than atmospheric pressure.

14. The method of claim 13 wherein depositing the first photodetector array on the first portion of the first surface of the photocathode substrate further comprises:

depositing the first photodetector array on the first surface of a photocathode substrate that provides an entrance window to the dual-spectrum image intensifier.

15. The method of claim 13 :

wherein depositing the first photodetector array on the first portion of the first surface of the photocathode substrate further comprises:

depositing a first photodetector array that includes the plurality of first photodetector array elements formed using a first optoelectronic material to generate photo-electrons responsive to incident photons in the first spectral band, the first spectral band including at least a portion of the visible electromagnetic spectrum between 390 nanometers (nm) and 700 nm; and

wherein depositing the second photodetector array on the second portion of the first surface of the photocathode substrate:

depositing a second photodetector array that includes the plurality of second photodetector array elements formed using a second optoelectronic material to generate photo-electrons responsive to incident photons in the second spectral band that includes wavelengths at least a portion of the short-wave infrared electromagnetic spectrum above 900 nanometers (nm).

16. The method of claim 13 :

wherein depositing the first photodetector array on the first portion of the first surface of the photocathode substrate comprises:

depositing the first photodetector array that includes a plurality of first photodetector array elements formed using the first optoelectronic material in which the first thickness is greater than or equal to 10 nanometers (nm) proximate the first portion of the first surface of the photocathode substrate;

wherein depositing the second photodetector array on the second portion of the first surface of the photocathode substrate comprises:

depositing the second photodetector array that includes a plurality of second photodetector array elements formed using the second optoelectronic material in which the second thickness is less than 10 nm proximate the second portion of the first surface of the photocathode substrate.

17. The method of claim 13 wherein depositing the first photodetector array on the first portion of the first surface of the photocathode substrate comprises: depositing the first photodetector array such that each of at least a portion of the plurality of first photodetector array elements the at least partially surrounds each of at least a portion of the plurality of second photodetector array elements.

18. The method of claim 13 wherein depositing the first photodetector array proximate the first portion of the first surface of the photocathode substrate comprises: depositing the first photodetector array such that a gap forms between each of at least a portion of the plurality of first photodetector array elements and each of at least a portion of the plurality of the second photodetector array elements.

19. The method of claim 18 , further comprising:

depositing an interposer layer in the gap formed between each of at least the portion of the plurality of first photodetector array elements and each of at least the portion of the plurality of the second photodetector array elements.

20. An enhanced vision system, comprising:

an objective lens array;

dual-spectrum image intensifier comprising:

a photocathode that includes:

a first photodetector array that includes a plurality of first photodetector array elements, each of the plurality of first photodetector array elements formed by a first optoelectronic material having a first thickness, the first optoelectronic material to generate photo-electrons in response to incident photons in a first spectral band the first photodetector array disposed proximate a first portion of a first surface of a substrate; and

a second photodetector array that includes a plurality of second photodetector array elements, each of the plurality of second photodetector array elements formed by a second optoelectronic material having a second thickness that is different than the first thickness and including at least one of: a silver oxide metal film, a gold oxide metal film, a platinum oxide metal film, a cobalt oxide metal film, or a cuprous oxide metal film, the second photodetector array to generate photo-electrons in response to incident photons in a second spectral band, the second spectral band including a portion of the electromagnetic spectrum different, at least in part, from the first spectral band, the second photodetector array disposed proximate a second portion of the first surface of the substrate;

wherein the photo-electrons generated by both the first photodetector array and the second photodetector array are emitted into a first vacuum space adjacent to at least a portion of the second photodetector array; and

a microchannel plate to generate secondary electrons, the microchannel plate separated from the photocathode by the first vacuum space;

wherein the secondary electrons generated by the microchannel plate are emitted into a second vacuum space adjacent to the microchannel plate;

a phosphor screen to generate photons corresponding to an enhanced image responsive to incident secondary electrons, the phosphor screen separated from the microchannel plate by the second vacuum space; and

an eyepiece lens array.