Semiconductor structure having graded transition bodies

1. A semiconductor structure, comprising:

a substrate;

a first graded transition body over the substrate, the first graded transition body having a first lattice parameter at a first surface and a second lattice parameter at a second surface opposite the first surface;

a second transition body having a smaller lattice parameter at a lower surface overlying the second surface of the first graded transition body and a larger lattice parameter at an upper surface of the second transition body, the second transition body including at least two transition modules each having at least three interlayers; and

a III-Nitride semiconductor layer over the second transition body,

wherein the first graded transition body and the second transition body reduce strain for the semiconductor structure,

wherein the first graded transition body and the second transition body are each Nitride-based transition bodies.

2. The semiconductor structure of claim 1 , wherein the at least two transition modules are substantially the same.

3. The semiconductor structure of claim 1 , wherein the at least two transition modules have at least one of the at least three interlayers in common.

4. The semiconductor structure of claim 1 , wherein the at least two transition modules are different.

5. The semiconductor structure of claim 1 , wherein the substrate is a non-III-Nitride substrate.

6. The semiconductor structure of claim 1 , wherein the III-Nitride semiconductor layer comprises a fabricated device.

7. The semiconductor structure of claim 6 , wherein the fabricated device is a high electron mobility transistor (HEMT).

8. The semiconductor structure of claim 1 , wherein the substrate is a group IV substrate.

9. The semiconductor structure of claim 1 , wherein the substrate is a silicon substrate.

10. The semiconductor structure of claim 1 , further comprising a strain absorbing layer between the substrate and the first graded transition body.

11. The semiconductor structure of claim 10 , further comprising an intermediate layer comprising AlN formed between the strain absorbing layer and the first graded transition body.

12. The semiconductor structure of claim 1 , wherein the second transition body is formed directly on the second surface of the first graded transition body.

13. The semiconductor structure of claim 1 , wherein the at least three interlayers of the at least two transition modules of the second transition body each comprise Al x In y Ga (1-x-y) N.

14. The semiconductor structure of claim 1 , wherein the at least two transition modules of the second transition body have a different number of interlayers.

15. A semiconductor structure, comprising:

a substrate;

a first graded transition body over the substrate, the first graded transition body having a first lattice parameter at a first surface and a second lattice parameter at a second surface opposite the first surface;

a second transition body having a smaller lattice parameter at a lower surface overlying the second surface of the first graded transition body and a larger lattice parameter at an upper surface of the second transition body, the second transition body including at least two transition modules each having at least three interlayers; and

a III-Nitride semiconductor layer over the second transition body,

wherein the first graded transition body and the second transition body reduce strain for the semiconductor structure,

wherein the first graded transition body is a III-Nitride graded transition body comprising two or more interlayers.

16. A semiconductor structure, comprising:

a substrate;

a first graded transition body over the substrate, the first graded transition body having a first lattice parameter at a first surface and a second lattice parameter at a second surface opposite the first surface;

a second transition body having a smaller lattice parameter at a lower surface overlying the second surface of the first graded transition body and a larger lattice parameter at an upper surface of the second transition body, the second transition body including at least two transition modules each having at least three interlayers; and

a III-Nitride semiconductor layer over the second transition body,

wherein the first graded transition body and the second transition body reduce strain for the semiconductor structure,

wherein the first graded transition body is formed of a single layer of AlGaN.

17. A semiconductor structure, comprising:

a substrate;

a first graded transition body over the substrate, the first graded transition body having a first lattice parameter at a first surface and a second lattice parameter at a second surface opposite the first surface;

a second transition body having a smaller lattice parameter at a lower surface overlying the second surface of the first graded transition body and a larger lattice parameter at an upper surface of the second transition body, the second transition body including at least two transition modules each having at least three interlayers; and

a III-Nitride semiconductor layer over the second transition body,

wherein the first graded transition body and the second transition body reduce strain for the semiconductor structure,

wherein the first graded transition body comprises a first interlayer and a second interlayer formed on the first interlayer,

wherein the first interlayer of the first graded transition body has a smaller lattice parameter than the second interlayer of the first graded transition body,

wherein the first interlayer of the first graded transition body has a higher aluminum concentration than the second interlayer of the first graded transition body.