IP Library Granted Patent US 10,576,430
Granted Patent B2
US 10,576,430 · App. 15/837,430 · Granted Mar 3, 2020

System and method for manufacturing a membrane filter

Inventor: Jimmie Autrey Beacham (West Allis, WI)
Assignee: General Electric Company
B01D67/0034B01D67/0032B01D71/50G03F7/12B01D2323/34B01D2323/42
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Quick Facts
Patent No.
US 10,576,430
App. No.
15/837,430
Granted
Mar 3, 2020
Kind
B2
Abstract

A system for manufacturing a membrane filter is provided. The system includes a radiation source operative to emit radiation that contacts discrete portions of a filter substrate so as to facilitate the formation of openings within the filter substrate, and a collimator disposed between the filter substrate and the radiation source and operative to restrict some of the radiation from contacting the filter substrate.

Claims (38)

1. A system for manufacturing a membrane filter comprising:

a radiation source operative to emit radiation that contacts discrete portions of a filter substrate so as to facilitate the formation of openings within the filter substrate;

a support for the filter substrate;

a collimator disposed between the filter substrate and the radiation source and operative to restrict some of the radiation from contacting the filter substrate;

a radiation detector disposed on a side of the filter substrate opposite the radiation source and operative to obtain one or more measurements of a flux of the radiation across the filter substrate: and

a controller operative to adjust the flux based at least in part on the one or more measurements:

wherein the controller adjusts the flux via the collimator.

2. The system of claim 1 further comprising:

an etcher operative to form the openings by removing the discrete portions of the filter substrate contacted by the radiation.

3. The system of claim 1 , wherein the collimator has one or more layers each having at least one opening for the radiation to pass through, and the controller adjusts the flux by adjusting an alignment of the openings.

4. The system of claim 1 , wherein

the radiation source is adjustable; and

the controller adjusts the flux by adjusting the radiation source.

5. The system of claim 1 , wherein the support comprises an adjustable support operative to move the filter substrate with respect to the collimator and wherein the controller adjusts the flux by adjusting the adjustable support.

6. The system of claim 1 , wherein the radiation includes alpha particles.

7. The system of claim 1 , wherein the openings in the filter substrate are operative to prevent particles greater than or equal to about 0.100 mm from passing through.

8. The system of claim 1 , wherein the filter substrate is a polycarbonate film.

9. The system of claim 1 , wherein the collimator has one or more openings that are radially aligned with the radiation source.

10. A method for manufacturing a membrane filter comprising:

contacting discrete portions of a filter substrate with radiation emitted from a radiation source so as to facilitate the formation of openings within the filter substrate;

restricting some of the radiation via a collimator disposed between the filter substrate and the radiation source;

obtaining, via a radiation detector, one or more measurements of a flux of the radiation across the filter substrate: and

adjusting, via the collimator, the flux based at least in part on the one or more measurements.

11. The method of claim 10 , further comprising:

etching away the discrete portions of the filter substrate contacted by the radiation so as to form the openings.

12. The method of claim 10 , wherein adjusting, via the controller, the flux based at least in part on the one or more measurements comprises at least one of:

adjusting an alignment of openings disposed in one or more layers of the collimator;

adjusting the radiation source; and

moving the filter substrate with respect to the collimator.

13. The method of claim 10 ,

wherein the openings in the filter substrate are operative to prevent particles greater than or equal to about 0.100 mm from passing through the filter substrate.

14. A system for manufacturing a membrane filter comprising:

a radiation source operative to emit radiation that contacts discrete portions of a filter substrate so as to facilitate the formation of openings within the filter substrate;

a collimator disposed between the filter substrate and the radiation source and operative to restrict some of the radiation from contacting the filter substrate;

a radiation detector disposed on a side of the filter substrate opposite the radiation source and operative to obtain one or more measurements of a flux of the radiation across the filter substrate;

a controller operative to adjust the flux based at least in part on the one or more measurements; and

an adjustable support operative to move the filter substrate with respect to the collimator;

wherein the controller adjusts the flux by adjusting the adjustable support.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2021
From: GE HEALTHCARE EUROPE GMBH
To: GLOBAL LIFE SCIENCES SOLUTIONS GERMANY GMBH
Reel/Frame 056150/0299 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2021
From: GE HEALTHCARE UK LIMITED
To: GE HEALTHCARE EUROPE GMBH
Reel/Frame 056124/0315 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2021
From: GENERAL ELECTRIC COMPANY
To: GE HEALTHCARE UK LIMITED
Reel/Frame 056110/0694 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 11, 2017
From: BEACHAM, JIMMIE AUTREY
To: GENERAL ELECTRIC COMPANY
Reel/Frame 044354/0086 →
Continuity (1)
Related Publication 20190176093A1 · Jun 13, 2019