EXPOSURE DEVICE FOR AN APPARATUS FOR ADDITIVE MANUFACTURING OF THREE-DIMENSIONAL OBJECTS

1 . Exposure device ( 1 ) for an apparatus ( 2 ) for additive manufacturing of three-dimensional objects ( 3 ) by progressive layer-by-layer selective exposure and, associated therewith, solidification of structural material layers composed of a solidifiable structural material ( 6 ) by means of an energy beam ( 5 ), wherein the exposure device ( 1 ) comprises an energy beam generating device ( 4 ) configured for generating an energy beam ( 5 ), a beam deflection device ( 7 ) configured for deflecting an energy beam ( 5 ) generated by the energy beam generating device ( 4 ) onto a specific incidence location, and a beam path ( 9 ) formed by at least one optically conductive element or comprising at least one such element,

characterized by a position detection device ( 13 ) configured for optically, in particular interferometrically, detecting the position of the beam deflection device ( 7 ), in particular relative to a reference position, by means of an optical measurement beam ( 15 ), and by

a measurement beam generating device ( 14 ), which is assigned to the position detection device ( 13 ) which is configured for generating the optical measurement beam ( 15 ) used for optically detecting the position of the beam deflection device ( 7 ), wherein the optical measurement beam ( 15 ) generated by the measurement beam generating device ( 14 ) can be coupled or is coupled directly into the beam path ( 9 ) of the exposure device ( 1 ).

2 . Exposure device according to claim 1 , characterized in that the energy beam generating device ( 4 ) and the beam deflection device ( 7 ) are optically coupled to one another via the beam path ( 9 ).

3 . Exposure device according to claim 1 , characterized in that the position detection device ( 13 ) and the measurement beam generating device ( 14 ) form an absolute interferometer.

4 . Exposure device according to claim 1 , characterized in that the position detection device ( 13 ) is configured to generate position detection information describing a detected position of the beam deflection device ( 7 ), in particular relative to a reference position.

5 . Exposure device according to claim 1 , characterized in that the beam deflection device ( 7 ) is configured to direct the optical measurement beam ( 15 ) onto at least one optical measurement point ( 16 a - 16 c ), in particular three optical measurement points ( 16 a - 16 c ), in particular in the form of an optical element, preferably a concave mirror, which reflects the optical measurement beam ( 15 ), and the position detection device ( 13 ) is configured to detect a position of the beam deflection device ( 7 ) on the basis of that portion of the optical measurement beam ( 15 ) which is reflected by the at least one optical measurement point ( 16 a - 16 c ).

6 . Exposure device according to claim 5 , characterized by an optical measurement point arrangement ( 16 ) comprising a plurality of optical measurement points ( 16 a - 16 c ), wherein the optical measurement points ( 16 a - 16 c ) associated with the optical measurement point arrangement ( 16 ) are arranged or embodied in a defined spatial arrangement with respect to one another.

7 . Exposure device according to claim 6 , characterized in that the optical measurement points ( 16 a - 16 c ) associated with the optical measurement point arrangement ( 16 ) are arranged or embodied in a common plane, in particular within a structural plane of an apparatus ( 2 ) for additive manufacturing of three-dimensional objects ( 3 ), or at least two of the optical measurement points ( 16 a - 16 c ) associated with the optical measurement point arrangement ( 16 ) are arranged or embodied in different planes.

8 . Exposure device according to claim 1 , characterized by a detection device ( 12 ) configured for detecting a reflected portion of the energy beam ( 5 ), said reflected portion arising in particular in a fusion region of a structural material layer that is to be solidified selectively or is solidified selectively, wherein the reflected portion of the energy beam ( 5 ) can be coupled or is coupled optically into the detection device ( 12 ) via the beam path ( 9 ) of the exposure device ( 1 ), wherein the detection device ( 12 ) is configured to generate component quality information, describing the component quality of a three-dimensional object ( 3 ) that is to be manufactured or is manufactured additively, on the basis of the reflected portion of the energy beam ( 5 ) coupled optically into the detection device ( 12 ) via the beam path ( 9 ) of the exposure device ( 1 ).

9 . Exposure device according to claim 8 , characterized in that the measurement beam generating device ( 14 ) is configured to couple the optical measurement beam ( 15 ) into a section of the beam path ( 9 ) of the exposure device ( 1 ) that lies between the energy beam generating device ( 4 ) and the detection device ( 12 ), or the measurement beam generating device ( 14 ) is configured to couple the measurement beam ( 15 ) into a section of the beam path ( 9 ) of the exposure device ( 1 ) that is disposed upstream of the detection device ( 12 ).

10 . Apparatus ( 2 ) for additive manufacturing of three-dimensional objects ( 3 ) by progressive layer-by-layer selective exposure and, associated therewith, solidification of structural material layers composed of a solidifiable structural material ( 6 ) by means of energy beam ( 5 ), characterized in that the apparatus ( 2 ) comprises an exposure device ( 1 ) according to claim 1 .

11 . Apparatus according to claim 10 , characterized by a control device for controlling the exposure of respective structural material layers, which exposure is to be carried out or is carried out by means of the exposure device ( 1 ), on the basis of exposure information describing the selective exposure of a respective structural material layer, wherein the control device is configured to vary the exposure information depending on position detection information generated by means of the position detection device ( 13 ), in particular to adapt said exposure information to a detected change in the position of the beam deflection device ( 7 ), in particular relative to a reference position.

12 . Apparatus according to claim 1 , characterized in that the energy beam generating device ( 4 ) is additionally embodied as a measurement beam generating device ( 14 ), wherein an energy beam ( 5 ) generated by the energy beam generating device ( 4 ) is embodied as a measurement beam ( 15 ).

13 . Apparatus according to claim 1 , characterized in that the beam deflection device ( 7 ) is configured to direct the optical measurement beam ( 15 ) onto a structural material layer to be solidified, and the position detection device ( 13 ) is configured to detect the layer thickness of the structural material layer on the basis of that portion of the optical measurement beam ( 15 ) which is reflected by the structural material layer.

14 . Method for optically, in particular interferometrically, detecting the position of a beam deflection device ( 7 ) of an exposure device ( 1 ) comprising a beam path ( 9 ), in particular of an exposure device ( 1 ) according to claim 1 , of an apparatus ( 2 ) for additive manufacturing of three-dimensional objects ( 3 ) by progressive layer-by-layer selective exposure and, associated therewith, solidification of structural material layers composed of a solidifiable structural material ( 6 ) by means of an energy beam ( 5 ), in particular relative to a reference position, by means of an optical measurement beam ( 15 ), characterized by the following steps:

generating an optical measurement beam ( 15 ),

optically, in particular interferometrically, detecting the position of the beam deflection device ( 7 ), in particular relative to a reference position, by means of the optical measurement beam ( 15 ), in particular by means of a portion of the optical measurement beam ( 15 ) that is reflected by at least one measurement point ( 16 a - 16 c ),

wherein the optical measurement beam ( 15 ) can be coupled or is coupled directly into the beam path ( 9 ) of the exposure device ( 1 ).