IP Library Granted Patent US 10,340,115
Granted Patent B2
US 10,340,115 · App. 15/869,460 · Granted Jul 2, 2019

Charged particle beam apparatus

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Quick Facts
Patent No.
US 10,340,115
App. No.
15/869,460
Granted
Jul 2, 2019
Kind
B2
Abstract

A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

Claims (15)

1. A charged particle beam device comprising:

an optical element which adjusts a charged particle beam emitted from a charged particle source;

an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and

a control device which controls the adjustment element,

wherein the control device continuously tracks or calculates a temperature fluctuation of the optical element based on a condition setting and the incidence condition of the charged particle beam with respect to the optical element.

2. The charged particle beam device according to claim 1 , wherein the temperature fluctuation indicates a degree of deviation from an equilibrium temperature of the optical element.

3. The charged particle beam device according to claim 2 , wherein the control device obtains a difference between a predetermined threshold stored in the control device and the degree of deviation and executes an adjustment by the adjustment element when the difference is equal to or larger than a predetermined value.

4. The charged particle beam device according to claim 3 , wherein the control device stores a date and a time and the degree of deviation when the adjustment is executed.

5. The charged particle beam device according to claim 4 , wherein the predetermined threshold is set for the condition setting, the incidence condition, a length measurement recipe and a measurement target pattern.

6. The charged particle beam device according to claim 5 , further comprising an editing screen on which the predetermined threshold is set.

7. The charged particle beam device according to claim 6 , wherein the incidence condition is an acceleration voltage, an incidence current, or a depth of focus.

8. The charged particle beam device according to claim 4 , wherein the control device executes length measurement of a measurement point based on a length measurement recipe after executing the adjustment by the adjustment element.

9. The charged particle beam device according to claim 8 , wherein the control device displays on a screen a result of the execution of the adjustment by the adjustment element with a time history of the temperature fluctuation.

10. The charged particle beam device according to claim 9 , wherein the control device displays on the screen a length measurement value, a resolution, a focus value, and a wavelength reproducibility with the time history of the temperature fluctuation.

11. The charged particle beam device according to claim 1 , wherein the control device calculates an equilibrium temperature of the optical element based on the condition setting and the incidence condition of the optical element.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →