IP Library › Granted Patent US 10,685,203
Granted Patent B2
US 10,685,203 · App. 15/876,422 · Granted Jun 16, 2020

High-performance film-type touch sensor and method of fabricating the same

Inventors: Yong Seok Choi (Yongin-si, KR); Seung Kook Kim (Seoul, KR); Ju In Yoon (Pyeongtaek-si, KR); Soo Ho Cho (Hwaseong-si, KR)
Assignee: DONGWOO FINE-CHEM CO., LTD.
G06K9/0002G06F3/044G06F2203/04102G06F2203/04103G06F2203/04111H05K3/007H05K2201/10151
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Quick Facts
Patent No.
US 10,685,203
App. No.
15/876,422
Granted
Jun 16, 2020
Kind
B2
Abstract

The present invention relates to a high-performance film-type touch sensor that has a low sheet resistance and can have a high resolution, a large area, and a small thickness, and a method of fabricating the same. In the high-performance film-type touch sensor which is peeled off from a substrate and to which a base film is bonded, at least a separation layer, an electrode pattern layer, and a protection layer are sequentially stacked on the base film, and one or more of first and second electrode patterns arranged in different directions on the separation layer are formed of a plurality of conductive layers to reduce sheet resistance.

Claims (48)

1. A method of fabricating a high-performance film-type touch sensor, the method comprising:

forming a separation layer on a substrate;

forming an electrode pattern layer including first and second electrode patterns arranged on the separation layer in different directions, bridge electrode patterns, and pad electrode patterns;

forming a protection layer on the electrode pattern layer; and

bonding a protection film having one surface to which an adhesive layer is applied onto the protection layer,

wherein one or more of the first and second electrode patterns are formed of a plurality of conductive layers to reduce a sheet resistance,

wherein the plurality of conductive layers include a transparent metal oxide layer and a thin-film metal layer formed on or under the transparent metal oxide layer or between the transparent metal oxide layers,

wherein the conductive layer has a sheet resistance of 10μ/square (sq) or less and a transmittance of 85% or more.

2. The method according to claim 1 ,

the transparent metal oxide layer and the thin-film metal layer have thicknesses of 10 nm to 40 nm and 5 nm to 20 nm respectively, and

an electrode pattern interval is 70 μm or less.

3. The method according to claim 1 ,

wherein a transparent metal oxide layer constituting the plurality of conductive layers includes at least one of indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), fluorine tin oxide (FTO), ITO-Ag-ITO, IZO-Ag-IZO, and AZO-Ag-AZO, and

a thin-film metal layer constituting the plurality of conductive layers includes at least one of Ag, Cu, Al, Pt, and Au.

4. The method according to claim 1 , further comprising:

separating the substrate from the separation layer; and

bonding a base film onto one surface of the separation layer from which the substrate has been separated.

5. The method according to claim 4 , further comprising:

forming a protection layer between the separation layer and the electrode pattern layer.

6. The method according to claim 4 , further comprising: removing the protection film and attaching a polarizer film.

7. A high-performance film-type touch sensor peeled off from a substrate and to which a base film is bonded,

wherein at least a separation layer, an electrode pattern layer, and a protection layer are sequentially stacked on the base film, and

one or more of first and second electrode patterns arranged in different directions on the separation layer are formed of a plurality of conductive layers to reduce sheet resistance,

wherein the plurality of conductive layers include a transparent metal oxide layer and a thin-film metal layer formed on or under the transparent metal oxide layer or between the transparent metal layers,

wherein the conductive layer has a sheet resistance of 10μ/square (sq) or less and a transmittance of 85% or more.

8. The high-performance film-type touch sensor according to claim 7 ,

the transparent metal oxide layer and the thin-film metal layer have thicknesses of 10 nm to 40 nm and 5 nm to 20 nm respectively, and

an electrode pattern interval is 70 μm or less.

9. The high-performance film-type touch sensor according to claim 7 ,

wherein a transparent metal oxide layer constituting the plurality of conductive layers includes at least one of indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), fluorine tin oxide (FTO), ITO-Ag-ITO, IZO-Ag-IZO, and AZO-Ag-AZO, and

a thin-film metal layer constituting the plurality of conductive layers includes at least one of Ag, Cu, Al, Pt, and Au.

10. The high-performance film-type touch sensor according to claim 7 , further comprising: a polarizer film attached onto the protection layer.

11. The fingerprint recognition touch sensor according to claim 7 , wherein a protection film is further stacked on a surface of the protection layer opposite to the electrode pattern layer.

12. A high-performance film-type touch sensor,

wherein at least a separation layer, an electrode pattern layer, and a protection layer are sequentially stacked on a substrate, and

one or more of first and second electrode patterns arranged in different directions on the separation layer are formed of a plurality of conductive layers to reduce sheet resistance,

wherein the plurality of conductive layers include a transparent metal oxide layer and a thin-film metal layer formed on or under the transparent metal oxide layer or between the transparent metal oxide layers,

wherein the conductive layer has a sheet resistance of 10μ/square (sq) or less and a transmittance of 85% or more.

13. A fingerprint recognition touch sensor which is a film-type touch sensor peeled off from a substrate and to which a base film is bonded,

wherein at least a separation layer, an electrode pattern layer, and a protection layer are sequentially stacked on the base film, and

one or more of first and second electrode patterns arranged in different directions on the separation layer are formed of a plurality of conductive layers to reduce sheet resistance,

wherein the plurality of conductive layers include a transparent metal oxide layer and a thin-film metal layer formed on or under the transparent metal oxide layer or between the transparent metal oxide layers,

wherein the conductive layer has a sheet resistance of 10μ/square (sq) or less and a transmittance of 85% or more.

14. A fingerprint recognition touch sensor touch sensor,

wherein at least a separation layer, an electrode pattern layer, a protection layer, and a protection film are sequentially stacked on a substrate, and

one or more of first and second electrode patterns arranged in different directions on the separation layer are formed of a plurality of conductive layers to reduce sheet resistance,

wherein the plurality of conductive layers include a transparent metal oxide layer and a thin-film metal layer formed on or under the transparent metal oxide layer or between the transparent metal oxide layers,

wherein the conductive layer has a sheet resistance of 10μ/square (sq) or less and a transmittance of 85% or more.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 22, 2018
From: CHOI, YONG SEOK; KIM, SEUNG KOOK; YOON, JU IN; CHO, SOO HO
To: DONGWOO FINE-CHEM CO., LTD.
Reel/Frame 045109/0109 →
Priority Claims (1)
KR 10-2017-0010228 · Jan 23, 2017 · national
Continuity (1)
Related Publication 20180211082A1 · Jul 26, 2018