High refractive index gratings for waveguide displays manufactured by self-aligned stacked process
A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning of one or more photoresists to create a stack over a substrate. The manufacturing system performs a conformal deposition of a protective coating on the stack. The manufacturing system performs a deposition of a first photoresist of a first refractive index on the protective coating. The manufacturing system performs a removal of the first photoresist to achieve a threshold value of first thickness. The manufacturing system performs a deposition of a second photoresist of a second refractive index on the first photoresist. The second refractive index is greater than the first refractive index. The manufacturing system performs a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating.
1. A method comprising:
performing a lithographic patterning of one or more photoresists to create a stack over a substrate, the stack comprises a hard mask deposited over the one or more photoresists;
performing a conformal deposition of a protective coating on the stack;
performing a deposition of a first photoresist of a first refractive index on the protective coating;
performing a removal of the first photoresist to achieve a threshold value of first thickness;
performing a deposition of a second photoresist of a second refractive index on the first photoresist, the second refractive index greater than the first refractive index; and
performing a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating from the stack created over the substrate.
2. The method of claim 1 , wherein the stack comprises a first material and a second material deposited over the first material, the second material with a refractive index greater than the first material by a threshold value.
3. The method of claim 1 , wherein the optical grating is a sub-wavelength 3D structure created using a single lithographic exposure.
4. The method of claim 1 , further comprising:
performing a deposition of a third photoresist of a third refractive index on the second photoresist, the third refractive index different from the first refractive index and the second refractive index; and
performing a removal of the third photoresist to achieve a threshold value of third thickness to form the optical grating.
5. The method of claim 1 , further comprising:
performing a selective removal of a volatile photoresist in the stack.
6. The method of claim 5 , wherein the selective removal of the volatile photoresist is based on a thermal decomposition process.
7. The method of claim 5 , wherein the selective removal of the volatile photoresist is based on a photolytic decomposition process.