IP Library › Granted Patent US 12,397,477
Granted Patent B2
US 12,397,477 · App. 18/457,227 · Granted Aug 26, 2025

Methods for compensating for optical surface nonuniformity

Inventors: Jonathan David Waldern (Los Altos Hills, CA); Shibu Abraham (Sunnyvale, CA); Milan Momcilo Popovich (Leicester, GB)
Assignee: DigiLens Inc.
B29C35/0805G02F1/1326G02F1/1334B29C2035/0827G02B2006/12166
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,397,477
App. No.
18/457,227
Filed
Aug 28, 2023
Granted
Aug 26, 2025
Kind
B2
Art Unit
1745
USPC
264/1.24
Abstract

Systems and methods for compensating for nonuniform surface topography features in accordance with various embodiments of the invention are illustrated. One embodiment includes a method for manufacturing waveguide cells, the method including providing a waveguide including first and second substrates and a layer of optical recording material, and applying a surface forming process to at least one external surface of the first and second substrates. In another embodiment, applying the surface forming process includes applying a forming material coating to the at least one external surface, providing a forming element having a forming surface, bringing the forming element in physical contact with the forming material coating, curing the forming material coating while it is in contact with the forming element, and releasing the forming material coating from the forming element.

Claims (28)

1. A method for manufacturing a waveguide supporting a surface relief grating, the method comprising:

depositing a layer of a mixture comprising a photopolymerizable monomer and a liquid crystal on a substrate;

exposing the mixture to a holographic recording beam to form a volume phase grating of alternating liquid crystal-rich and liquid crystal-depleted regions; and

removing the liquid crystal from the volume phase grating to form the surface relief grating of holographic photopolymer.

2. The method of claim 1 , further comprising applying a surface forming process to a surface of the surface relief grating.

3. The method of claim 2 , wherein applying the surface forming process comprises:

applying a forming material coating to the surface relief grating;

providing a forming element having a forming surface;

physically contacting the forming element with the forming material coating;

curing the forming material coating while it is in contact with the forming element; and

releasing the forming material coating from the forming element.

4. The method of claim 3 , wherein the surface forming process provides surface planarization of the surface relief grating.

5. The method of claim 4 , wherein applying the surface forming process further comprises depositing at least one of a release layer or a hard coat layer.

6. The method of claim 5 , wherein the release layer is a fluorocarbon silylating agent.

7. The method of claim 4 , wherein curing the forming material coating comprises applying UV curing radiation via a curing configuration selected from the group consisting of: one or more UV sources distributed above the forming material coating, a fixture comprising UV sources spatially distributed around the waveguide, and one or more UV sources coupled into an internal reflection path within at least one of the forming element or the surface relief grating.

8. The method of claim 4 , wherein curing the forming material coating comprises a curing configuration selected from the group consisting of: applying radiation having more than one wavelength, applying UV radiation having more than one wavelength within the UV spectrum, applying a thermal process, applying pressure, immersing said forming material coating in a vacuum, immersing said forming material coating in a gas, immersing said forming material coating in a liquid, applying radiation having a wavelength within the visible spectrum, applying radiation having a wavelength within the infrared spectrum, and exposing the forming material coating to a humid atmosphere.

9. The method of claim 4 , wherein the forming material coating comprises a material selected from the group consisting of: photoresists, resins, polymers, thermosets, thermoplastic polymers, polyepoxies, polyamides, low viscosity planarization materials, materials with viscosity between 10 and 15 cps at 20° C., materials with viscosity below 2 cps at 20° C., and ethylene glycol diacrylate.

10. The method of claim 4 , wherein a forming surface of the forming element has a surface characteristic for compensating for shrinkage of the forming material coating.

11. The method of claim 4 , where the surface relief grating is curved; and the forming element forming surface has a curvature matching the curvature of the surface relief grating.

12. The method of claim 4 , wherein the forming surface of the forming element has a degree of planarization less than 98%.

13. The method of claim 4 , wherein the forming element is an optical flat, a refractive optical element, or an optical element with at least one optical surface providing optical power.

14. The method of claim 4 , wherein said forming element is supported by a substrate providing an optical path from a light source for curing.

15. The method of claim 4 , wherein the forming material coating has a refractive index higher or lower than the holographic photopolymer.

16. The method of claim 1 , wherein the substrate is a plastic.

17. The method of claim 1 , wherein the substrate has a birefringence specified to provide smoothing of non-uniformity after a predefined number of total internal reflection (TIR) beam reflections.

18. The method of claim 1 , wherein depositing the layer of the mixture onto the substrate comprises: depositing said layer of the mixture onto the substrate using at least one deposition head, wherein the mixture deposited over a grating region is formulated to achieve a predefined grating characteristic selected from the group consisting of: refractive index modulation, refractive index, birefringence, liquid crystal director alignment, grating layer thickness, and a spatial variation of the characteristic.

19. The method of claim 18 , further comprising depositing at least one of a release layer or a hard coat layer using the at least one deposition head.

20. The method of claim 1 , wherein the layer of the mixture comprises a polymer dispersed liquid crystal mixture.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 17, 2024
From: WALDERN, JONATHAN DAVID; ABRAHAM, SHIBU; POPOVICH, MILAN MOMCILO
To: DIGILENS INC.
Reel/Frame 068011/0175 →
Continuity (3)
Continuation 16783019 · Feb 5, 2020
Provisional Application 62801528 · Feb 5, 2019
Related Publication 20240217142A1 · Jul 4, 2024
References Cited (400)
US 1043938A · Huttenlocher · 1912 [cited by applicant]
US 2141884A · Sonnefeld · 1938 [cited by applicant]
US 3482498A · Becker · 1969 [cited by applicant]
US 3620601A · Leonard et al. · 1971 [cited by applicant]
US 3741716A · Johne et al. · 1973 [cited by applicant]
US 3804496A · Crane et al. · 1974 [cited by applicant]
US 3843231A · Borel et al. · 1974 [cited by applicant]
US 3851303A · Muller · 1974 [cited by applicant]
US 3885095A · Wolfson et al. · 1975 [cited by applicant]
US 3940204A · Withrington · 1976 [cited by applicant]
US 3965029A · Arora · 1976 [cited by applicant]
US 3975711A · McMahon · 1976 [cited by applicant]
US 4028725A · Lewis · 1977 [cited by applicant]
US 4035068A · Rawson · 1977 [cited by applicant]
US 4038110A · Feng · 1977 [cited by applicant]
US 4066334A · Fray et al. · 1978 [cited by applicant]
US 4082432A · Kirschner · 1978 [cited by applicant]
US 4099841A · Ellis · 1978 [cited by applicant]
US 4133152A · Penrose · 1979 [cited by applicant]
US 4178074A · Heller · 1979 [cited by applicant]
US 4218111A · Withrington et al. · 1980 [cited by applicant]
US 4232943A · Rogers · 1980 [cited by applicant]
US 4248093A · Andersson et al. · 1981 [cited by applicant]
US 4251137A · Knop et al. · 1981 [cited by applicant]
US 4309070A · St. Leger Searle · 1982 [cited by applicant]
US 4322163A · Schiller · 1982 [cited by applicant]
US 4386361A · Simmonds · 1983 [cited by applicant]
US 4389612A · Simmonds et al. · 1983 [cited by applicant]
US 4403189A · Simmonds · 1983 [cited by applicant]
US 4403827A · Bryan et al. · 1983 [cited by applicant]
US 4418993A · Lipton · 1983 [cited by applicant]
US 4472037A · Lipton · 1984 [cited by applicant]
US 4523226A · Lipton et al. · 1985 [cited by applicant]
US 4544267A · Schiller · 1985 [cited by applicant]
US 4562463A · Lipton · 1985 [cited by applicant]
US 4566758A · Bos et al. · 1986 [cited by applicant]
US 4583117A · Lipton et al. · 1986 [cited by applicant]
US 4636237A · Geppaard · 1987 [cited by applicant]
US 4643515A · Upatnieks · 1987 [cited by applicant]
US 4647967A · Kirschner et al. · 1987 [cited by applicant]
US 4688900A · Doane et al. · 1987 [cited by applicant]
US 4711512A · Upatnieks · 1987 [cited by applicant]
US 4714320A · Banbury · 1987 [cited by applicant]
US 4728547A · Vaz et al. · 1988 [cited by applicant]
US 4729640A · Sakata et al. · 1988 [cited by applicant]
US 4741926A · White et al. · 1988 [cited by applicant]
US 4743083A · Schimpe · 1988 [cited by applicant]
US 4749256A · Bell et al. · 1988 [cited by applicant]
US 4765703A · Suzuki et al. · 1988 [cited by applicant]
US 4775218A · Wood et al. · 1988 [cited by applicant]
US 4791788A · Simmonds et al. · 1988 [cited by applicant]
US 4792850A · Liptoh et al. · 1988 [cited by applicant]
US 4794021A · Potter · 1988 [cited by applicant]
US 4799765A · Ferrer · 1989 [cited by applicant]
US 4811414A · Fishbine et al. · 1989 [cited by applicant]
US 4848093A · Simmonds et al. · 1989 [cited by applicant]
US 4852988A · Velez et al. · 1989 [cited by applicant]
US 4854688A · Hayford et al. · 1989 [cited by applicant]
US 4860294A · Winzer et al. · 1989 [cited by applicant]
US 4884876A · Lipton et al. · 1989 [cited by applicant]
US 4890902A · Doane et al. · 1990 [cited by applicant]
US 4928301A · Smoot · 1990 [cited by applicant]
US 4933976A · Fishbine et al. · 1990 [cited by applicant]
US 4938568A · Margerum et al. · 1990 [cited by applicant]
US 4946245A · Chamberlin et al. · 1990 [cited by applicant]
US 4960311A · Moss et al. · 1990 [cited by applicant]
US 4964701A · Dorschner et al. · 1990 [cited by applicant]
US 4967268A · Lipton et al. · 1990 [cited by applicant]
US 4970129A · Ingwall et al. · 1990 [cited by applicant]
US 4971719A · Vaz et al. · 1990 [cited by applicant]
US 4994204A · Doane et al. · 1991 [cited by applicant]
US 5004323A · West · 1991 [cited by applicant]
US 5007711A · Wood et al. · 1991 [cited by applicant]
US 5009483A · Rockwell et al. · 1991 [cited by applicant]
US 5011624A · Yamagishi et al. · 1991 [cited by applicant]
US 5016953A · Moss et al. · 1991 [cited by applicant]
US 5033814A · Brown et al. · 1991 [cited by applicant]
US 5035734A · Honkanen et al. · 1991 [cited by applicant]
US 5053834A · Simmonds · 1991 [cited by applicant]
US 5063441A · Lipton et al. · 1991 [cited by applicant]
US 5076664A · Migozzi · 1991 [cited by applicant]
US 5079416A · Filipovich · 1992 [cited by applicant]
US 5096282A · Margerum et al. · 1992 [cited by applicant]
US 5099343A · Margerum et al. · 1992 [cited by applicant]
US 5109465A · Klopotek · 1992 [cited by applicant]
US 5110034A · Simmonds et al. · 1992 [cited by applicant]
US 5117285A · Nelson et al. · 1992 [cited by applicant]
US 5117302A · Lipton · 1992 [cited by applicant]
US 5119454A · McMahon et al. · 1992 [cited by applicant]
US 5124821A · Antier et al. · 1992 [cited by applicant]
US 5138687A · Horie et al. · 1992 [cited by applicant]
US 5139192A · Simmonds et al. · 1992 [cited by applicant]
US 5142357A · Lipton et al. · 1992 [cited by applicant]
US 5142644A · Vansteenkiste et al. · 1992 [cited by applicant]
US 5148302A · Nagano et al. · 1992 [cited by applicant]
US 5150234A · Takahashi et al. · 1992 [cited by applicant]
US 5151958A · Honkanen · 1992 [cited by applicant]
US 5153751A · Ishikawa et al. · 1992 [cited by applicant]
US 5159445A · Gitlin et al. · 1992 [cited by applicant]
US 5160523A · Honkanen et al. · 1992 [cited by applicant]
US 5181133A · Lipton · 1993 [cited by applicant]
US 5183545A · Branca et al. · 1993 [cited by applicant]
US 5187597A · Kato et al. · 1993 [cited by applicant]
US 5193000A · Lipton et al. · 1993 [cited by applicant]
US 5198912A · Ingwall et al. · 1993 [cited by applicant]
US 5198914A · Arns · 1993 [cited by applicant]
US 5200861A · Moskovich et al. · 1993 [cited by applicant]
US 5210624A · Matsumoto et al. · 1993 [cited by applicant]
US 5210801A · Fournier et al. · 1993 [cited by applicant]
US 5218360A · Goetz et al. · 1993 [cited by applicant]
US 5218480A · Moskovich et al. · 1993 [cited by applicant]
US 5224198A · Jachimowicz et al. · 1993 [cited by applicant]
US 5225918A · Taniguchi et al. · 1993 [cited by applicant]
US 5239372A · Lipton · 1993 [cited by applicant]
US 5240636A · Doane et al. · 1993 [cited by applicant]
US 5241337A · Betensky et al. · 1993 [cited by applicant]
US 5242476A · Bartel et al. · 1993 [cited by applicant]
US 5243413A · Gitlin et al. · 1993 [cited by applicant]
US 5251048A · Doane et al. · 1993 [cited by applicant]
US 5264950A · West et al. · 1993 [cited by applicant]
US 5268792A · Kreitzer et al. · 1993 [cited by applicant]
US 5284499A · Harvey et al. · 1994 [cited by applicant]
US 5289315A · Makita et al. · 1994 [cited by applicant]
US 5295208A · Caulfield et al. · 1994 [cited by applicant]
US 5296967A · Moskovich et al. · 1994 [cited by applicant]
US 5299289A · Omae et al. · 1994 [cited by applicant]
US 5303085A · Rallison · 1994 [cited by applicant]
US 5306923A · Kazmierski et al. · 1994 [cited by applicant]
US 5309283A · Kreitzer et al. · 1994 [cited by applicant]
US 5313330A · Betensky · 1994 [cited by applicant]
US 5315324A · Kubelik et al. · 1994 [cited by applicant]
US 5315419A · Saupe et al. · 1994 [cited by applicant]
US 5315440A · Betensky et al. · 1994 [cited by applicant]
US 5317405A · Kuriki et al. · 1994 [cited by applicant]
US 5327269A · Tilton et al. · 1994 [cited by applicant]
US 5329363A · Moskovich et al. · 1994 [cited by applicant]
US 5341230A · Smith · 1994 [cited by applicant]
US 5343147A · Sager et al. · 1994 [cited by applicant]
US 5351151A · Levy · 1994 [cited by applicant]
US 5359362A · Lewis et al. · 1994 [cited by applicant]
US 5363220A · Kuwayama et al. · 1994 [cited by applicant]
US 5368770A · Saupe et al. · 1994 [cited by applicant]
US 5369511A · Amos · 1994 [cited by applicant]
US 5371626A · Betensky · 1994 [cited by applicant]
US 5400069A · Braun et al. · 1995 [cited by applicant]
US 5408346A · Trissel et al. · 1995 [cited by applicant]
US 5410370A · Janssen · 1995 [cited by applicant]
US 5410376A · Cornsweet et al. · 1995 [cited by applicant]
US 5416510A · Lipton et al. · 1995 [cited by applicant]
US 5416514A · Janssen et al. · 1995 [cited by applicant]
US 5418584A · Larson · 1995 [cited by applicant]
US 5418871A · Revelli et al. · 1995 [cited by applicant]
US 5428480A · Betensky et al. · 1995 [cited by applicant]
US 5437811A · Doane et al. · 1995 [cited by applicant]
US 5438357A · McNelley · 1995 [cited by applicant]
US 5452385A · Izumi et al. · 1995 [cited by applicant]
US 5453863A · West et al. · 1995 [cited by applicant]
US 5455693A · Wreede et al. · 1995 [cited by applicant]
US 5455713A · Kreitzer et al. · 1995 [cited by applicant]
US 5462700A · Beeson et al. · 1995 [cited by applicant]
US 5463428A · Lipton et al. · 1995 [cited by applicant]
US 5465311A · Caulfield et al. · 1995 [cited by applicant]
US 5471326A · Hall et al. · 1995 [cited by applicant]
US 5473222A · Thoeny et al. · 1995 [cited by applicant]
US 5476611A · Nolan et al. · 1995 [cited by applicant]
US 5481321A · Lipton · 1996 [cited by applicant]
US 5481385A · Zimmerman et al. · 1996 [cited by applicant]
US 5485313A · Betensky · 1996 [cited by applicant]
US 5493430A · Lu et al. · 1996 [cited by applicant]
US 5493448A · Betensky et al. · 1996 [cited by applicant]
US 5496621A · Makita et al. · 1996 [cited by applicant]
US 5499140A · Betensky · 1996 [cited by applicant]
US 5500671A · Andersson et al. · 1996 [cited by applicant]
US 5500769A · Betensky · 1996 [cited by applicant]
US 5510913A · Hashimoto et al. · 1996 [cited by applicant]
US 5515184A · Caulfield et al. · 1996 [cited by applicant]
US 5516455A · Jacobine et al. · 1996 [cited by applicant]
US 5524272A · Podowski et al. · 1996 [cited by applicant]
US 5528720A · Winston et al. · 1996 [cited by applicant]
US 5530566A · Kumar · 1996 [cited by applicant]
US 5532736A · Kuriki et al. · 1996 [cited by applicant]
US 5532875A · Betemsky · 1996 [cited by applicant]
US 5537232A · Biles · 1996 [cited by applicant]
US RE35310E · Moskovich · 1996 [cited by applicant]
US 5543950A · Lavrentovich et al. · 1996 [cited by applicant]
US 5544268A · Bischel et al. · 1996 [cited by applicant]
US 5559637A · Moskovich et al. · 1996 [cited by applicant]
US 5572248A · Allen et al. · 1996 [cited by applicant]
US 5572250A · Lipton et al. · 1996 [cited by applicant]
US 5576888A · Betensky · 1996 [cited by applicant]
US 5579026A · Tabata · 1996 [cited by applicant]
US 5583795A · Smyth · 1996 [cited by applicant]
US 5585035A · Nerad et al. · 1996 [cited by applicant]
US 5593615A · Nerad et al. · 1997 [cited by applicant]
US 5604611A · Saburi et al. · 1997 [cited by applicant]
US 5606433A · Mn et al. · 1997 [cited by applicant]
US 5612733A · Flohr · 1997 [cited by applicant]
US 5612734A · Nelson et al. · 1997 [cited by applicant]
US 5619254A · McNelley · 1997 [cited by applicant]
US 5619586A · Sibbald et al. · 1997 [cited by applicant]
US 5621529A · Gordon et al. · 1997 [cited by applicant]
US 5621552A · Coates et al. · 1997 [cited by applicant]
US 5625495A · Moskovich et al. · 1997 [cited by applicant]
US 5629259A · Akada et al. · 1997 [cited by applicant]
US 5631107A · Tarumi et al. · 1997 [cited by applicant]
US 5633100A · Mickish et al. · 1997 [cited by applicant]
US 5646785A · Gilboa et al. · 1997 [cited by applicant]
US 5648857A · Ando et al. · 1997 [cited by applicant]
US 5661577A · Jenkins et al. · 1997 [cited by applicant]
US 5661603A · Hanano et al. · 1997 [cited by applicant]
US 5665494A · Kawabata et al. · 1997 [cited by applicant]
US 5668614A · Chien et al. · 1997 [cited by applicant]
US 5668907A · Veligdan · 1997 [cited by applicant]
US 5677797A · Betensky et al. · 1997 [cited by applicant]
US 5680231A · Grinberg et al. · 1997 [cited by applicant]
US 5680411A · Ramdane et al. · 1997 [cited by applicant]
US 5682255A · Friesem et al. · 1997 [cited by applicant]
US 5686931A · Fuenfschilling et al. · 1997 [cited by applicant]
US 5686975A · Lipton · 1997 [cited by applicant]
US 5691795A · Doane et al. · 1997 [cited by applicant]
US 5694230A · Welch · 1997 [cited by applicant]
US 5695682A · Doane et al. · 1997 [cited by applicant]
US 5701132A · Kollin et al. · 1997 [cited by applicant]
US 5706108A · Ando et al. · 1998 [cited by applicant]
US 5706136A · Okuyama et al. · 1998 [cited by applicant]
US 5707925A · Akada et al. · 1998 [cited by applicant]
US 5710645A · Phillips et al. · 1998 [cited by applicant]
US 5724189A · Ferrante · 1998 [cited by applicant]
US 5724463A · Deacon et al. · 1998 [cited by applicant]
US 5726782A · Kato et al. · 1998 [cited by applicant]
US 5727098A · Jacobson · 1998 [cited by applicant]
US 5729242A · Margerum et al. · 1998 [cited by applicant]
US 5731060A · Hirukawa et al. · 1998 [cited by applicant]
US 5731853A · Taketomi et al. · 1998 [cited by applicant]
US 5736424A · Prybyla et al. · 1998 [cited by applicant]
US 5742262A · Tabata et al. · 1998 [cited by applicant]
US 5745266A · Smith et al. · 1998 [cited by applicant]
US 5745301A · Betensky et al. · 1998 [cited by applicant]
US 5748272A · Tanaka et al. · 1998 [cited by applicant]
US 5748277A · Huang et al. · 1998 [cited by applicant]
US 5751452A · Tanaka et al. · 1998 [cited by applicant]
US 5757546A · Lipton et al. · 1998 [cited by applicant]
US 5760931A · Saburi et al. · 1998 [cited by applicant]
US 5760960A · Lin et al. · 1998 [cited by applicant]
US 5764414A · King et al. · 1998 [cited by applicant]
US 5771320A · Stone · 1998 [cited by applicant]
US 5790288A · Jager et al. · 1998 [cited by applicant]
US 5790314A · Duck et al. · 1998 [cited by applicant]
US 5798641A · Spagna et al. · 1998 [cited by applicant]
US 5804609A · Ohnishi et al. · 1998 [cited by applicant]
US 5808804A · Moskovich · 1998 [cited by applicant]
US 5812608A · Valimaki et al. · 1998 [cited by applicant]
US 5822089A · Phillips et al. · 1998 [cited by applicant]
US 5822127A · Chen et al. · 1998 [cited by applicant]
US 5825448A · Bos et al. · 1998 [cited by applicant]
US 5831700A · Li et al. · 1998 [cited by applicant]
US 5835661A · Tai et al. · 1998 [cited by applicant]
US 5841507A · Barnes · 1998 [cited by applicant]
US 5841587A · Moskovich et al. · 1998 [cited by applicant]
US 5847787A · Fredley et al. · 1998 [cited by applicant]
US 5856842A · Tedesco · 1999 [cited by applicant]
US 5857043A · Cook et al. · 1999 [cited by applicant]
US 5867238A · Miller et al. · 1999 [cited by applicant]
US 5867618A · Ito et al. · 1999 [cited by applicant]
US 5868951A · Schuck et al. · 1999 [cited by applicant]
US 5870228A · Kreitzer et al. · 1999 [cited by applicant]
US 5875012A · Crawford et al. · 1999 [cited by applicant]
US 5877826A · Yang et al. · 1999 [cited by applicant]
US 5886822A · Spitzer · 1999 [cited by applicant]
US 5892598A · Asakawa et al. · 1999 [cited by applicant]
US 5892599A · Bahuguna · 1999 [cited by applicant]
US 5898511A · Mizutani et al. · 1999 [cited by applicant]
US 5900987A · Kreitzer et al. · 1999 [cited by applicant]
US 5900989A · Kreitzer · 1999 [cited by applicant]
US 5903395A · Rallison et al. · 1999 [cited by applicant]
US 5903396A · Rallison · 1999 [cited by applicant]
US 5907416A · Hegg et al. · 1999 [cited by applicant]
US 5907436A · Perry et al. · 1999 [cited by applicant]
US 5917459A · Son et al. · 1999 [cited by applicant]
US 5926147A · Sehm et al. · 1999 [cited by applicant]
US 5929946A · Sharp et al. · 1999 [cited by applicant]
US 5929960A · West et al. · 1999 [cited by applicant]
US 5930433A · Williamson et al. · 1999 [cited by applicant]
US 5936776A · Kreitzer · 1999 [cited by applicant]
US 5937115A · Domash · 1999 [cited by applicant]
US 5942157A · Sutherland et al. · 1999 [cited by applicant]
US 5945893A · Plessky et al. · 1999 [cited by applicant]
US 5949302A · Sarkka · 1999 [cited by applicant]
US 5949508A · Kumar et al. · 1999 [cited by applicant]
US 5956113A · Crawford · 1999 [cited by applicant]
US 5962147A · Shalhub et al. · 1999 [cited by applicant]
US 5963375A · Kreitzer · 1999 [cited by applicant]
US 5966223A · Friesem et al. · 1999 [cited by applicant]
US 5969874A · Moskovich · 1999 [cited by applicant]
US 5969876A · Kreitzer et al. · 1999 [cited by applicant]
US 5973727A · McGrew et al. · 1999 [cited by applicant]
US 5974162A · Metz et al. · 1999 [cited by applicant]
US 5985422A · Krauter · 1999 [cited by applicant]
US 5986746A · Metz et al. · 1999 [cited by applicant]
US 5991087A · Rallison · 1999 [cited by applicant]
US 5999089A · Carlson et al. · 1999 [cited by applicant]
US 5999282A · Suzuki et al. · 1999 [cited by applicant]
US 5999314A · Asakura et al. · 1999 [cited by applicant]
US 6014187A · Taketomi et al. · 2000 [cited by applicant]
US 6023375A · Kreitzer · 2000 [cited by applicant]
US 6042947A · Asakura et al. · 2000 [cited by applicant]
US 6043585A · Plessky et al. · 2000 [cited by applicant]
US 6046585A · Simmonds · 2000 [cited by applicant]
US 6052540A · Koyama · 2000 [cited by applicant]
US 6061107A · Yang · 2000 [cited by applicant]
US 6061463A · Metz et al. · 2000 [cited by applicant]
US 6069728A · Huignard et al. · 2000 [cited by applicant]
US 6075626A · Mizutani et al. · 2000 [cited by applicant]
US 6078427A · Fontaine et al. · 2000 [cited by applicant]
US 6084998A · Straayer · 2000 [cited by applicant]
US 6094311A · Moskovich · 2000 [cited by applicant]
US 6097551A · Kreitzer · 2000 [cited by applicant]
US 6104448A · Doane et al. · 2000 [cited by applicant]
US 6107943A · Schroeder · 2000 [cited by applicant]
US 6115152A · Popovich et al. · 2000 [cited by applicant]
US 6118908A · Bischel et al. · 2000 [cited by applicant]
US 6121899A · Theriault · 2000 [cited by applicant]
US 6124954A · Popovich et al. · 2000 [cited by applicant]
US 6127066A · Ueda et al. · 2000 [cited by applicant]
US 6128058A · Walton et al. · 2000 [cited by applicant]
US 6133971A · Silverstein et al. · 2000 [cited by applicant]
US 6133975A · Li et al. · 2000 [cited by applicant]
US 6137630A · Tsou et al. · 2000 [cited by applicant]
US 6141074A · Bos et al. · 2000 [cited by applicant]
US 6141154A · Kreitzer et al. · 2000 [cited by applicant]
US 6151142A · Phillips et al. · 2000 [cited by applicant]
US 6154190A · Yang et al. · 2000 [cited by applicant]
US 6156243A · Kosuga et al. · 2000 [cited by applicant]
US 6167169A · Brinkman et al. · 2000 [cited by applicant]
US 6169594B1 · Aye et al. · 2001 [cited by applicant]
US 6169613B1 · Amitai et al. · 2001 [cited by applicant]
US 6169636B1 · Kreitzer et al. · 2001 [cited by applicant]
US 6172792B1 · Jepsen et al. · 2001 [cited by applicant]
US 6176837B1 · Foxlin · 2001 [cited by applicant]
US 6185015B1 · Reinhorn et al. · 2001 [cited by applicant]
US 6185016B1 · Popovich · 2001 [cited by applicant]
US 6188462B1 · Lavrentovich et al. · 2001 [cited by applicant]
US 6191887B1 · Michaloski et al. · 2001 [cited by applicant]
US 6195206B1 · Yona et al. · 2001 [cited by applicant]
US 6195209B1 · Kreitzer et al. · 2001 [cited by applicant]
US 6204835B1 · Yang et al. · 2001 [cited by applicant]
US 6211976B1 · Popovich et al. · 2001 [cited by applicant]
US 6215579B1 · Bloom et al. · 2001 [cited by applicant]
US 6218316B1 · Marsh · 2001 [cited by applicant]
US 6222297B1 · Perdue · 2001 [cited by applicant]
US 6222675B1 · Mall et al. · 2001 [cited by applicant]
US 6222971B1 · Veligdan et al. · 2001 [cited by applicant]
US 6249386B1 · Yona et al. · 2001 [cited by applicant]
US 6259423B1 · Tokito et al. · 2001 [cited by applicant]
US 6259559B1 · Kobayashi et al. · 2001 [cited by applicant]
US 6266166B1 · Katsumata et al. · 2001 [cited by applicant]
US 6268839B1 · Yang et al. · 2001 [cited by applicant]
US 6269203B1 · Davies et al. · 2001 [cited by applicant]
US 6275031B1 · Simmonds et al. · 2001 [cited by applicant]
US 6278429B1 · Ruth et al. · 2001 [cited by applicant]
US 6285813B1 · Schultz et al. · 2001 [cited by applicant]
US 6297860B1 · Moskovich et al. · 2001 [cited by applicant]
US 6301056B1 · Kreitzer et al. · 2001 [cited by applicant]
US 6301057B1 · Kreitzer et al. · 2001 [cited by applicant]
US 6317083B1 · Johnson et al. · 2001 [cited by applicant]
US 6317227B1 · Mizutani et al. · 2001 [cited by applicant]
US 6317228B2 · Popovich et al. · 2001 [cited by applicant]
US 6317528B1 · Gadkaree et al. · 2001 [cited by applicant]
US 6320563B1 · Yang et al. · 2001 [cited by applicant]
US 6321069B1 · Piirainen · 2001 [cited by applicant]
US 6323970B1 · Popovich · 2001 [cited by applicant]
US 6323989B1 · Jacobson et al. · 2001 [cited by applicant]
US 6324014B1 · Moskovich et al. · 2001 [cited by applicant]
US 6327089B1 · Hosaki et al. · 2001 [cited by applicant]
US 6330109B1 · Ishii et al. · 2001 [cited by applicant]
US 6333819B1 · Svedenkrans · 2001 [cited by applicant]
US 6335224B1 · Peterson et al. · 2002 [cited by applicant]
US 6339486B1 · Popovich · 2002 [cited by applicant]
US 6340540B1 · Ueda et al. · 2002 [cited by applicant]
US 6351273B1 · Lemelson et al. · 2002 [cited by applicant]
US 6351333B2 · Araki et al. · 2002 [cited by applicant]
US 6356172B1 · Koivisto et al. · 2002 [cited by applicant]
US 6356674B1 · Davis et al. · 2002 [cited by applicant]
US 6359730B2 · Tervonen · 2002 [cited by applicant]
US 6359737B1 · Stringfellow · 2002 [cited by applicant]
US 6366281B1 · Lipton et al. · 2002 [cited by applicant]
US 6366369B2 · Ichikawa et al. · 2002 [cited by applicant]
US 6366378B1 · Tervonen et al. · 2002 [cited by applicant]
US 6377238B1 · McPheters · 2002 [cited by applicant]
US 6377321B1 · Khan et al. · 2002 [cited by applicant]
US 6388797B1 · Lipton et al. · 2002 [cited by applicant]
US 6392812B1 · Howard · 2002 [cited by applicant]
US 6407724B2 · Waldern et al. · 2002 [cited by applicant]
US 6409687B1 · Foxlin · 2002 [cited by applicant]
US 6411444B1 · Moskovich et al. · 2002 [cited by applicant]
US 6414760B1 · Lopez et al. · 2002 [cited by applicant]
US 6417971B1 · Moskovich et al. · 2002 [cited by applicant]
US 6437563B1 · Simmonds et al. · 2002 [cited by applicant]
US 6445512B1 · Moskovich et al. · 2002 [cited by applicant]
US 6449095B1 · Ohtaki et al. · 2002 [cited by applicant]
Cited By (1)
US 12,625,374