IP Library › Granted Patent US 10,761,231
Granted Patent B2
US 10,761,231 · App. 15/883,817 · Granted Sep 1, 2020

Generating a high-resolution lithology model for subsurface formation evaluation

Inventors: Hao Zhang (Spring, TX); Alberto Mezzatesta (Houston, TX)
Assignee: BAKER HUGHES, A GE COMPANY, LLC
G01V1/306C09K8/62E21B7/068E21B43/00E21B44/00E21B49/003E21B49/006G01V1/288G01V1/301G01V1/50G01V3/081G01V5/10G01V99/005
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Quick Facts
Patent No.
US 10,761,231
App. No.
15/883,817
Granted
Sep 1, 2020
Kind
B2
Abstract

Examples of techniques for generating a high-resolution lithology model for subsurface formation evaluation are disclosed. In one example implementation according to aspects of the present disclosure, a computer-implemented method includes determining, by a processing device, a low-resolution lithology volumetric model. The method further includes comparing, by the processing device, the low-resolution lithology volumetric model to a high-resolution imaging log. The method further includes calculating, by the processing device, a dynamic boundary curve for each of a plurality of moving windows. The method further includes generating, by the processing device, the high-resolution lithology model based at least in part on the calculated dynamic boundary curve for each of the plurality of moving windows. The method further includes controlling a drilling operation based at least in part on the high-resolution lithology model.

Claims (37)

1. A computer-implemented method for generating a high-resolution lithology model, the method comprising:

determining, by a processing device, a low-resolution lithology volumetric model;

comparing, by the processing device, the low-resolution lithology volumetric model to a high-resolution imaging log;

calculating, by the processing device, a dynamic boundary curve for each of a plurality of moving windows;

generating, by the processing device, the high-resolution lithology model based at least in part on the calculated dynamic boundary curve for each of the plurality of moving windows; and

controlling drilling equipment based at least in part on the high-resolution lithology model.

2. The computer-implemented method of claim 1 , further comprising, prior to determining the low-resolution lithology volumetric model:

defining, by the processing device, a commonly used lithology reference model.

3. The computer-implemented method of claim 2 , wherein defining the commonly used lithology reference model is based at least in part on one or more of a known mineral composition, a known porosity, and a known fluid saturation.

4. The computer-implemented method of claim 2 , further comprising:

calculating, by the processing device, tool parameters for the defined commonly used lithology reference model.

5. The computer-implemented method of claim 4 , wherein the tool parameters are one or more of a density response, a compensated neutron response, an acoustic response, a nuclear magnetic resonance response, a spectroscopy elemental weight fraction response, and a tool response from logging equipment.

6. The computer-implemented method of claim 4 , further comprising:

assigning, by the processing device, uncertainty values for each of a plurality of input logs.

7. The computer-implemented method of claim 6 , further comprising:

applying, by the processing device, a probabilistic approach based on the defined commonly used lithology reference model.

8. The computer-implemented method of claim 1 , wherein the high-resolution lithology model indicates a subsurface material type at each depth level of an earth formation.

9. The computer-implemented method of claim 8 , wherein the subsurface material type is one of sand, carbonate, and shale.

10. The computer-implemented method of claim 1 , wherein controlling the drilling equipment comprises adjusting at least one of a rate of penetration, a weight on bit, a depth of a drill bit, and a trajectory of the drill bit.

11. A system comprising:

drilling equipment;

a memory comprising computer readable instructions; and

a processing device for executing the computer readable instructions for performing a method for generating a high-resolution lithology model, the method comprising:

determining, by the processing device, a low-resolution lithology volumetric model;

comparing, by the processing device, the low-resolution lithology volumetric model to a high-resolution imaging log;

calculating, by the processing device, one or more dynamic boundary curves for each of a plurality of moving windows;

generating, by the processing device, the high-resolution lithology model based at least in part on the calculated dynamic boundary curve for each of the plurality of moving windows; and

controlling the drilling equipment based at least in part on the high-resolution lithology model.

12. The system of claim 11 , wherein the method further comprises, prior to determining the low-resolution lithology volumetric model:

defining, by the processing device, a commonly used lithology reference model;

calculating, by the processing device, tool parameters for the defined commonly used lithology reference model;

assigning, by the processing device, uncertainty values for each of a plurality of input logs; and

applying, by the processing device, a probabilistic approach based on the defined commonly used lithology reference model.

13. The system of claim 11 , wherein the high-resolution lithology model indicates a subsurface material type at each depth level of an earth formation.

14. The system of claim 13 , wherein the subsurface material type is one of sand, carbonate, shale, evaporate, igneous, and coal.

15. The system of claim 11 , wherein controlling the drilling equipment comprises adjusting at least one of a rate of penetration, a weight on bit, a depth of a drill bit, and a trajectory of the drill bit.

16. The system of claim 11 , wherein the method further comprises preforming reservoir assessment and designing completion and production strategies based at least in part on the high-resolution lithology model.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2018
From: ZHANG, HAO; MEZZATESTA, ALBERTO
To: BAKER HUGHES, A GE COMPANY, LLC
Reel/Frame 045279/0702 →
Continuity (1)
Related Publication 20190235109A1 · Aug 1, 2019
Cited By (1)
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