IP Library Granted Patent US 10,795,751
Granted Patent B2
US 10,795,751 · App. 15/884,372 · Granted Oct 6, 2020

Cell-aware diagnostic pattern generation for logic diagnosis

Inventors: Huaxing Tang (Wilsonville, OR); Manish Sharma (Wilsonville, OR); Wu-Tung Cheng (Lake Oswego, OR)
Assignee: Mentor Graphics Corporation
G06F11/079G01R31/2837G01R31/2896G01R31/318342G06F11/0778G01R31/287G06F11/263
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Quick Facts
Patent No.
US 10,795,751
App. No.
15/884,372
Granted
Oct 6, 2020
Kind
B2
Abstract

Various aspects of the disclosed technology relate to techniques of logic diagnosis based on cell-aware diagnostic pattern generation. A first diagnosis process is performed on a failed integrated circuit based on a first fail log to generate a first set of defect suspects. The first fail log is generated by applying the first set of test patterns to the failed integrated circuit in a first scan-based test. A second set of test patterns are generated using fault models for internal defects in one or more cells included in the first set of defect suspects. The second set of test patterns are applied to the failure integrated circuit to generate a second fail log. A second diagnosis process is performed on the failure integrated circuit based on the second fail log.

Claims (33)

1. One or more non-transitory computer-readable media storing computer-executable instructions, the computer-executable instructions, when executed, causing one or more processors to perform a method, the method comprising:

performing a first diagnosis process on a failed integrated circuit based on a first fail log, a first set of test patterns and a circuit design based on which the failed integrated circuit is fabricated to generate a first set of defect suspects that define one or more cells in the circuit design, thereby identifying one or more defective cells in the circuit design, wherein the first fail log is generated by applying the first set of test patterns to the failed integrated circuit in a first scan-based test, the first fail log including information describing when, where, and how a test failed and which of the first set of test patterns generate expected test responses;

based on identifying the one or more suspect defective cells, generating a second set of test patterns using fault models for internal defects in the one or more suspect defective cells, the second set of test patterns capable of detecting each of the fault models for internal defects in the one or more suspect defective cells for at least a predetermined number of times;

performing a second diagnosis process on the failure integrated circuit based on a second fail log, the second set of test patterns and the circuit design to generate a second set of defect suspects, the second fail log generated by applying the second set of test patterns to the failure integrated circuit in a second scan-based test; and

reporting the second set of defect suspects.

2. The one or more non-transitory computer-readable media recited in claim 1 , wherein each of the first diagnosis process and the second diagnosis process comprises failing test pattern simulations and passing test pattern simulations.

3. The one or more non-transitory computer-readable media recited in claim 1 , wherein the fault models for internal defects in the one or more cells are generated based on fault simulation.

4. The one or more non-transitory computer-readable media recited in claim 1 , wherein the fault models for internal defects in the one or more cells are exhaustive fault models covering all possible one-cycle and two-cycle input combinations and all possible fault effect propagation scenarios at all outputs of a cell.

5. The one or more non-transitory computer-readable media recited in claim 1 , wherein the generating a second set of test patterns comprises:

generating two-time-frame test patterns; and generating one-time-frame test patterns.

6. The one or more non-transitory computer-readable media recited in claim 1 , wherein the reporting comprises storing the second set of defect suspects.

7. A method, executed by at least one processor of a computer, comprising:

performing a first diagnosis process on a failed integrated circuit based on a first fail log, a first set of test patterns and a circuit design based on which the failed integrated circuit is fabricated to generate a first set of defect suspects that define one or more cells in the circuit design, thereby identifying one or more defective cells in the circuit design, wherein the first fail log is generated by applying the first set of test patterns to the failed integrated circuit in a first scan-based test, the first fail log including information describing when, where, and how a test failed and which of the first set of test patterns generate expected test responses;

based on identifying the one or more suspect defective cells, generating a second set of test patterns using fault models for internal defects in the one or more suspect defective cells, the second set of test patterns capable of detecting each of the fault models for internal defects in the one or more suspect defective cells for at least a predetermined number of times;

performing a second diagnosis process on the failure integrated circuit based on a second fail log, the second set of test patterns and the circuit design to generate a second set of defect suspects, the second fail log generated by applying the second set of test patterns to the failure integrated circuit in a second scan-based test; and

reporting the second set of defect suspects.

8. The method recited in claim 7 , wherein each of the first diagnosis process and the second diagnosis process comprises failing test pattern simulations and passing test pattern simulations.

9. The method recited in claim 7 , wherein the fault models for internal defects in the one or more cells are generated based on fault simulation.

10. The method recited in claim 7 , wherein the fault models for internal defects in the one or more cells are exhaustive fault models covering all possible one-cycle and two-cycle input combinations and all possible fault effect propagation scenarios at all outputs of a cell.

11. The method recited in claim 7 , wherein the generating a second set of test patterns comprises: generating two-time-frame test patterns; and generating one-time-frame test patterns.

12. The method recited in claim 7 , wherein the reporting comprises storing the second set of defect suspects.

13. A system comprising: one or more processors, the one or more processors programmed to perform a method, the method comprising:

performing a first diagnosis process on a failed integrated circuit based on a first fail log, a first set of test patterns and a circuit design based on which the failed integrated circuit is fabricated to generate a first set of defect suspects that define one or more cells in the circuit design, thereby identifying one or more defective cells in the circuit design, wherein the first fail log is generated by applying the first set of test patterns to the failed integrated circuit in a first scan-based test, the first fail log including information describing when, where, and how a test failed and which of the first set of test patterns generate expected test responses;

based on identifying the one or more suspect defective cells, generating a second set of test patterns using fault models for internal defects in the one or more suspect defective cells, the second set of test patterns capable of detecting each of the fault models for internal defects in the one or more suspect defective cells for at least a predetermined number of times;

performing a second diagnosis process on the failure integrated circuit based on a second fail log, the second set of test patterns and the circuit design to generate a second set of defect suspects, the second fail log generated by applying the second set of test patterns to the failure integrated circuit in a second scan-based test; and

reporting the second set of defect suspects.

14. The system recited in claim 13 , wherein each of the first diagnosis process and the second diagnosis process comprises failing test pattern simulations and passing test pattern simulations.

15. The system recited in claim 13 , wherein the fault models for internal defects in the one or more cells are generated based on fault simulation.

16. The system recited in claim 13 , wherein the fault models for internal defects in the one or more cells are exhaustive fault models covering all possible one-cycle and two-cycle input combinations and all possible fault effect propagation scenarios at all outputs of a cell.

17. The system recited in claim 13 , wherein the generating a second set of test patterns comprises:

generating two-time-frame test patterns; and

generating one-time-frame test patterns.

18. The system recited in claim 13 , wherein the post-layout verification process wherein the reporting comprises storing the second set of defect suspects.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Jun 24, 2021
From: MENTOR GRAPHICS CORPORATION; SIEMENS INDUSTRY SOFTWARE INC.
To: SIEMENS INDUSTRY SOFTWARE INC.
Reel/Frame 056675/0285 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2018
From: TANG, HUAXING; SHARMA, MANISH; CHENG, WU-TUNG
To: MENTOR GRAPHICS CORPORATION
Reel/Frame 044783/0561 →
Continuity (2)
Provisional Application 62467027 · Mar 3, 2017
Related Publication 20180253346A1 · Sep 6, 2018
Cited By (1)
US 12,248,859