A memory device is described. A first conductive layer extends in a first direction. A second conductive layer extends in the first direction. A third conductive layer extends in a second direction intersecting the first direction. A first oxide region is disposed between the first conductive layer and the third conductive layer and between the second conductive layer and the third conductive layer. A semiconductor region is disposed between the first conductive layer and the first oxide region and between the first conductive layer and the second conductive layer. A second distance between the semiconductor region, which is disposed between the first conductive layer and the second conductive layer, and the third conductive layer, is longer than a first distance between the semiconductor region, which is disposed between the first conductive layer and the first oxide region, and the third conductive layer.
1. A memory device comprising:
a first conductive layer extending in a first direction;
a second conductive layer extending in the first direction;
a third conductive layer extending in a second direction intersecting the first direction, the third conductive layer including a metal layer;
a first oxide region disposed between the first conductive layer and the third conductive layer and between the second conductive layer and the third conductive layer; and
a semiconductor region disposed between the first conductive layer and the first oxide region and between the first conductive layer and the second conductive layer, wherein
a first distance exists between the semiconductor region, as disposed between the first conductive layer and the first oxide region, and the third conductive layer,
and a second distance exists between the semiconductor region, as disposed between the first conductive layer and the second conductive layer, and the third conductive layer,
the second distance being longer than the first distance.
2. The memory device according to claim 1 , further comprising
a first insulator disposed between the first oxide region and the semiconductor region, the first insulator disposed between the first conductive layer and the second conductive layer.
3. The memory device according to claim 1 , further comprising
a second oxide region disposed between the semiconductor region and the first oxide region.
4. The memory device according to claim 1 , further comprising
a second insulator disposed between the first conductive layer and the semiconductor region.
5. The memory device according to claim 3 , further comprising
a second insulator disposed between the first conductive layer and the semiconductor region.
6. The memory device according to claim 1 , wherein
the semiconductor region between the first conductive layer and the second conductive layer comprises a p-impurity region.
7. The memory device according to claim 2 , wherein
the semiconductor region between the first conductive layer and the second conductive layer comprises a p-impurity region contiguous to the first insulator.
8. The memory device according to claim 2 , wherein
a second film thickness of the first oxide region between the first insulator and the third conductive layer is larger than a first film thickness of the first oxide region between the first conductive layer and the third conductive layer.
9. The memory device according to claim 1 , wherein
the first oxide region comprises titanium oxide.
10. The memory device according to claim 1 , wherein
the semiconductor region comprises amorphous silicon.
11. The memory device according to claim 3 , wherein
the second oxide region comprises aluminum oxide, hafnium oxide, or zirconium oxide.
12. The memory device according to claim 3 , wherein
the second oxide region has a thickness equal to or less than 0.8 nm.
13. The memory device according to claim 3 , wherein
the second oxide region is a reaction inhibiting layer inhibiting elements from traveling between the first oxide region and the semiconductor region.
14. The memory device according to claim 2 , wherein the dielectric constant of the first insulator is lower than that of the first oxide region.
15. The memory device according to claim 2 , wherein the first and second conductive layers comprise word lines, and the third conductive layer comprises a bit line.
16. A method comprising:
forming a first conductive layer extending in a first direction;
forming a second conductive layer extending in the first direction;
forming a third conductive layer extending in a second direction intersecting the first direction, the third conductive layer including a metal layer;
forming a first oxide region between the first conductive layer and the third conductive layer and between the second conductive layer and the third conductive layer; and
forming a semiconductor region between the first conductive layer and the first oxide region and between the first conductive layer and the second conductive layer, wherein
a first distance exists between the semiconductor region, as disposed between the first conductive layer and the first oxide region, and the third conductive layer,
and a second distance exists between the semiconductor region, as disposed between the first conductive layer and the second conductive layer, and the third conductive layer,
the second distance being longer than the first distance.