IP Library › Granted Patent US 10,994,239
Granted Patent B2
US 10,994,239 · App. 15/915,252 · Granted May 4, 2021

Spiral gas adsorption apparatus and method of using the same

Inventors: Michiaki Sano (Yokkaichi, JP); Jo Sato (Yokkaichi, JP)
Assignee: SANDISK TECHNOLOGIES LLC
B01D53/0454B01J20/06B01J20/14B01D2313/40
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,994,239
App. No.
15/915,252
Granted
May 4, 2021
Kind
B2
Abstract

A gas scrubber includes a canister having a rotatable spiral separator which provides a non-linear path configured to be filled with modular adsorbent material portions between a gas inlet and a gas outlet.

Claims (10)

1. A method of scrubbing halogen gas from an etching or deposition chamber comprising passing a halogen containing exhaust gas from the etching or deposition chamber through a canister containing a plurality of modular sorbent material portions each shaped in a block and at least one partition comprising a series of interdigitated walls between the respective modular sorbent material portions, such that the at least one partition in the canister forces the halogen containing exhaust gas through the sorbent material in at least two directions.

2. The method of claim 1 , wherein:

the plurality of modular adsorbent material portions comprise activated carbon, calcium hydroxide, calcium carbonate, calcium oxide, calcium aluminate, aluminium hydroxide, aluminium oxide, nickel oxide, nickel carbonate, nickel hydroxide, boehmite, diatomaceous earth, attapulgite or mixtures thereof; and

the modular adsorbent material portions are selected to adsorb a halogen containing gas which comprises SiF 4 , SiCl 4 , CF 4 , Cl 2 , Bra, HBr, HI, HCl, NF 3 , SiH 2 Cl 2 , CH 3 CCl 3 or mixtures thereof.

3. The method of claim 1 , wherein the series of interdigitated walls comprises a series of vertically oriented walls.

4. The method of claim 1 , wherein the series of interdigitated walls comprises a series of horizontally oriented walls.

5. A method of scrubbing halogen gas from an etching or deposition chamber comprising passing a halogen containing exhaust gas from the etching or deposition chamber through a canister containing at least one modular sorbent material portion shaped in a block and at least one partition comprising a series of interdigitated walls, such that the at least one partition in the canister forces the halogen containing exhaust gas through the sorbent material in at least two directions, wherein the series of interdigitated walls comprises at least three horizontally oriented walls which are provided only in a top portion of the canister.

6. The method of claim 5 , wherein:

the at least one modular adsorbent material portion comprise activated carbon, calcium hydroxide, calcium carbonate, calcium oxide, calcium aluminate, aluminium hydroxide, aluminium oxide, nickel oxide, nickel carbonate, nickel hydroxide, boehmite, diatomaceous earth, attapulgite or mixtures thereof; and

the modular adsorbent material portions are selected to adsorb a halogen containing gas which comprises SiF 4 , SiCl 4 , CF 4 , Cl 2 , Bra, HBr, HI, HCl, NF 3 , SiH 2 Cl 2 , CH 3 CCl 3 or mixtures thereof.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 5, 2018
From: SANO, MICHIAKI; SATO, JO
To: SANDISK TECHNOLOGIES LLC
Reel/Frame 045444/0232 →
Continuity (1)
Related Publication 20190275459A1 · Sep 12, 2019
Cited By (1)
US 12,377,380