Semiconductor device and method for manufacturing same
View Patent ↗According to one embodiment, the substrate includes a plurality of protrusions having columnar configurations, and a void being formed below the protrusions. The stacked body is provided on the substrate. The stacked body includes a plurality of electrode layers stacked with an insulator interposed. The semiconductor body contacts the protrusion and extends through the stacked body in a stacking direction of the stacked body. Upper ends of the protrusions are positioned at a height between a lowermost electrode layer and an electrode layer of a second layer from a bottom of the electrode layers.
1. A semiconductor device, comprising:
a silicon substrate including a plurality of silicon protrusions having columnar configurations, and a void being formed below the protrusions;
a stacked body provided on the substrate, the stacked body including a plurality of electrode layers stacked with an insulator interposed; and
a semiconductor body contacting the protrusion and extending through the stacked body in a stacking direction of the stacked body,
upper ends of the protrusions being positioned at a height between a lowermost electrode layer and an electrode layer of a second layer from a bottom of the electrode layers,
the substrate including a lower region and an upper region, the upper region being provided in a hole formed in the substrate, the hole having a bottom surface and a side surface substantially perpendicular to the bottom surface, the void being provided between the upper region and the lower region, the lower region contacting the bottom surface of the hole and not contacting the void, the protrusions being silicon crystals grown in the hole,
a maximum width of the void being smaller than a width of the bottom surface, and
an impurity concentration at the lower region being different from an impurity concentration at the upper region.
2. The device according to claim 1 , wherein a chlorine concentration of the lower region is higher than a chlorine concentration of the upper region.
3. The device according to claim 1 , wherein a carbon concentration of the lower region is higher than a carbon concentration of the upper region.
4. The device according to claim 3 , wherein the carbon concentration of the lower region is 3×10 19 cm −3 or more.
5. The device according to claim 1 , wherein a phosphorus concentration of the lower region is higher than a phosphorus concentration of the upper region.
6. The device according to claim 5 , wherein the phosphorus concentration of the lower region is 3×10 19 cm −3 or more.
7. The device according to claim 1 , further comprising a charge storage portion provided between the semiconductor body and one of the electrode layers.
8. The device according to claim 1 , wherein the voids are formed below 90% or more of protrusions of the plurality of protrusions.
9. The device according to claim 1 , wherein the substrate includes an intermediate region between the lower region and the void, and the intermediate region is a silicon crystal grown from the bottom surface of the hole.