Pattern formation method and pattern formation material
According to one embodiment, a pattern formation method is disclosed. The method can include a film formation process, and a exposure process. The film formation process forms a pattern formation material film on a base body. The pattern formation material film includes a pattern formation material including a first portion and a second portion. The first portion includes at least one of acrylate or methacrylate. The second portion includes an alicyclic compound and a carbonyl group. The alicyclic compound has an ester bond to the at least one of the acrylate or the methacrylate. The carbonyl group is bonded to the alicyclic compound. The exposure process causes the pattern formation material film to expose to a metal compound including a metallic element.
1. A pattern formation method, comprising:
forming a pattern formation material film on a base body, the pattern formation material film including a pattern formation material including a monomer which includes a first portion and a second portion, the first portion including at least one of acrylate or methacrylate, the second portion including an alicyclic compound and a carbonyl group, the alicyclic compound having an ester bond to the at least one of the acrylate or the methacrylate of the first portion, the carbonyl group being bonded to the alicyclic compound of the second portion;
patterning the pattern formation material film by removing a first region of the pattern formation material film; and
exposing the pattern formation material film to a metal compound including a metal element after the patterning the pattern formation material.
2. The method according to claim 1 , wherein,
the patterning the pattern formation material film further comprises:
irradiating an electromagnetic wave on the first region of the pattern formation material film before removing the first region of the pattern formation material film.
3. The method according to claim 2 , wherein a peak wavelength of the electromagnetic wave is less than 194 nm.
4. The method according to claim 2 , wherein the electromagnetic wave is emitted from an ArF excimer laser.
5. The method according to claim 1 , wherein the metal compound includes an organic metal compound.
6. The method according to claim 1 , wherein the metal compound includes trimethyl aluminum.
7. The method according to claim 1 , wherein the metal compound includes chlorine and at least one selected from the group consisting of Ti, V, and W.
8. The method according to claim 1 , wherein the alicyclic compound includes a plurality of cyclic hydrocarbons bonded to each other.
9. The method according to claim 1 , wherein the alicyclic compound includes at least one selected from the group consisting of an adamantane ring, a tricyclodecane ring, an isobornane ring, a norbornane ring, a tetracyclododecane ring, and a cyclohexane ring.
10. The method according to claim 1 , wherein
the first portion includes a side chain, and
the alicyclic compound is bonded to the side chain.