Optical metrology device using numerical aperture reduction
A metrology device that can determine at least one characteristics of a sample is disclosed. The metrology device includes an optical system that uses spatially coherent light with a first and a second objective lens as well as a detector that detects light reflected from the sample. The objective lenses use numerical apertures sufficient to produce a small probe size, e.g., less than 200 μm, while a spatial filter is used to reduce the effective numerical aperture of the optical system as seen by the detector to avoid loss of information and demanding computation requirements caused by the large angular spread due to large numerical apertures. The spatial filter permits light to pass in a desired range of angles, while blocking the remaining light and is positioned to prevent use of the full spatial extent of at least one of the first objective lens and the second objective lens.
1. An optical metrology device for measuring at least one characteristic of a target, the optical metrology device comprising:
an optical system comprising:
a first objective lens that is configured to receive a coherent light and focus the coherent light to be obliquely incident on the target, wherein an optical axis of the first objective lens is at an angle of incidence and an azimuthal angle with respect to the target, wherein at least a portion of the coherent light is reflected;
a second objective lens that is configured to receive the coherent light that is reflected,
a detector that is configured to receive the coherent light that is reflected and produce signals in response;
a spatial filter that is configured to reduce an effective numerical aperture of the optical system as seen by the detector, the spatial filter is positioned in the optical system between an input of the first objective lens and the detector and the spatial filter blocks a first portion of the coherent light from exiting the spatial filter and permits a second portion of the coherent light to pass, wherein the spatial filter comprise two separate apertures that permit the coherent light in the optical system to pass at two different ranges of angles of incidence or two different ranges of azimuthal angles, the optical metrology device further comprising a movable cover that moves to selectively cover one of the two separate apertures; and
at least one processor coupled to receive the signals from the detector, the at least one processor configured to determine at least a characteristic of the target using the signals from the detector.
2. The optical metrology device of claim 1 , wherein the coherent light is infrared light and the first objective lens and the second objective lens are reflective optical elements.
3. The optical metrology device of claim 1 , wherein the input of the first objective lens is a back focal plane, and the spatial filter is positioned at one of the back focal plane of the first objective lens, between the first objective lens and the second objective lens, at the back focal plane of the second objective lens, and between the second objective lens and the detector in a conjugate plane between two lenses.
4. The optical metrology device of claim 1 , wherein the spatial filter permits the second portion of the coherent light to pass in at least one of a first range of angle of incidence and a second range of azimuthal angle, or a combination thereof.
5. The optical metrology device of claim 1 , wherein the first objective lens has a numerical aperture sufficient to focus the coherent light into a measurement spot of less than 200 μm in its largest dimension, and the spatial filter is positioned in the optical system between the target and the detector.
6. The optical metrology device of claim 1 , wherein the first objective lens and the second objective lens have matching numerical apertures and wherein the spatial filter prevents use of a full spatial extent of at least one of the first objective lens and the second objective lens.
7. A method for performing optical measurements of at least one characteristic of a target performed by an optical metrology device having an optical system, the method comprising:
focusing coherent light to be obliquely incident on the target along an optical axis that is at an angle of incidence and an azimuthal angle with respect to the target using a first objective lens, wherein at least a portion of the coherent light is reflected from the target;
receiving the coherent light that is reflected with a second objective lens;
reducing an effective numerical aperture of the optical system as seen by a detector by blocking a first portion of the coherent light and permitting a second portion of the coherent light to pass at a position in the optical system between an input of the first objective lens and the detector;
moving a cover to selectively cover one of two apertures to permit the second portion of the coherent light to pass at one of two different ranges of angles of incidence or two different ranges of azimuthal angles;
detecting with the detector the coherent light that is reflected; and
determining at least a characteristic of the target using the coherent light detected by the detector.
8. The method of claim 7 , wherein the coherent light is infrared light and the first objective lens and the second objective lens are reflective optical elements.
9. The method of claim 7 , wherein the input of the first objective lens is a back focal plane, and wherein the blocking is at one of the back focal plane of the first objective lens, between the first objective lens and the second objective lens, at the back focal plane of the second objective lens, and between the second objective lens and the detector in a conjugate plane between two lenses.
10. The method of claim 7 , wherein the second portion of the coherent light is permitted to pass in at least one of a first range of angle of incidence and a second range of azimuthal angle, or a combination thereof.
11. The method of claim 7 , wherein the first objective lens has a numerical aperture sufficient to focus the coherent light into a measurement spot of less than 200 μm in its largest dimension, and the blocking in the optical system is between the target and the detector.
12. The method of claim 7 , wherein the first objective lens and the second objective lens have matching numerical apertures and wherein blocking the first portion of the coherent light prevents use of a full spatial extent of at least one of the first objective lens and the second objective lens.
13. An optical metrology device for measuring at least one characteristic of a target, the optical metrology device comprising:
an optical system comprising:
a first objective lens that is configured to receive coherent light and focus the coherent light to be obliquely incident on the target, wherein an optical axis of the first objective lens is at an angle of incidence and an azimuthal angle, wherein at least a portion of the coherent light is reflected;
a second objective lens that is configured to receive the coherent light that is reflected, the second objective lens is separate from the first objective lens;
a detector that is configured to receive the coherent light that is reflected and produce signals in response; and
a means for reducing an effective numerical aperture of the optical system as seen by the detector;
a means for selecting between one of two different ranges of angles of incidence or two different ranges of azimuthal angles; and
at least one processor coupled to receive the signals from the detector, the at least one processor configured to determine at least a characteristic of the target using the signals from the detector.
14. The optical metrology device of claim 13 , wherein the coherent light is infrared light and the first objective lens and the second objective lens are reflective optical elements.
15. The optical metrology device of claim 1 , wherein the means for reducing the effective numerical aperture of the optical system is positioned in the optical system at one of a back focal plane of the first objective lens, between the first objective lens and the second objective lens, at the back focal plane of the second objective lens, and between the second objective lens and the detector in a conjugate plane between two lenses.
16. The optical metrology device of claim 13 , wherein the first objective lens has a numerical aperture sufficient to focus the coherent light into a measurement spot of less than 200 μm in its largest dimension, and the means for reducing the effective numerical aperture of the optical system is positioned in the optical system between the target and the detector.
17. The optical metrology device of claim 13 , wherein the first objective lens and the second objective lens have matching numerical apertures and wherein the means for reducing the effective numerical aperture of the optical system prevents use of a full spatial extent of at least one of the first objective lens and the second objective lens.