Transistor structure with a stress layer
A new transistor structure is disclosed. This new structure has a dielectric stress layer in a three-dimensional structure outside of the gate region for modulation or the characteristics of the transistor. Additionally, trenches are created in the region between the source electrode and the drain electrode in such a manner so as to create ridges that traverse the gate region.
1. A semiconductor structure for use in a III-Nitride (III-N) semiconductor device, comprising:
a semiconductor layer comprising a first III-N material for providing electrical conduction;
a barrier layer comprising a second III-N material;
a source electrode and a drain electrode disposed in ohmic recesses in contact with the barrier layer;
a trench region defined between the source electrode and the drain electrode, wherein trenches are etched into portions of the barrier layer between the source electrode and the drain electrode, wherein ridges are created between the trenches, wherein the ridges comprise the semiconductor layer and the barrier layer and extend from an area near the source electrode to an area near the drain electrode and traverse the trench region;
a gate recess region defined in the trench region, wherein the gate recess region is narrower than the trench region such that the trenches are disposed on both sides of the gate recess region;
a dielectric layer, wherein the dielectric layer fills at least a portion of the trenches and covers the barrier layer outside the gate recess region, and wherein a thickness of the dielectric layer in the gate recess region is less than in other areas; and
a gate electrode disposed in the gate recess region, wherein the gate electrode is formed over the ridges.
2. The semiconductor structure of claim 1 , wherein the dielectric layer has compressive or tensile stress.
3. The semiconductor structure of claim 2 , wherein the dielectric layer comprises a plurality of sublayers, wherein at least one of the plurality of sublayers has compressive or tensile stress.
4. The semiconductor structure of claim 2 , wherein a magnitude of the compressive or tensile stress is greater than 10 MPascal.
5. The semiconductor structure of claim 2 , wherein the dielectric layer is selected from Si x N y , SiO 2 , SiON y , Al 2 O 3 , and AlN.
6. The semiconductor structure of claim 1 , wherein the dielectric layer fills an entirety of the trenches between the ridges outside of the gate recess region.
7. The semiconductor structure of claim 1 , wherein the dielectric layer is absent in the gate recess region.
8. The semiconductor structure of claim 1 , wherein the gate electrode fills the gate recess region and an upper portion of the gate electrode is wider than the gate recess region.
9. The semiconductor structure of claim 8 , wherein the upper portion of the gate electrode is narrower than the trench region.
10. The semiconductor structure of claim 1 , further comprising a gate dielectric material disposed beneath the gate electrode.
11. The semiconductor structure of claim 1 , wherein a depth of the trenches is greater than a thickness of the barrier layer such that the trenches extend into the semiconductor layer.
12. The semiconductor structure of claim 1 , wherein a depth of the trenches is less than a thickness of the barrier layer such that the trenches do not extend into the semiconductor layer.