Substrate processing apparatus
A substrate processing apparatus includes a substrate processing part configured to process a substrate under a vacuum atmosphere, a substrate transfer part connected to the substrate processing part and configured to transfer the substrate under an air atmosphere, and a load lock part disposed between the substrate processing part and the substrate transfer part and configured to switch between the air atmosphere and the vacuum atmosphere. At least a part of the load lock part is disposed inside the substrate transfer part.
1. A substrate processing apparatus, comprising:
a substrate processing part configured to process a substrate under a vacuum atmosphere;
a substrate transfer chamber connected to the substrate processing part, including an inlet/outlet port which is formed in a sidewall of the substrate transfer chamber and connected to a load port, and configured to transfer the substrate under an air atmosphere, the substrate being loaded into and unloaded from the substrate processing apparatus via the load port; and
a load lock part disposed between the substrate processing part and the substrate transfer chamber and configured to switch between the air atmosphere and the vacuum atmosphere, and including a plurality of load lock chambers arranged horizontally,
wherein at least a part of each of the load lock chambers is disposed in an interior of a space inside the substrate transfer chamber,
wherein the at least a part of each of the load lock chambers includes: a first opening which is formed in an upper surface of each of the load lock chambers, communicates with the substrate transfer chamber and is capable of being opened and closed; and a second opening which is formed in a sidewall of each of the load lock chambers, communicates with the substrate processing part, and is capable of being opened and closed,
wherein the upper surface of each of the load lock chambers protrudes toward the interior of the substrate transfer chamber such that an entire of the first opening is opened in the interior of space inside the substrate transfer chamber in an upper direction of each of the load lock chambers, and
wherein a first height in which the substrate is transferred between the substrate processing part and the load lock part via the second opening is different from a second height in which the substrate is transferred between the substrate transfer chamber and the load port via the inlet/outlet port.
2. The apparatus of claim 1 , wherein the first opening is circular in shape having a diameter larger than 300 mm.
3. The apparatus of claim 1 , wherein the second opening is opened in a lateral direction of each of the load lock chambers.
4. The apparatus of claim 1 , wherein the load lock part includes an elevating mechanism which vertically moves in the interior of each of the load lock chambers to support the substrate above the first opening.
5. The apparatus of claim 4 , further comprising:
a first transfer mechanism configured to transfer the substrate between a carrier and the load lock part in the substrate transfer chamber; and
a second transfer mechanism configured to transfer the substrate between the load lock part and the substrate processing part,
wherein the elevating mechanism is configured to transfer the substrate between the first transfer mechanism and the second transfer mechanism in the load lock part.