Dual self-aligned gate endcap (SAGE) architectures
Dual self-aligned gate endcap (SAGE) architectures, and methods of fabricating dual self-aligned gate endcap (SAGE) architectures, are described. In an example, an integrated circuit structure includes a first semiconductor fin having a cut along a length of the first semiconductor fin. A second semiconductor fin is parallel with the first semiconductor fin. A first gate endcap isolation structure is between the first semiconductor fin and the second semiconductor fin. A second gate endcap isolation structure is in a location of the cut along the length of the first semiconductor fin.
1. An integrated circuit structure, comprising:
a first semiconductor fin having a cut along a length of the first semiconductor fin;
a second semiconductor fin parallel with the first semiconductor fin;
a first gate endcap isolation structure between the first semiconductor fin and the second semiconductor fin; and
a second gate endcap isolation structure in a location of the cut along the length of the first semiconductor fin, the second endcap isolation structure parallel with and discrete from the first endcap isolation structure without an intervening semiconductor fin between the first and second endcap isolation structures, wherein the second gate endcap isolation structure is spaced apart from and is not in contact with the first semiconductor fin.
2. The integrated circuit structure of claim 1 , wherein the second gate endcap isolation structure has a bottom surface above a bottom surface of the first gate endcap isolation structure.
3. The integrated circuit structure of claim 1 , further comprising:
a third semiconductor fin parallel with the first and second semiconductor fins, the third semiconductor fin spaced apart from the second gate endcap isolation structure by a first spacing at a side of the second gate endcap isolation structure opposite the first gate endcap isolation structure, wherein the second semiconductor fin is spaced apart from the first gate endcap isolation structure by a second spacing less than the first spacing.
4. The integrated circuit structure of claim 1 , wherein the first gate endcap isolation structure has a first substantially uniform width along the lengths of the first and second semiconductor fins, and wherein the second gate endcap isolation structure has a second substantially uniform width along the lengths of the first and second semiconductor fins.
5. The integrated circuit structure of claim 4 , wherein the second substantially uniform width is greater than the first substantially uniform width.
6. The integrated circuit structure of claim 1 , wherein one or both of the first or second gate endcap isolation structure comprises a lower dielectric portion and a dielectric cap on the lower dielectric portion.
7. The integrated circuit structure of claim 1 , wherein one or both of the first or second gate endcap isolation structure comprises a vertical seam centered within the one or both of the first or second gate endcap isolation structure.
8. The integrated circuit structure of claim 1 , wherein the first gate endcap isolation structure has a total composition different than a total composition of the second gate endcap isolation structure.
9. An integrated circuit structure, comprising:
a first semiconductor fin having a cut along a length of the first semiconductor fin;
a second semiconductor fin parallel with the first semiconductor fin;
a first gate endcap isolation structure between the first semiconductor fin and the second semiconductor fin; and
a second gate endcap isolation structure in a location of the cut along the length of the first semiconductor fin, wherein the second gate endcap isolation structure has a bottom surface above a bottom surface of the first gate endcap isolation structure, and wherein the second gate endcap isolation structure is spaced apart from and is not in contact with the first semiconductor fin.
10. The integrated circuit structure of claim 9 , further comprising:
a third semiconductor fin parallel with the first and second semiconductor fins, the third semiconductor fin spaced apart from the second gate endcap isolation structure by a first spacing at a side of the second gate endcap isolation structure opposite the first gate endcap isolation structure, wherein the second semiconductor fin is spaced apart from the first gate endcap isolation structure by a second spacing less than the first spacing.
11. The integrated circuit structure of claim 9 , wherein the first gate endcap isolation structure has a first substantially uniform width along the lengths of the first and second semiconductor fins, and wherein the second gate endcap isolation structure has a second substantially uniform width along the lengths of the first and second semiconductor fins.
12. The integrated circuit structure of claim 11 , wherein the second substantially uniform width is greater than the first substantially uniform width.
13. The integrated circuit structure of claim 9 , wherein one or both of the first or second gate endcap isolation structure comprises a lower dielectric portion and a dielectric cap on the lower dielectric portion.
14. The integrated circuit structure of claim 9 , wherein one or both of the first or second gate endcap isolation structure comprises a vertical seam centered within the one or both of the first or second gate endcap isolation structure.
15. The integrated circuit structure of claim 9 , wherein the first gate endcap isolation structure has a total composition different than a total composition of the second gate endcap isolation structure.
16. An integrated circuit structure, comprising:
a first semiconductor fin having a cut along a length of the first semiconductor fin;
a second semiconductor fin parallel with the first semiconductor fin;
a first gate endcap isolation structure between the first semiconductor fin and the second semiconductor fin; and
a second gate endcap isolation structure in a location of the cut along the length of the first semiconductor fin, wherein the second gate endcap isolation structure is spaced apart from and is not in contact with the first semiconductor fin; and
a third semiconductor fin parallel with the first and second semiconductor fins, the third semiconductor fin spaced apart from the second gate endcap isolation structure by a first spacing at a side of the second gate endcap isolation structure opposite the first gate endcap isolation structure, wherein the second semiconductor fin is spaced apart from the first gate endcap isolation structure by a second spacing less than the first spacing.
17. The integrated circuit structure of claim 16 , wherein the first gate endcap isolation structure has a first substantially uniform width along the lengths of the first and second semiconductor fins, and wherein the second gate endcap isolation structure has a second substantially uniform width along the lengths of the first and second semiconductor fins.
18. The integrated circuit structure of claim 17 , wherein the second substantially uniform width is greater than the first substantially uniform width.
19. The integrated circuit structure of claim 16 , wherein one or both of the first or second gate endcap isolation structure comprises a lower dielectric portion and a dielectric cap on the lower dielectric portion.
20. The integrated circuit structure of claim 16 , wherein one or both of the first or second gate endcap isolation structure comprises a vertical seam centered within the one or both of the first or second gate endcap isolation structure.
21. The integrated circuit structure of claim 16 , wherein the first gate endcap isolation structure has a total composition different than a total composition of the second gate endcap isolation structure.