Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
1. A support table configured to support a substrate, wherein the support table comprises:
a first plurality of burls protruding from a first base surface and a second plurality of burls protruding from a second base surface, each burl of the first and second plurality of burls having a respective distal end, the first and second plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the first and second plurality of burls,
wherein end surfaces of the distal ends of the first and second plurality of burls are in a generally same plane,
wherein the second plurality of burls are outward, relative to a center of the support table, from the first plurality of burls,
wherein a distance between the end surfaces of the first plurality of burls and the first base surface is larger than a distance between the end surfaces of the second plurality of burls and the second base surface,
wherein (i) the second base surface is at an incline to the first base surface or (ii) the second base surface is non-coplanar with the first base surface, is located at a different distance from the generally same plane than the first base surface and has a first set of burls from the plurality of second burls at a first distance from a center of the support table and a second set of burls from the plurality of second burls at a second distance from the center different than the first distance, and
wherein at least parts of the second base surface are located on opposite sides of the first base surface.
2. The support table of claim 1 , wherein the second base surface is at an incline relative to the first base surface.
3. The support table of claim 2 , wherein the second base surface surrounds the first base surface.
4. The support table of claim 1 , wherein the distal ends of at least some first burls of the first and/or second plurality of burls have a different surface roughness arranged to contact the substrate than the distal ends of at least some other second burls of the first and/or second plurality of burls.
5. The support table of claim 4 , wherein the first burls are arranged in a region inward, relative to a center of the support table, of a region of the second burls.
6. The support table of claim 5 , wherein the first burls have a greater surface roughness than the second burls.
7. The support table of claim 1 , wherein a total area of the second plurality of burls in contact with a substrate when supported by the second plurality of burls per unit area of the substrate is greater in a region of the substrate that is adjacent an edge of the substrate than a total area of the first plurality of burls in contact with a substrate when supported by the first plurality of burls per unit area of the substrate is in a region of the substrate that is at a central portion of the substrate.
8. The support table of claim 1 , further comprising a plurality of protrusions, wherein the plurality of protrusions protrude above the first and/or second base surface among the respective first and/or second plurality of burls and wherein each protrusion has a height above the first and/or second base surface less than the heights of the respective first and/or second plurality of burls.
9. A lithographic apparatus, comprising:
the support table of claim 1 configured to support a substrate; and
a projection system configured to project a radiation beam onto the substrate.
10. A support table configured to support a surface of a substrate, wherein the support table comprises:
a first plurality of burls protruding from a first base surface and a second plurality of burls protruding from a second base surface, each burl of the first and second plurality of burls having a respective distal end, the first and second plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the first and second plurality of burls,
wherein end surfaces of the distal ends of the first and second plurality of burls are in a generally same plane,
wherein the second plurality of burls are outward, relative to a center of the support table, from the first plurality of burls,
wherein at least the second base surface is at an incline to the first base surface, and
wherein at least parts of the second base surface are located on opposite sides of the first base surface.
11. The support table of claim 10 , wherein the first base surface is generally horizontal.
12. The support table of claim 10 , wherein the second base surface surrounds the first base surface.
13. The support table of claim 10 , wherein the distal ends of at least some first burls of the first and/or second plurality of burls have a different surface roughness arranged to contact the substrate than the distal ends of at least some other second burls of the first and/or second plurality of burls.
14. The support table of claim 13 , wherein the first burls are arranged in a region inward, relative to a center of the support table, of a region of the second burls.
15. The support table of claim 14 , wherein the first burls have a greater surface roughness than the second burls.
16. The support table of claim 10 , wherein a total area of the second plurality of burls in contact with a substrate when supported by the second plurality of burls per unit area of the substrate is greater in a region of the substrate that is adjacent an edge of the substrate than a total area of the first plurality of burls in contact with a substrate when supported by the first plurality of burls per unit area of the substrate is in a region of the substrate that is at a central portion of the substrate.
17. The support table of claim 10 , further comprising a plurality of protrusions, wherein the plurality of protrusions protrude above the first and/or second base surface among the respective first and/or second plurality of burls and wherein each protrusion has a height above the first and/or second base surface less than the heights of the respective and/or second plurality of burls.
18. A lithographic apparatus, comprising:
the support table of claim 10 configured to support a surface of a substrate; and
a projection system configured to project a radiation beam onto the substrate.
19. A method comprising:
supporting a substrate on a support table, the support table comprising a first plurality of burls protruding from a first base surface and a second plurality of burls protruding from a second base surface, each burl of the first and second plurality of burls having a respective distal end, the first and second plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the first and second plurality of burls, wherein end surfaces of the distal ends of the first and second plurality of burls are in a generally same plane, wherein the second plurality of burls are outward, relative to a center of the support table, from the first plurality of burls, wherein a distance between the end surfaces of the first plurality of burls and the first base surface is larger than a distance between the end surfaces of the second plurality of burls and the second base surface, wherein (i) the second base surface is at an incline to the first base surface or (ii) the second base surface is non-coplanar with the first base surface, is located at a different distance from the generally same plane than the first base surface and has a first set of burls from the plurality of second burls at a first distance from a center of the support table and a second set of burls from the plurality of second burls at a second distance from the center different than the first distance, and wherein at least parts of the second base surface are located on opposite sides of the first base surface; and
processing the substrate while supported on the support table.
20. The method of claim 19 , wherein the second base surface is at an incline relative to the first base surface and the second base surface surrounds the first base surface.