Trench power MOSFET having a trench cavity
View Patent ↗A transistor includes a trench defined in a semiconductor substrate. A gate electrode is disposed in the trench and insulated from a sidewall of the trench by a gate dielectric. A shield electrode is disposed in the trench below the gate electrode and insulated from the gate electrode and the sidewall of the trench by a shield dielectric. The shield dielectric includes solid dielectric portions and a cavity disposed between the shield electrode and the sidewall of the trench.
1. A transistor comprising:
a trench defined in a semiconductor substrate and having a sidewall;
a gate electrode disposed in the trench and insulated from the sidewall of the trench by a gate dielectric; and
a shield electrode disposed in the trench below the gate electrode and insulated from the gate electrode and the sidewall of the trench by a shield dielectric,
the shield dielectric including a cavity disposed between the shield electrode and the sidewall of the trench.
2. The transistor of claim 1 , wherein the cavity surrounds the shield electrode.
3. The transistor of claim 1 , wherein the trench and the shield electrode are aligned along a longitudinal axis, and the cavity has a width orthogonal to the longitudinal axis that is greater than a width of the shield electrode orthogonal to the longitudinal axis.
4. The transistor of claim 1 , wherein the shield dielectric includes an inter-electrode dielectric layer insulating the gate electrode from the shield electrode.
5. The transistor of claim 1 , wherein the shield dielectric includes a plug layer disposed below the gate electrode and enclosing the cavity.
6. The transistor of claim 1 , wherein the shield dielectric includes a base portion of deposited dielectric material, and wherein the shield electrode rests on the base portion.
7. The transistor of claim 1 , wherein the shield dielectric includes a first thermally grown oxide portion disposed between the sidewall of the trench and the cavity.
8. The transistor of claim 7 , wherein the first thermally grown oxide portion extends along the sidewall of the trench above shield electrode and merges with the gate dielectric.
9. The transistor of claim 1 , wherein the shield dielectric includes a second thermally grown oxide portion disposed between the shield electrode and the cavity and defining a sidewall of the cavity.
10. The transistor of claim 9 , wherein the second thermally grown oxide portion extends along surfaces of the shield electrode to form a cap over the shield electrode.
11. A transistor comprising:
a trench defined in a semiconductor substrate and having a sidewall,
a gate electrode disposed in the trench and insulated from the sidewall of the trench by a gate dielectric;
a shield electrode disposed in the trench below the gate electrode and insulated from the gate electrode; and
a shield dielectric having a first portion aligned along a sidewall of the shield electrode and a second portion aligned along the sidewall of the trench, the first portion of the shield dielectric and the second portion of the shield dielectric defining a cavity within the trench.
12. The transistor of claim 11 , wherein the cavity reduces an output capacitance of the transistor relative to a transistor having a trench with a solid dielectric material fill without the cavity.
13. The transistor of claim 11 , wherein the shield electrode includes polysilicon and the shield dielectric includes a thermally grown silicon dioxide and or a deposited silicon dioxide.
14. The transistor of claim 11 , wherein the gate electrode is disposed above a third portion of the shield dielectric that encloses the cavity in the trench.
15. The transistor of claim 11 , wherein the cavity and the shield electrode are disposed on a fourth portion of the shield dielectric disposed at a bottom of the trench.
16. A method, comprising:
forming a trench in a semiconductor substrate;
forming a bottom dielectric in the trench;
forming a shield electrode on the bottom dielectric in the trench;
forming a shield dielectric surrounding the shield electrode in the trench, the shield dielectric including an open cavity between the shield electrode and a sidewall of the trench; and
forming a plug dielectric portion in the trench to enclose the open cavity in the trench.
17. The method of claim 16 , wherein forming a shield electrode in the trench includes:
preparing a temporary shield electrode form in the trench by lining the trench with an oxide layer;
depositing polysilicon to fill the temporary shield electrode form;
recess etching the deposited polysilicon in the temporary shield electrode form to a height of the shield electrode; and
removing the temporary shield electrode form.
18. The method of claim 17 , wherein forming the shield dielectric surrounding the shield electrode in the trench includes:
growing a thermal oxide on the sidewall of the trench and on surfaces of the shield electrode to define the open cavity between the shield electrode and the sidewall of the trench.
19. The method of claim 18 , wherein the forming a plug dielectric portion in the trench to close the open cavity in the trench includes:
depositing silicon dioxide in the trench; and
recessing the deposited silicon dioxide to form the plug dielectric portion closing the open cavity in the trench.
20. The method of claim 19 , further comprising:
depositing polysilicon over the semiconductor substrate and in the trench above the plug dielectric portion; and
chemical mechanical polishing the deposited polysilicon to form a gate electrode above the plug dielectric portion in the trench.