Method and apparatus for backside cleaning of substrates
Embodiments of methods and apparatus for removing particles from a surface of a substrate, such as from the backside of the substrate, are provided herein. In some embodiments, an apparatus for removing particles from a surface of a substrate includes: a substrate handler to expose the surface of the substrate; a particle separator to separate particles from the exposed surface of the substrate; a particle transporter to transport the separated particles; and a particle collector to collect the transported particles.
1. Apparatus for removing particles from a lowest surface of a substrate, comprising:
at least one of a vortex gripper, edge contacts, lift pins, or an edge grip to expose the lowest surface of the substrate;
at least one of an ionized gas source located near an edge of the lowest surface of the substrate or an electrostatic induction device that faces the lowest surface of the substrate to exert a force directly on the lowest surface of the substrate to separate particles from the lowest surface of the substrate;
at least one of a non-ionized gas source located near the edge of the lowest surface of the substrate, a non-ionized gas source facing an opposing surface of the substrate, or a roller fed adhesive film disposed atop a surface of an electrostatic induction device that faces the lowest surface of the substrate, separate from the substrate, to exert a force directly on the separated particles to transport the separated particles away from the lowest surface of the substrate; and
at least one of an electrostatic funnel disposed near an opposing edge of the lowest surface of the substrate or a vacuum source disposed near the opposing edge of the lowest surface of the substrate, separate from the substrate, to collect the transported particles.
2. The apparatus of claim 1 , wherein the ionized gas source includes at least one of a gas jet or an injection nozzle.
3. The apparatus of claim 1 , wherein the electrostatic induction device includes at least one of a monopolar electrostatically charged (ESC) device, a bipolar ESC device, or interdigitated electrodes.
4. The apparatus of claim 1 , wherein the non-ionized gas source is arranged to deliver non-ionized gas along the surface of the substrate or is arranged to deliver non-ionized gas to the opposing surface of the substrate.
5. The apparatus of claim 1 , wherein the non-ionized gas source includes at least one of a gas jet or a spray nozzle.
6. The apparatus of claim 1 , wherein the electrostatic induction device exerts a force directly on the separated particles to transport the separated particles away from the lowest surface of the substrate.
7. The apparatus of claim 1 , wherein the vacuum source includes a vacuum nozzle.
8. The apparatus of claim 7 , wherein the vacuum nozzle collects the transported particles and draws the collected particles into a vacuum system to dispose of the collected particles.
9. The apparatus of claim 1 , wherein the electrostatic funnel is cleaned to dispose of the collected particles.
10. The apparatus of claim 9 , wherein the electrostatic funnel is cleaned intermittently.