Intra-metal capacitor and method of forming the same
A method of forming a capacitor includes the following steps. First, a substrate is provided. A dielectric layer is formed over the substrate. A first patterning process is performed to form a first contact plug through the whole thickness of the dielectric layer and a second patterning process is performed to form a second contact plug in the dielectric layer and spaced apart from the first contact plug in a pre-determined distance, wherein the first contact plug and the second contact plug are capacitively coupled.
1. A method of forming a semiconductor structure, comprising:
providing a substrate having a conducting structure disposed thereon;
forming a dielectric layer over the substrate and the conductive structure;
performing a first patterning process to form a first contact plug through the whole thickness of the dielectric layer and directly contacting the substrate; and
performing a second patterning process to form a device contact plug and a second contact plug in the dielectric layer, a bottom end of the device contact plug directly contacting the conductive structure, a bottom end of the second contact plug being completely covered by the dielectric layer, the second contact plug being in close proximity to one side of the first contact plug and spaced apart from the first contact plug in a pre-determined distance, wherein the first contact plug and the second contact plug and a portion of the dielectric layer sandwiched therebetween are configured to form a capacitor, wherein the first contact plug and the second contact plug are two electrodes of the capacitor, respectively.
2. The method of forming a semiconductor structure according to claim 1 , wherein a top end of the second contact plug is flush with a top end of the first contact plug, and a bottom end of the second contact plug is at a horizontal level higher than a bottom end of the first contact plug.
3. The method of forming a semiconductor structure according to claim 1 , wherein the substrate comprises an isolation region and an active region bordering the isolation region, and a semiconductor device is formed on the active region of the substrate before forming the dielectric layer.
4. The method of forming a semiconductor structure according to claim 3 , wherein an another device contact plug is formed in the dielectric layer by the first patterning process to electrically connect to the semiconductor device.
5. The method of forming a semiconductor structure according to claim 4 , wherein the semiconductor device is further electrically connected to the first contact plug.
6. The method of forming a semiconductor structure according to claim 1 , wherein the first contact plug, the second contact plug and the device contact plugs comprise a same conductive material.
7. The method of forming a semiconductor structure according to claim 3 , wherein the first contact plug and the second contact plug are formed completely above the isolation region of the substrate.
8. The method of forming a semiconductor structure according to claim 1 , wherein a pre-determined thickness of the dielectric layer sandwiched between the first contact plug and the second contact plug is determined by the pre-determined distance between the first contact plug and the second contact plug which is smaller than a photolithographic resolution limitation of the first patterning process and the second patterning process.
9. The method of forming a semiconductor structure according to claim 3 , wherein a bottom end of the first contact plug is electrically isolated by being disposed on the isolation region of the substrate.
10. The method of forming a semiconductor structure according to claim 1 , wherein a bottom end of the second contact plug is electrically isolated by being completely covering by the dielectric layer.