IP Library Granted Patent US 10,840,060
Granted Patent B2
US 10,840,060 · App. 15/983,346 · Granted Nov 17, 2020

Scanning electron microscope and sample observation method

Inventors: Zhaohui Cheng (Tokyo, JP); Hikaru Koyama (Kodaira, JP); Yoshinobu Kimura (Tokyo, JP); Hiroyuki Shinada (Mitaka, JP); Osamu Komuro (Hitachinaka, JP)
Assignee: HITACHI HIGH-TECH CORPORATION
H01J37/28H01J2237/2803
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Quick Facts
Patent No.
US 10,840,060
App. No.
15/983,346
Granted
Nov 17, 2020
Kind
B2
Abstract

A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning condition according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.

Claims (32)

1. A scanning electron microscope which forms an image of a scanned region by scanning a two-dimensional region on a sample with an electron beam, wherein:

the scanning electron microscope determines a probe current and a scan speed of scanning individual single lines by said electron beam such that a charge amount injected per unit of length in a direction of the line scan on the sample by scanning of said electron beam, for each individual single line scanned by the electron beam on said sample, is a predetermined value or less,

wherein the probe current and the scan speed of scanning said individual single lines by said electron beam is determined based on one or more electric characteristics of said sample derived from obtained images including a charging relaxation time constant of said sample calculated based on a temporal change of an intensity of secondary charged particles emitted from said sample by radiating the electron beam to said sample and also is based on previously stored limitation conditions of the scanning electron microscope, and

wherein said sample is scanned in individual single lines by the electron beam based on the determined probe current and scan speed.

2. The scanning electron microscope according to claim 1 , comprising:

means which inputs information of said sample, determines whether an optimization procedure for a scanning strategy of said electron beam is necessary, provides candidate scanning method(s) to said sample upon determining the optimization procedure is necessary, and acquires images of said sample with the candidate scanning method(s), wherein

at least one of the following information is derived from said images taken by said scanning electron microscope: (1) brightness of the image(s), (2) contrast of edge(s) of features of said sample, (3) uniformity of the brightness of said images, (4) uniformity of said contrast of said edge(s) in said image(s), and a signal-to-noise ratio of said image(s).

3. The scanning electron microscope according to claim 1 , wherein candidates of recommended scanning methods are provided; and

wherein the electric characteristics of said sample and/or the candidates of recommended scanning methods are stored, and

wherein said candidates of recommended scanning methods for said electron beam are read out when the information concerning to said sample is input, and said electron beam scans over said sample using said scanning method(s) automatically and acquires images.

4. The scanning electron microscope according to claim 1 , wherein

a sequence of plural spatially separated line positions on said sample scanned by said electron beam are controlled.

5. The scanning electron microscope according to claim 1 , wherein said predetermined value is of said scanning line density is 7.2×10−19 (C/nm).

6. The scanning electron microscope according to claim 1 , wherein said predetermined value is of said scanning line density is 3.52×10−19 (C/nm).

7. The scanning electron microscope according to claim 1 , wherein the scan speed is increased from a normal scan speed.

8. The scanning electron microscope according to claim 1 , wherein a focal point or an astigmatism correction amount is calculated and the calculation result is fed back to a charged particle optical system.

9. A sample observation method in which an image of a scanned region is formed by scanning a two-dimensional region on a sample with the electron beam, comprising the steps of:

determining a probe current and a scan speed of scanning individual single lines by said electron beam such that a charge amount injected per unit of length in a direction of the line scan on the sample by scanning of said electron beam, for each individual single line scanned by the electron beam on the sample, is a predetermined value or less; and

scanning said sample in individual single lines by the electron beam based on the determined probe current and scan speed,

wherein the probe current and the scan speed of scanning said individual single lines by said electron beam is based on one or more electric characteristics of said sample derived from said images including a charging relaxation time constant of said sample calculated based on a temporal change of an intensity of secondary charged particles emitted from said sample by radiating the electron beam to said sample and also is based on previously stored limitation conditions of the scanning electron microscope.

10. The sample observation method according to claim 9 , further comprising:

steps which input information of said sample, determine whether an optimization procedure for a scanning strategy of said electron beam is necessary, provide candidate scanning method(s) to said sample upon determining the optimization procedure is necessary, acquire images of said sample with the candidate scanning method(s), wherein

at least one of the following information is derived from said images taken by said scanning electron microscope: (1) brightness of the image(s), (2) contrast of edge(s) of features of said sample, (3) uniformity of the brightness of said images, (4) uniformity of said contrast of said edge(s) in said image(s), and a signal-to-noise ratio of said image(s).

11. The sample observation method according to claim 9 , further comprising the step of:

providing candidates of recommended scanning methods and acquiring images of said sample using said candidates of recommended scanning methods,

wherein the electric characteristics of said sample and/or the candidates of recommended scanning methods are stored, and

wherein said candidates of recommended scanning methods for said electron beam are read out when the information concerning to said sample is input, and said electron beam scans over said sample using said scanning method(s) automatically and acquires images.

12. The sample observation method according to claim 9 , wherein a sequence of a plural spatially separated line positions on said sample scanned by said electron beam are controlled.

13. The sample observation method according to claim 9 , wherein said predetermined value is of said scanning line density is 7.2×10−19 (C/nm).

14. The sample observation method according to claim 9 , wherein said predetermined value is of said scanning line density is 3.52×10−19 (C/nm).

15. The sample observation method according to claim 9 , wherein the scan speed is increased from a normal scan speed.

16. The sample observation method according to claim 9 , wherein a focal point or an astigmatism correction amount is calculated and the calculated result is fed back to a charged particle optical system.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
Priority Claims (2)
JP 2009-184001 · Aug 7, 2009 · national
JP 2009-241966 · Oct 21, 2009 · national
Continuity (2)
Continuation 13387183
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